JPWO2022249371A1 - - Google Patents
Info
- Publication number
- JPWO2022249371A1 JPWO2022249371A1 JP2023523842A JP2023523842A JPWO2022249371A1 JP WO2022249371 A1 JPWO2022249371 A1 JP WO2022249371A1 JP 2023523842 A JP2023523842 A JP 2023523842A JP 2023523842 A JP2023523842 A JP 2023523842A JP WO2022249371 A1 JPWO2022249371 A1 JP WO2022249371A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
- H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
- H01J37/3056—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching for microworking, e. g. etching of gratings or trimming of electrical components
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/08—Ion sources; Ion guns
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/04—Ion sources; Ion guns using reflex discharge, e.g. Penning ion sources
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/045—Beam blanking or chopping, i.e. arrangements for momentarily interrupting exposure to the discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
- H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/02—Details
- H01J2237/024—Moving components not otherwise provided for
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/04—Means for controlling the discharge
- H01J2237/047—Changing particle velocity
- H01J2237/0473—Changing particle velocity accelerating
- H01J2237/04735—Changing particle velocity accelerating with electrostatic means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/245—Detection characterised by the variable being measured
- H01J2237/24571—Measurements of non-electric or non-magnetic variables
- H01J2237/24585—Other variables, e.g. energy, mass, velocity, time, temperature
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/317—Processing objects on a microscale
- H01J2237/3174—Etching microareas
- H01J2237/31745—Etching microareas for preparing specimen to be viewed in microscopes or analyzed in microanalysers
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Combustion & Propulsion (AREA)
- Sampling And Sample Adjustment (AREA)
- Electron Sources, Ion Sources (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/JP2021/020112 WO2022249371A1 (ja) | 2021-05-27 | 2021-05-27 | イオンミリング装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPWO2022249371A1 true JPWO2022249371A1 (https=) | 2022-12-01 |
| JPWO2022249371A5 JPWO2022249371A5 (https=) | 2024-02-15 |
| JP7556144B2 JP7556144B2 (ja) | 2024-09-25 |
Family
ID=84229552
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023523842A Active JP7556144B2 (ja) | 2021-05-27 | 2021-05-27 | イオンミリング装置 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US20240258062A1 (https=) |
| JP (1) | JP7556144B2 (https=) |
| KR (1) | KR102820384B1 (https=) |
| WO (1) | WO2022249371A1 (https=) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2016189614A1 (ja) * | 2015-05-25 | 2016-12-01 | 株式会社日立ハイテクノロジーズ | イオンミリング装置、及びイオンミリング方法 |
| DE102016105462A1 (de) * | 2015-11-26 | 2017-06-01 | Von Ardenne Gmbh | Ionenstrahlquelle, Prozessieranordnung und Verfahren |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6100619B2 (ja) | 2013-06-04 | 2017-03-22 | 株式会社日立ハイテクノロジーズ | イオン源およびイオンミリング装置 |
-
2021
- 2021-05-27 JP JP2023523842A patent/JP7556144B2/ja active Active
- 2021-05-27 KR KR1020237038765A patent/KR102820384B1/ko active Active
- 2021-05-27 WO PCT/JP2021/020112 patent/WO2022249371A1/ja not_active Ceased
- 2021-05-27 US US18/560,707 patent/US20240258062A1/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2016189614A1 (ja) * | 2015-05-25 | 2016-12-01 | 株式会社日立ハイテクノロジーズ | イオンミリング装置、及びイオンミリング方法 |
| DE102016105462A1 (de) * | 2015-11-26 | 2017-06-01 | Von Ardenne Gmbh | Ionenstrahlquelle, Prozessieranordnung und Verfahren |
Also Published As
| Publication number | Publication date |
|---|---|
| US20240258062A1 (en) | 2024-08-01 |
| KR20230169280A (ko) | 2023-12-15 |
| JP7556144B2 (ja) | 2024-09-25 |
| WO2022249371A1 (ja) | 2022-12-01 |
| KR102820384B1 (ko) | 2025-06-16 |
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