JPWO2023149339A5 - - Google Patents
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- JPWO2023149339A5 JPWO2023149339A5 JP2023578521A JP2023578521A JPWO2023149339A5 JP WO2023149339 A5 JPWO2023149339 A5 JP WO2023149339A5 JP 2023578521 A JP2023578521 A JP 2023578521A JP 2023578521 A JP2023578521 A JP 2023578521A JP WO2023149339 A5 JPWO2023149339 A5 JP WO2023149339A5
- Authority
- JP
- Japan
- Prior art keywords
- treatment agent
- surface treatment
- group
- agent according
- integer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- 239000012756 surface treatment agent Substances 0.000 claims description 36
- -1 ether compound Chemical class 0.000 claims description 23
- 125000004432 carbon atom Chemical group C* 0.000 claims description 20
- 229910052731 fluorine Inorganic materials 0.000 claims description 14
- 239000002344 surface layer Substances 0.000 claims description 14
- 125000002947 alkylene group Chemical group 0.000 claims description 13
- 229910052799 carbon Inorganic materials 0.000 claims description 12
- 125000003709 fluoroalkyl group Chemical group 0.000 claims description 11
- 125000004429 atom Chemical group 0.000 claims description 10
- 239000011737 fluorine Substances 0.000 claims description 10
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 9
- 150000001875 compounds Chemical class 0.000 claims description 8
- 239000000758 substrate Substances 0.000 claims description 7
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 claims description 5
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 125000000962 organic group Chemical group 0.000 claims description 5
- 229910052710 silicon Inorganic materials 0.000 claims description 5
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 claims description 4
- 229910052760 oxygen Inorganic materials 0.000 claims 8
- 125000004430 oxygen atom Chemical group O* 0.000 claims 8
- 238000000576 coating method Methods 0.000 claims 6
- 125000004043 oxo group Chemical group O=* 0.000 claims 4
- 239000007788 liquid Substances 0.000 claims 2
- 239000003960 organic solvent Substances 0.000 claims 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 10
- 125000000217 alkyl group Chemical group 0.000 description 9
- 125000001153 fluoro group Chemical group F* 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- 150000001721 carbon Chemical group 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 125000004433 nitrogen atom Chemical group N* 0.000 description 4
- 150000003961 organosilicon compounds Chemical class 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 3
- HNSDLXPSAYFUHK-UHFFFAOYSA-N 1,4-bis(2-ethylhexyl) sulfosuccinate Chemical compound CCCCC(CC)COC(=O)CC(S(O)(=O)=O)C(=O)OCC(CC)CCCC HNSDLXPSAYFUHK-UHFFFAOYSA-N 0.000 description 2
- IUHFWCGCSVTMPG-UHFFFAOYSA-N [C].[C] Chemical group [C].[C] IUHFWCGCSVTMPG-UHFFFAOYSA-N 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 description 2
- 150000002170 ethers Chemical class 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 2
- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical class [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 description 2
- 150000004756 silanes Chemical class 0.000 description 2
- 125000005372 silanol group Chemical group 0.000 description 2
- 238000005160 1H NMR spectroscopy Methods 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- 238000005481 NMR spectroscopy Methods 0.000 description 1
- 229910008051 Si-OH Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910006358 Si—OH Inorganic materials 0.000 description 1
- 239000008346 aqueous phase Substances 0.000 description 1
- 125000002993 cycloalkylene group Chemical group 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000010812 external standard method Methods 0.000 description 1
- 125000005842 heteroatom Chemical group 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical group 0.000 description 1
- 125000001183 hydrocarbyl group Chemical group 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 238000004255 ion exchange chromatography Methods 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 229910021642 ultra pure water Inorganic materials 0.000 description 1
- 239000012498 ultrapure water Substances 0.000 description 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022016309 | 2022-02-04 | ||
| PCT/JP2023/002449 WO2023149339A1 (ja) | 2022-02-04 | 2023-01-26 | 表面処理剤、物品、物品の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2023149339A1 JPWO2023149339A1 (https=) | 2023-08-10 |
| JPWO2023149339A5 true JPWO2023149339A5 (https=) | 2024-10-16 |
Family
ID=87552387
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023578521A Pending JPWO2023149339A1 (https=) | 2022-02-04 | 2023-01-26 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20240392069A1 (https=) |
| JP (1) | JPWO2023149339A1 (https=) |
| KR (1) | KR20240148854A (https=) |
| CN (1) | CN118647686A (https=) |
| WO (1) | WO2023149339A1 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2022120792A (ja) * | 2021-02-05 | 2022-08-18 | 住友化学株式会社 | 硬化皮膜及び積層体 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6016812Y2 (ja) | 1980-09-26 | 1985-05-24 | 株式会社日立製作所 | ベント抜構造 |
| WO2013121984A1 (ja) * | 2012-02-17 | 2013-08-22 | 旭硝子株式会社 | 含フッ素エーテル化合物、含フッ素エーテル組成物およびコーティング液、ならびに表面処理層を有する基材およびその製造方法 |
| EP3085749B1 (en) * | 2015-04-20 | 2017-06-28 | Shin-Etsu Chemical Co., Ltd. | Fluoropolyether-containing polymer-modified silane, surface treating agent, and treated article |
| CN111732720B (zh) * | 2015-09-01 | 2023-05-30 | Ａｇｃ株式会社 | 含氟醚化合物、表面处理剂、含氟醚组合物、涂布液和物品 |
| EP3533818B1 (en) * | 2016-10-27 | 2024-01-17 | Daikin Industries, Ltd. | Perfluoro(poly)ether group-containing silane compound |
| CN111315834B (zh) * | 2017-10-20 | 2022-03-01 | 信越化学工业株式会社 | 含氟涂布剂组合物、表面处理剂和物品 |
| WO2019208503A1 (ja) * | 2018-04-26 | 2019-10-31 | Ａｇｃ株式会社 | 含フッ素エーテル化合物、それを含む組成物、コーティング液及び物品 |
| EP3922626B1 (en) * | 2019-02-08 | 2024-09-04 | Agc Inc. | Fluorine-containing ether compound, fluorine-containing ether composition, coating liquid, article, method for producing article, and method for producing fluorine-containing compound |
| JP7760915B2 (ja) * | 2019-12-26 | 2025-10-28 | Ａｇｃ株式会社 | 表面処理剤、表面処理剤組成物、コーティング液、物品、及び物品の製造方法 |
-
2023
- 2023-01-26 JP JP2023578521A patent/JPWO2023149339A1/ja active Pending
- 2023-01-26 WO PCT/JP2023/002449 patent/WO2023149339A1/ja not_active Ceased
- 2023-01-26 CN CN202380019847.1A patent/CN118647686A/zh active Pending
- 2023-01-26 KR KR1020247029108A patent/KR20240148854A/ko active Pending
-
2024
- 2024-08-02 US US18/793,221 patent/US20240392069A1/en active Pending
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