JPWO2022196024A1 - - Google Patents
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- Publication number
- JPWO2022196024A1 JPWO2022196024A1 JP2023506765A JP2023506765A JPWO2022196024A1 JP WO2022196024 A1 JPWO2022196024 A1 JP WO2022196024A1 JP 2023506765 A JP2023506765 A JP 2023506765A JP 2023506765 A JP2023506765 A JP 2023506765A JP WO2022196024 A1 JPWO2022196024 A1 JP WO2022196024A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
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- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
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- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/40—Esters of unsaturated alcohols, e.g. allyl (meth)acrylate
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C219/00—Compounds containing amino and esterified hydroxy groups bound to the same carbon skeleton
- C07C219/32—Compounds containing amino and esterified hydroxy groups bound to the same carbon skeleton having amino groups bound to carbon atoms of six-membered aromatic rings and esterified hydroxy groups bound to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings of the same carbon skeleton
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
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- C07C69/533—Monocarboxylic acid esters having only one carbon-to-carbon double bond
- C07C69/54—Acrylic acid esters; Methacrylic acid esters
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- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
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- C07C69/653—Acrylic acid esters; Methacrylic acid esters; Haloacrylic acid esters; Halomethacrylic acid esters
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D307/00—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
- C07D307/02—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings
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- C07D307/56—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D307/58—One oxygen atom, e.g. butenolide
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- C—CHEMISTRY; METALLURGY
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- C08F212/24—Phenols or alcohols
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- C08F220/301—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety and one oxygen in the alcohol moiety
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- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
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- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C2603/00—Systems containing at least three condensed rings
- C07C2603/56—Ring systems containing bridged rings
- C07C2603/58—Ring systems containing bridged rings containing three rings
- C07C2603/70—Ring systems containing bridged rings containing three rings containing only six-membered rings
- C07C2603/74—Adamantanes
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Emergency Medicine (AREA)
- Materials For Photolithography (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021045282 | 2021-03-18 | ||
| PCT/JP2021/048363 WO2022196024A1 (ja) | 2021-03-18 | 2021-12-24 | 感放射線性樹脂組成物、レジストパターン形成方法、重合体及び化合物 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPWO2022196024A1 true JPWO2022196024A1 (https=) | 2022-09-22 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023506765A Pending JPWO2022196024A1 (https=) | 2021-03-18 | 2021-12-24 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20230400767A1 (https=) |
| JP (1) | JPWO2022196024A1 (https=) |
| KR (2) | KR20230157298A (https=) |
| TW (2) | TW202546050A (https=) |
| WO (1) | WO2022196024A1 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2025153294A (ja) * | 2024-03-29 | 2025-10-10 | 東京応化工業株式会社 | レジスト組成物、レジストパターン形成方法、化合物、ラジカル重合開始剤、連鎖移動剤及び重合体 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0973173A (ja) * | 1995-06-28 | 1997-03-18 | Fujitsu Ltd | レジスト材料及びレジストパターンの形成方法 |
| JPH09202811A (ja) * | 1996-01-26 | 1997-08-05 | Nippon Zeon Co Ltd | 新規高性能アクリル酸エステル系重合体 |
| JP2009086358A (ja) * | 2007-09-28 | 2009-04-23 | Fujifilm Corp | ポジ型レジスト組成物およびこれを用いたパターン形成方法 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5292078B2 (ja) | 2008-12-05 | 2013-09-18 | 富士フイルム株式会社 | 感活性光線または感放射線性樹脂組成物及び該組成物を用いたパターン形成方法 |
| JP6287369B2 (ja) | 2013-03-08 | 2018-03-07 | Jsr株式会社 | フォトレジスト組成物、レジストパターン形成方法、化合物及び重合体 |
| JP6450660B2 (ja) | 2014-08-25 | 2019-01-09 | 住友化学株式会社 | 塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法 |
-
2021
- 2021-12-24 JP JP2023506765A patent/JPWO2022196024A1/ja active Pending
- 2021-12-24 WO PCT/JP2021/048363 patent/WO2022196024A1/ja not_active Ceased
- 2021-12-24 KR KR1020237024717A patent/KR20230157298A/ko active Pending
- 2021-12-24 KR KR1020257024592A patent/KR20250116785A/ko active Pending
-
2022
- 2022-02-07 TW TW114129164A patent/TW202546050A/zh unknown
- 2022-02-07 TW TW111104224A patent/TW202237574A/zh unknown
-
2023
- 2023-08-29 US US18/239,399 patent/US20230400767A1/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0973173A (ja) * | 1995-06-28 | 1997-03-18 | Fujitsu Ltd | レジスト材料及びレジストパターンの形成方法 |
| JPH09202811A (ja) * | 1996-01-26 | 1997-08-05 | Nippon Zeon Co Ltd | 新規高性能アクリル酸エステル系重合体 |
| JP2009086358A (ja) * | 2007-09-28 | 2009-04-23 | Fujifilm Corp | ポジ型レジスト組成物およびこれを用いたパターン形成方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2022196024A1 (ja) | 2022-09-22 |
| US20230400767A1 (en) | 2023-12-14 |
| KR20250116785A (ko) | 2025-08-01 |
| TW202237574A (zh) | 2022-10-01 |
| KR20230157298A (ko) | 2023-11-16 |
| TW202546050A (zh) | 2025-12-01 |
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