KR100227646B1 - 기판처리장치 - Google Patents
기판처리장치 Download PDFInfo
- Publication number
- KR100227646B1 KR100227646B1 KR1019970009229A KR19970009229A KR100227646B1 KR 100227646 B1 KR100227646 B1 KR 100227646B1 KR 1019970009229 A KR1019970009229 A KR 1019970009229A KR 19970009229 A KR19970009229 A KR 19970009229A KR 100227646 B1 KR100227646 B1 KR 100227646B1
- Authority
- KR
- South Korea
- Prior art keywords
- substrate
- box
- drive mechanism
- partition
- processing tank
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67706—Mechanical details, e.g. roller, belt
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Coating Apparatus (AREA)
Abstract
Description
Claims (4)
- 반송중인 기판에 처리조내에서 처리액을 공급함으로써 소정의 처리를 실시하는 기판처리장치에 있어서, 상기 처리조내에 배설되고 또한 처리조의 양측벽을 관통한 회전축의 회전에 의해 기판을 반송하는 반송수단과, 상기 회전축의 단부를 지지하는 베어링과, 상기 회전축을 구동하는 구동기구와, 적어도 구동기구측 베어링과 상기 처리조 사이에 상기 회전축이 과통한 상태로 배치된 내부에 간막이 공간을 가지는 간막이박스가 구비도어 있는 것을 특징으로 하는 기판처리장치.
- 제1항에 있어서, 기체도입수단을 가짐과 동시에 상기 간막이박스는 장치외부로부터 그 내부에 기체를 도입하는 기체도입구를 가지고, 상기 기체도입수단은 기체도입구멍을 통과하여 간막이박스내에 기체를 도입하는 것을 특징으로 하는 기판처리장치.
- 제2항에 있어서, 상기 기체도입수단은 상기 기체도입구를 통해서 상기 간막이박스내에 청정기체를 강제도입하는 블로우수단인 것을 특징으로 하는 기판처리장치.
- 제1항 내지 제3항의 어느 한 항에 있어서, 상기 구동기구는 구동모터와, 이 구동모터와 상기 회전축 사이에 개설되는 구동력 전달수단으로 이루어지고, 상기 구동력 전달수단은 구동기구실내에 내장되고, 상기 기체도입수단은 이 구동기구실내 및 상기 처리조내의 공기를 흡인하는 흡인수단인 것을 특징으로 하는 기판처리장치.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP06073696A JP3388988B2 (ja) | 1996-03-18 | 1996-03-18 | 基板処理装置 |
| JP96-60736 | 1996-03-18 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR970067541A KR970067541A (ko) | 1997-10-13 |
| KR100227646B1 true KR100227646B1 (ko) | 1999-11-01 |
Family
ID=13150854
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019970009229A Expired - Fee Related KR100227646B1 (ko) | 1996-03-18 | 1997-03-18 | 기판처리장치 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP3388988B2 (ko) |
| KR (1) | KR100227646B1 (ko) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100484061B1 (ko) * | 2001-09-14 | 2005-04-19 | 다이닛뽕스크린 세이조오 가부시키가이샤 | 기판처리장치 |
| KR20150128495A (ko) * | 2014-05-10 | 2015-11-18 | 김영선 | Pcb기판 제조공정 중 세척 후 건조공정에서의 이물질 제거방법 및 그 장치 |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003042169A (ja) * | 2001-07-31 | 2003-02-13 | Sumitomo Precision Prod Co Ltd | 軸受装置及びこれを備えた基板処理装置 |
| JP2006245125A (ja) * | 2005-03-01 | 2006-09-14 | Shibaura Mechatronics Corp | 基板の処理装置及び処理方法 |
| JP4885492B2 (ja) * | 2005-07-01 | 2012-02-29 | 株式会社日本設計工業 | ローラコンベア |
| JP4871582B2 (ja) * | 2005-12-12 | 2012-02-08 | 芝浦メカトロニクス株式会社 | 基板の処理装置 |
-
1996
- 1996-03-18 JP JP06073696A patent/JP3388988B2/ja not_active Expired - Fee Related
-
1997
- 1997-03-18 KR KR1019970009229A patent/KR100227646B1/ko not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100484061B1 (ko) * | 2001-09-14 | 2005-04-19 | 다이닛뽕스크린 세이조오 가부시키가이샤 | 기판처리장치 |
| KR20150128495A (ko) * | 2014-05-10 | 2015-11-18 | 김영선 | Pcb기판 제조공정 중 세척 후 건조공정에서의 이물질 제거방법 및 그 장치 |
| KR101580396B1 (ko) | 2014-05-10 | 2016-01-04 | 김영선 | Pcb기판 제조공정 중 세척 후 건조공정에서의 이물질 제거방법 및 그 장치 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3388988B2 (ja) | 2003-03-24 |
| KR970067541A (ko) | 1997-10-13 |
| JPH09251974A (ja) | 1997-09-22 |
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