JPWO2023053171A1 - - Google Patents
Info
- Publication number
- JPWO2023053171A1 JPWO2023053171A1 JP2023550761A JP2023550761A JPWO2023053171A1 JP WO2023053171 A1 JPWO2023053171 A1 JP WO2023053171A1 JP 2023550761 A JP2023550761 A JP 2023550761A JP 2023550761 A JP2023550761 A JP 2023550761A JP WO2023053171 A1 JPWO2023053171 A1 JP WO2023053171A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Electromagnetism (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical Vapour Deposition (AREA)
- Plasma Technology (AREA)
- Treatment Of Fiber Materials (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/JP2021/035547 WO2023053171A1 (ja) | 2021-09-28 | 2021-09-28 | プラズマ処理装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPWO2023053171A1 true JPWO2023053171A1 (https=) | 2023-04-06 |
| JPWO2023053171A5 JPWO2023053171A5 (https=) | 2023-12-15 |
| JP7512567B2 JP7512567B2 (ja) | 2024-07-09 |
Family
ID=85781464
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023550761A Active JP7512567B2 (ja) | 2021-09-28 | 2021-09-28 | プラズマ処理装置 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP7512567B2 (https=) |
| CN (1) | CN117204124A (https=) |
| TW (1) | TWI834148B (https=) |
| WO (1) | WO2023053171A1 (https=) |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4801839A (en) * | 1986-12-08 | 1989-01-31 | Applied Electron Corporation | Mounting of a cold cathode directly to a vacuum chamber wall |
| JPH0220325U (https=) * | 1988-07-25 | 1990-02-09 | ||
| JP2008028087A (ja) * | 2006-07-20 | 2008-02-07 | Nisshinbo Ind Inc | プラズマエッチング電極 |
| JP2010248548A (ja) * | 2009-04-13 | 2010-11-04 | Shinmaywa Industries Ltd | ホローカソード型放電管 |
| JP2012054377A (ja) * | 2010-09-01 | 2012-03-15 | Toray Ind Inc | プラズマｃｖｄ装置 |
| JP2015086471A (ja) * | 2013-10-28 | 2015-05-07 | ベイパー テクノロジーズ、インコーポレイテッド | 低圧アーク・プラズマ浸漬被膜気相堆積及びイオン処理 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2705190B2 (ja) * | 1989-02-16 | 1998-01-26 | 富士通株式会社 | ドライエッチング装置 |
| JP3113796B2 (ja) * | 1995-07-10 | 2000-12-04 | 東京エレクトロン株式会社 | プラズマ処理装置 |
| JP2001135626A (ja) * | 1999-11-02 | 2001-05-18 | Hitachi Kokusai Electric Inc | プラズマｃｖｄ装置及びプラズマｃｖｄ膜形成方法 |
| JP4493932B2 (ja) * | 2003-05-13 | 2010-06-30 | 東京エレクトロン株式会社 | 上部電極及びプラズマ処理装置 |
| KR101046335B1 (ko) * | 2008-07-29 | 2011-07-05 | 피에스케이 주식회사 | 할로우 캐소드 플라즈마 발생방법 및 할로우 캐소드플라즈마를 이용한 대면적 기판 처리방법 |
| JP6745643B2 (ja) * | 2016-05-17 | 2020-08-26 | 東京エレクトロン株式会社 | プラズマ処理装置およびプラズマ処理方法 |
| JP7246154B2 (ja) * | 2018-10-02 | 2023-03-27 | 東京エレクトロン株式会社 | プラズマ処理装置及び静電吸着方法 |
| JP7134863B2 (ja) * | 2018-12-27 | 2022-09-12 | 東京エレクトロン株式会社 | プラズマ処理装置およびプラズマ処理方法 |
-
2021
- 2021-09-28 CN CN202180097632.2A patent/CN117204124A/zh active Pending
- 2021-09-28 JP JP2023550761A patent/JP7512567B2/ja active Active
- 2021-09-28 WO PCT/JP2021/035547 patent/WO2023053171A1/ja not_active Ceased
-
2022
- 2022-04-13 TW TW111114018A patent/TWI834148B/zh active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4801839A (en) * | 1986-12-08 | 1989-01-31 | Applied Electron Corporation | Mounting of a cold cathode directly to a vacuum chamber wall |
| JPH0220325U (https=) * | 1988-07-25 | 1990-02-09 | ||
| JP2008028087A (ja) * | 2006-07-20 | 2008-02-07 | Nisshinbo Ind Inc | プラズマエッチング電極 |
| JP2010248548A (ja) * | 2009-04-13 | 2010-11-04 | Shinmaywa Industries Ltd | ホローカソード型放電管 |
| JP2012054377A (ja) * | 2010-09-01 | 2012-03-15 | Toray Ind Inc | プラズマｃｖｄ装置 |
| JP2015086471A (ja) * | 2013-10-28 | 2015-05-07 | ベイパー テクノロジーズ、インコーポレイテッド | 低圧アーク・プラズマ浸漬被膜気相堆積及びイオン処理 |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2023053171A1 (ja) | 2023-04-06 |
| TW202315464A (zh) | 2023-04-01 |
| TWI834148B (zh) | 2024-03-01 |
| CN117204124A (zh) | 2023-12-08 |
| JP7512567B2 (ja) | 2024-07-09 |
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