JPWO2022196024A1 - - Google Patents

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Publication number
JPWO2022196024A1
JPWO2022196024A1 JP2023506765A JP2023506765A JPWO2022196024A1 JP WO2022196024 A1 JPWO2022196024 A1 JP WO2022196024A1 JP 2023506765 A JP2023506765 A JP 2023506765A JP 2023506765 A JP2023506765 A JP 2023506765A JP WO2022196024 A1 JPWO2022196024 A1 JP WO2022196024A1
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JP
Japan
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JP2023506765A
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Japanese (ja)
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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
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    • G03F7/004Photosensitive materials
    • G03F7/039Macromolecular compounds which are photodegradable, e.g. positive electron resists
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    • C07C219/32Compounds containing amino and esterified hydroxy groups bound to the same carbon skeleton having amino groups bound to carbon atoms of six-membered aromatic rings and esterified hydroxy groups bound to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings of the same carbon skeleton
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    • C07C2603/66Ring systems containing bridged rings containing three rings containing at least one ring with less than six members containing five-membered rings
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2603/00Systems containing at least three condensed rings
    • C07C2603/56Ring systems containing bridged rings
    • C07C2603/58Ring systems containing bridged rings containing three rings
    • C07C2603/70Ring systems containing bridged rings containing three rings containing only six-membered rings
    • C07C2603/74Adamantanes

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Citations (3)

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Publication number Priority date Publication date Assignee Title
JPH0973173A (ja) * 1995-06-28 1997-03-18 Fujitsu Ltd レジスト材料及びレジストパターンの形成方法
JPH09202811A (ja) * 1996-01-26 1997-08-05 Nippon Zeon Co Ltd 新規高性能アクリル酸エステル系重合体
JP2009086358A (ja) * 2007-09-28 2009-04-23 Fujifilm Corp ポジ型レジスト組成物およびこれを用いたパターン形成方法

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JP5292078B2 (ja) 2008-12-05 2013-09-18 富士フイルム株式会社 感活性光線または感放射線性樹脂組成物及び該組成物を用いたパターン形成方法
JP6287369B2 (ja) 2013-03-08 2018-03-07 Jsr株式会社 フォトレジスト組成物、レジストパターン形成方法、化合物及び重合体
JP6450660B2 (ja) 2014-08-25 2019-01-09 住友化学株式会社 塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0973173A (ja) * 1995-06-28 1997-03-18 Fujitsu Ltd レジスト材料及びレジストパターンの形成方法
JPH09202811A (ja) * 1996-01-26 1997-08-05 Nippon Zeon Co Ltd 新規高性能アクリル酸エステル系重合体
JP2009086358A (ja) * 2007-09-28 2009-04-23 Fujifilm Corp ポジ型レジスト組成物およびこれを用いたパターン形成方法

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