JPWO2023181207A1 - - Google Patents

Info

Publication number
JPWO2023181207A1
JPWO2023181207A1 JP2024509541A JP2024509541A JPWO2023181207A1 JP WO2023181207 A1 JPWO2023181207 A1 JP WO2023181207A1 JP 2024509541 A JP2024509541 A JP 2024509541A JP 2024509541 A JP2024509541 A JP 2024509541A JP WO2023181207 A1 JPWO2023181207 A1 JP WO2023181207A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2024509541A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2023181207A1 publication Critical patent/JPWO2023181207A1/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/0975—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser using inductive or capacitive excitation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/09702—Details of the driver electronics and electric discharge circuits
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Lasers (AREA)
JP2024509541A 2022-03-23 2022-03-23 Pending JPWO2023181207A1 (https=)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2022/013639 WO2023181207A1 (ja) 2022-03-23 2022-03-23 ガスレーザ装置及び電子デバイスの製造方法

Publications (1)

Publication Number Publication Date
JPWO2023181207A1 true JPWO2023181207A1 (https=) 2023-09-28

Family

ID=88100558

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2024509541A Pending JPWO2023181207A1 (https=) 2022-03-23 2022-03-23

Country Status (4)

Country Link
US (1) US20240405501A1 (https=)
JP (1) JPWO2023181207A1 (https=)
CN (1) CN118648203A (https=)
WO (1) WO2023181207A1 (https=)

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0265371U (https=) * 1988-11-04 1990-05-16
JPH03114282A (ja) * 1989-09-28 1991-05-15 Toshiba Corp パルスレーザ装置
JPH0513853A (ja) * 1991-06-28 1993-01-22 Komatsu Ltd ガスレーザ装置のレーザ放電回路
JP2004047892A (ja) * 2002-07-15 2004-02-12 Sumitomo Heavy Ind Ltd パルス放電回路
US20070071047A1 (en) * 2005-09-29 2007-03-29 Cymer, Inc. 6K pulse repetition rate and above gas discharge laser system solid state pulse power system improvements
JP2007250640A (ja) * 2006-03-14 2007-09-27 Ushio Inc 高電圧パルス発生装置及びこれを用いた放電励起ガスレーザ装置
JP2009099727A (ja) * 2007-10-16 2009-05-07 Gigaphoton Inc 注入同期式放電励起レーザ装置及び注入同期式放電励起レーザ装置における同期制御方法
JP2010073948A (ja) * 2008-09-19 2010-04-02 Gigaphoton Inc パルスレーザ用電源装置

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0265371U (https=) * 1988-11-04 1990-05-16
JPH03114282A (ja) * 1989-09-28 1991-05-15 Toshiba Corp パルスレーザ装置
JPH0513853A (ja) * 1991-06-28 1993-01-22 Komatsu Ltd ガスレーザ装置のレーザ放電回路
JP2004047892A (ja) * 2002-07-15 2004-02-12 Sumitomo Heavy Ind Ltd パルス放電回路
US20070071047A1 (en) * 2005-09-29 2007-03-29 Cymer, Inc. 6K pulse repetition rate and above gas discharge laser system solid state pulse power system improvements
JP2007250640A (ja) * 2006-03-14 2007-09-27 Ushio Inc 高電圧パルス発生装置及びこれを用いた放電励起ガスレーザ装置
JP2009099727A (ja) * 2007-10-16 2009-05-07 Gigaphoton Inc 注入同期式放電励起レーザ装置及び注入同期式放電励起レーザ装置における同期制御方法
JP2010073948A (ja) * 2008-09-19 2010-04-02 Gigaphoton Inc パルスレーザ用電源装置

Also Published As

Publication number Publication date
WO2023181207A1 (ja) 2023-09-28
CN118648203A (zh) 2024-09-13
US20240405501A1 (en) 2024-12-05

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