JPWO2022249371A1 - - Google Patents

Info

Publication number
JPWO2022249371A1
JPWO2022249371A1 JP2023523842A JP2023523842A JPWO2022249371A1 JP WO2022249371 A1 JPWO2022249371 A1 JP WO2022249371A1 JP 2023523842 A JP2023523842 A JP 2023523842A JP 2023523842 A JP2023523842 A JP 2023523842A JP WO2022249371 A1 JPWO2022249371 A1 JP WO2022249371A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2023523842A
Other languages
Japanese (ja)
Other versions
JP7556144B2 (ja
JPWO2022249371A5 (https=
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2022249371A1 publication Critical patent/JPWO2022249371A1/ja
Publication of JPWO2022249371A5 publication Critical patent/JPWO2022249371A5/ja
Application granted granted Critical
Publication of JP7556144B2 publication Critical patent/JP7556144B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H01J37/3053Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
    • H01J37/3056Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching for microworking, e. g. etching of gratings or trimming of electrical components
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/08Ion sources; Ion guns
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00Ion beam tubes
    • H01J27/02Ion sources; Ion guns
    • H01J27/04Ion sources; Ion guns using reflex discharge, e.g. Penning ion sources
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/045Beam blanking or chopping, i.e. arrangements for momentarily interrupting exposure to the discharge
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H01J37/3053Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02Details
    • H01J2237/024Moving components not otherwise provided for
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04Means for controlling the discharge
    • H01J2237/047Changing particle velocity
    • H01J2237/0473Changing particle velocity accelerating
    • H01J2237/04735Changing particle velocity accelerating with electrostatic means
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/245Detection characterised by the variable being measured
    • H01J2237/24571Measurements of non-electric or non-magnetic variables
    • H01J2237/24585Other variables, e.g. energy, mass, velocity, time, temperature
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30Electron or ion beam tubes for processing objects
    • H01J2237/317Processing objects on a microscale
    • H01J2237/3174Etching microareas
    • H01J2237/31745Etching microareas for preparing specimen to be viewed in microscopes or analyzed in microanalysers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Combustion & Propulsion (AREA)
  • Sampling And Sample Adjustment (AREA)
  • Electron Sources, Ion Sources (AREA)
JP2023523842A 2021-05-27 2021-05-27 イオンミリング装置 Active JP7556144B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2021/020112 WO2022249371A1 (ja) 2021-05-27 2021-05-27 イオンミリング装置

Publications (3)

Publication Number Publication Date
JPWO2022249371A1 true JPWO2022249371A1 (https=) 2022-12-01
JPWO2022249371A5 JPWO2022249371A5 (https=) 2024-02-15
JP7556144B2 JP7556144B2 (ja) 2024-09-25

Family

ID=84229552

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023523842A Active JP7556144B2 (ja) 2021-05-27 2021-05-27 イオンミリング装置

Country Status (4)

Country Link
US (1) US20240258062A1 (https=)
JP (1) JP7556144B2 (https=)
KR (1) KR102820384B1 (https=)
WO (1) WO2022249371A1 (https=)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016189614A1 (ja) * 2015-05-25 2016-12-01 株式会社日立ハイテクノロジーズ イオンミリング装置、及びイオンミリング方法
DE102016105462A1 (de) * 2015-11-26 2017-06-01 Von Ardenne Gmbh Ionenstrahlquelle, Prozessieranordnung und Verfahren

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6100619B2 (ja) 2013-06-04 2017-03-22 株式会社日立ハイテクノロジーズ イオン源およびイオンミリング装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016189614A1 (ja) * 2015-05-25 2016-12-01 株式会社日立ハイテクノロジーズ イオンミリング装置、及びイオンミリング方法
DE102016105462A1 (de) * 2015-11-26 2017-06-01 Von Ardenne Gmbh Ionenstrahlquelle, Prozessieranordnung und Verfahren

Also Published As

Publication number Publication date
US20240258062A1 (en) 2024-08-01
KR20230169280A (ko) 2023-12-15
JP7556144B2 (ja) 2024-09-25
WO2022249371A1 (ja) 2022-12-01
KR102820384B1 (ko) 2025-06-16

Similar Documents

Publication Publication Date Title
JPWO2023053437A1 (https=)
JPWO2022249371A1 (https=)
CN306125010S (https=)
CN306131839S (https=)
CN306115366S (https=)
CN305536616S (https=)
CN305536167S (https=)
CN305536156S (https=)
CN305699323S (https=)
CN305535923S (https=)
CN305535520S (https=)
CN305535495S (https=)
CN305534528S (https=)
CN305534482S (https=)
CN306114910S (https=)
CN306073255S (https=)
CN306071225S (https=)
CN306053484S (https=)
CN306045455S (https=)
CN306041340S (https=)
CN305747547S (https=)
CN305534023S (https=)
CN305533379S (https=)
CN306038946S (https=)
CN305532581S (https=)

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20231109

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20231109

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20240604

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20240805

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20240813

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20240911

R150 Certificate of patent or registration of utility model

Ref document number: 7556144

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150