JPWO2023136143A5 - - Google Patents
Download PDFInfo
- Publication number
- JPWO2023136143A5 JPWO2023136143A5 JP2023573975A JP2023573975A JPWO2023136143A5 JP WO2023136143 A5 JPWO2023136143 A5 JP WO2023136143A5 JP 2023573975 A JP2023573975 A JP 2023573975A JP 2023573975 A JP2023573975 A JP 2023573975A JP WO2023136143 A5 JPWO2023136143 A5 JP WO2023136143A5
- Authority
- JP
- Japan
- Prior art keywords
- treatment agent
- surface treatment
- group
- agent according
- mass
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910052731 fluorine Inorganic materials 0.000 claims description 11
- 239000011737 fluorine Substances 0.000 claims description 8
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 7
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 3
- -1 ether compound Chemical class 0.000 claims description 3
- 239000012756 surface treatment agent Substances 0.000 claims 10
- 238000000576 coating method Methods 0.000 claims 4
- 239000000758 substrate Substances 0.000 claims 4
- 239000002344 surface layer Substances 0.000 claims 4
- 150000002736 metal compounds Chemical class 0.000 claims 3
- 238000004519 manufacturing process Methods 0.000 claims 2
- 229910052751 metal Inorganic materials 0.000 claims 2
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 claims 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 claims 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 claims 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 claims 1
- 229910052791 calcium Inorganic materials 0.000 claims 1
- 239000011575 calcium Substances 0.000 claims 1
- 229910052739 hydrogen Inorganic materials 0.000 claims 1
- 239000001257 hydrogen Substances 0.000 claims 1
- 239000007788 liquid Substances 0.000 claims 1
- 229910052744 lithium Inorganic materials 0.000 claims 1
- 229910052749 magnesium Inorganic materials 0.000 claims 1
- 239000011777 magnesium Substances 0.000 claims 1
- 239000002184 metal Substances 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 230000000737 periodic effect Effects 0.000 claims 1
- 229910052700 potassium Inorganic materials 0.000 claims 1
- 239000011591 potassium Substances 0.000 claims 1
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 claims 1
- 229910052708 sodium Inorganic materials 0.000 claims 1
- 239000011734 sodium Substances 0.000 claims 1
- 125000000217 alkyl group Chemical group 0.000 description 5
- 125000003709 fluoroalkyl group Chemical group 0.000 description 5
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 5
- 125000002947 alkylene group Chemical group 0.000 description 4
- 125000004432 carbon atom Chemical group C* 0.000 description 4
- 125000001153 fluoro group Chemical group F* 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 3
- 150000003961 organosilicon compounds Chemical class 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 125000004429 atom Chemical group 0.000 description 2
- 150000001721 carbon Chemical group 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 150000002170 ethers Chemical class 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 125000004433 nitrogen atom Chemical group N* 0.000 description 2
- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical class [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 description 2
- 150000004756 silanes Chemical class 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- IUHFWCGCSVTMPG-UHFFFAOYSA-N [C].[C] Chemical group [C].[C] IUHFWCGCSVTMPG-UHFFFAOYSA-N 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022002477 | 2022-01-11 | ||
| PCT/JP2022/048308 WO2023136143A1 (ja) | 2022-01-11 | 2022-12-27 | 表面処理剤、物品、物品の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2023136143A1 JPWO2023136143A1 (https=) | 2023-07-20 |
| JPWO2023136143A5 true JPWO2023136143A5 (https=) | 2024-09-20 |
Family
ID=87279111
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023573975A Pending JPWO2023136143A1 (https=) | 2022-01-11 | 2022-12-27 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20240360324A1 (https=) |
| JP (1) | JPWO2023136143A1 (https=) |
| KR (1) | KR20240134334A (https=) |
| CN (1) | CN118510863A (https=) |
| WO (1) | WO2023136143A1 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20240359464A1 (en) * | 2023-04-27 | 2024-10-31 | Canon Kabushiki Kaisha | Ink-repellent member and ink jet head |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6016812Y2 (ja) | 1980-09-26 | 1985-05-24 | 株式会社日立製作所 | ベント抜構造 |
| US5180833A (en) * | 1990-03-16 | 1993-01-19 | Takeda Chemical Industries, Ltd. | Process for the preparation of chlorothiazole derivatives |
| WO2010027096A1 (ja) * | 2008-09-05 | 2010-03-11 | 株式会社Moresco | 潤滑剤及び磁気ディスク |
| WO2013121984A1 (ja) * | 2012-02-17 | 2013-08-22 | 旭硝子株式会社 | 含フッ素エーテル化合物、含フッ素エーテル組成物およびコーティング液、ならびに表面処理層を有する基材およびその製造方法 |
| JP2014070164A (ja) * | 2012-09-28 | 2014-04-21 | Fujifilm Corp | 表面改質剤、処理基材、化合物の製造方法、及び化合物 |
| CN111732720B (zh) * | 2015-09-01 | 2023-05-30 | Ａｇｃ株式会社 | 含氟醚化合物、表面处理剂、含氟醚组合物、涂布液和物品 |
| CN111315834B (zh) * | 2017-10-20 | 2022-03-01 | 信越化学工业株式会社 | 含氟涂布剂组合物、表面处理剂和物品 |
| WO2019151442A1 (ja) * | 2018-02-02 | 2019-08-08 | ダイキン工業株式会社 | フルオロ（ポリ）エーテル基含有シラン化合物 |
| WO2019208503A1 (ja) * | 2018-04-26 | 2019-10-31 | Ａｇｃ株式会社 | 含フッ素エーテル化合物、それを含む組成物、コーティング液及び物品 |
| KR20210106426A (ko) * | 2018-12-26 | 2021-08-30 | 에이지씨 가부시키가이샤 | 발수 발유층 형성 기재, 증착 재료 및 발수 발유층 형성 기재의 제조 방법 |
| EP3922626B1 (en) * | 2019-02-08 | 2024-09-04 | Agc Inc. | Fluorine-containing ether compound, fluorine-containing ether composition, coating liquid, article, method for producing article, and method for producing fluorine-containing compound |
| JP7760915B2 (ja) * | 2019-12-26 | 2025-10-28 | Ａｇｃ株式会社 | 表面処理剤、表面処理剤組成物、コーティング液、物品、及び物品の製造方法 |
-
2022
- 2022-12-27 JP JP2023573975A patent/JPWO2023136143A1/ja active Pending
- 2022-12-27 KR KR1020247025941A patent/KR20240134334A/ko active Pending
- 2022-12-27 CN CN202280088386.9A patent/CN118510863A/zh active Pending
- 2022-12-27 WO PCT/JP2022/048308 patent/WO2023136143A1/ja not_active Ceased
-
2024
- 2024-07-08 US US18/766,013 patent/US20240360324A1/en active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR102887549B1 (ko) | 함불소 코팅제 조성물, 표면처리제 및 물품 | |
| JP6274083B2 (ja) | 耐熱性を有する撥水撥油処理剤及びその製造方法並びに物品 | |
| JP7787740B2 (ja) | 含フッ素エーテル組成物、コーティング液および物品 | |
| TWI653305B (zh) | Fluorine-containing coating agent and articles treated by the coating agent | |
| US8815404B2 (en) | Protective film and encapsulation material comprising the same | |
| JP7408250B2 (ja) | フルオロポリエーテル基含有ポリマー組成物、コーティング剤及び物品 | |
| JP2022069480A5 (https=) | ||
| JP2013516638A5 (https=) | ||
| KR940005773A (ko) | 화학흡착막의 제조 방법 | |
| JPWO2021131960A5 (https=) | ||
| JP2010535791A5 (https=) | ||
| JP2010519375A5 (https=) | ||
| KR20180094947A (ko) | 플루오로폴리에터기 함유 폴리머 변성 실레인, 표면처리제 및 물품 | |
| JPWO2018207811A1 (ja) | 防汚性物品および防汚性物品の製造方法 | |
| KR100736315B1 (ko) | 표면 처리제 및 발수·발유성 물품 | |
| JP2022017617A (ja) | 含フッ素エーテル組成物、コーティング液、物品およびその製造方法 | |
| JP2007114772A5 (https=) | ||
| JPWO2023136143A5 (https=) | ||
| JPWO2023136144A5 (https=) | ||
| KR20150136997A (ko) | 함불소 코팅제 및 이 코팅제로 처리된 물품 | |
| KR102489200B1 (ko) | 표면 처리제 | |
| Owen | Poly [Methyl (3, 3, 3‐Trifluoropropyl) Siloxane] | |
| JP2007004113A5 (https=) | ||
| US20240392069A1 (en) | Surface treatment agent, article, and method for manufacturing article | |
| KR20240141823A (ko) | 표면 처리제, 물품, 물품의 제조 방법 |