JPWO2023074082A1 - - Google Patents
Info
- Publication number
- JPWO2023074082A1 JPWO2023074082A1 JP2023556136A JP2023556136A JPWO2023074082A1 JP WO2023074082 A1 JPWO2023074082 A1 JP WO2023074082A1 JP 2023556136 A JP2023556136 A JP 2023556136A JP 2023556136 A JP2023556136 A JP 2023556136A JP WO2023074082 A1 JPWO2023074082 A1 JP WO2023074082A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
- H01J37/1472—Deflecting along given lines
- H01J37/1474—Scanning means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/22—Optical, image processing or photographic arrangements associated with the tube
- H01J37/222—Image processing arrangements associated with the tube
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/244—Detectors; Associated components or circuits therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
- H01J37/3177—Multi-beam, e.g. fly's eye, comb probe
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/15—Means for deflecting or directing discharge
- H01J2237/1501—Beam alignment means or procedures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
- H01J2237/2448—Secondary particle detectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
- H01J2237/28—Scanning microscopes
- H01J2237/2813—Scanning microscopes characterised by the application
- H01J2237/2817—Pattern inspection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/317—Processing objects on a microscale
- H01J2237/3175—Lithography
- H01J2237/31776—Shaped beam
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Computer Vision & Pattern Recognition (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Electron Sources, Ion Sources (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2021174613 | 2021-10-26 | ||
JP2021174613 | 2021-10-26 | ||
PCT/JP2022/030222 WO2023074082A1 (ja) | 2021-10-26 | 2022-08-08 | マルチ電子ビーム画像取得装置及びマルチ電子ビーム画像取得方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2023074082A1 true JPWO2023074082A1 (ja) | 2023-05-04 |
JP7525746B2 JP7525746B2 (ja) | 2024-07-30 |
Family
ID=86159327
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2023556136A Active JP7525746B2 (ja) | 2021-10-26 | 2022-08-08 | マルチ電子ビーム画像取得装置及びマルチ電子ビーム画像取得方法 |
Country Status (5)
Country | Link |
---|---|
US (1) | US20240282547A1 (ja) |
JP (1) | JP7525746B2 (ja) |
KR (1) | KR20240035873A (ja) |
CN (1) | CN117981038A (ja) |
WO (1) | WO2023074082A1 (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2023237225A1 (en) * | 2022-06-10 | 2023-12-14 | Carl Zeiss Multisem Gmbh | Multi-beam charged particle imaging system with improved imaging of secondary electron beamlets on a detector |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4870437B2 (ja) | 2006-01-11 | 2012-02-08 | 株式会社ニューフレアテクノロジー | 偏向収差補正電圧の演算方法及び荷電粒子ビーム描画方法 |
JP5572428B2 (ja) * | 2010-03-15 | 2014-08-13 | 株式会社日立ハイテクノロジーズ | 検査装置および検査方法 |
JP2019186140A (ja) | 2018-04-16 | 2019-10-24 | 株式会社ニューフレアテクノロジー | マルチ荷電粒子ビーム照射装置及びマルチ荷電粒子ビーム照射方法 |
JP7198092B2 (ja) | 2018-05-18 | 2022-12-28 | 株式会社ニューフレアテクノロジー | マルチ電子ビーム照射装置、マルチ電子ビーム検査装置及びマルチ電子ビーム照射方法 |
TWI737117B (zh) | 2019-03-05 | 2021-08-21 | 日商紐富來科技股份有限公司 | 多電子束照射裝置 |
JP7316106B2 (ja) | 2019-06-14 | 2023-07-27 | 株式会社ニューフレアテクノロジー | 収差補正器及びマルチ電子ビーム照射装置 |
JP7303052B2 (ja) | 2019-07-16 | 2023-07-04 | 株式会社ニューフレアテクノロジー | 多極子収差補正器の導通検査方法及び多極子収差補正器の導通検査装置 |
-
2022
- 2022-08-08 KR KR1020247005928A patent/KR20240035873A/ko unknown
- 2022-08-08 CN CN202280063531.8A patent/CN117981038A/zh active Pending
- 2022-08-08 JP JP2023556136A patent/JP7525746B2/ja active Active
- 2022-08-08 WO PCT/JP2022/030222 patent/WO2023074082A1/ja active Application Filing
-
2024
- 2024-04-26 US US18/647,061 patent/US20240282547A1/en active Pending
Also Published As
Publication number | Publication date |
---|---|
WO2023074082A1 (ja) | 2023-05-04 |
US20240282547A1 (en) | 2024-08-22 |
CN117981038A (zh) | 2024-05-03 |
KR20240035873A (ko) | 2024-03-18 |
TW202318463A (zh) | 2023-05-01 |
JP7525746B2 (ja) | 2024-07-30 |
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