JPWO2021257180A5 - - Google Patents

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Publication number
JPWO2021257180A5
JPWO2021257180A5 JP2022558553A JP2022558553A JPWO2021257180A5 JP WO2021257180 A5 JPWO2021257180 A5 JP WO2021257180A5 JP 2022558553 A JP2022558553 A JP 2022558553A JP 2022558553 A JP2022558553 A JP 2022558553A JP WO2021257180 A5 JPWO2021257180 A5 JP WO2021257180A5
Authority
JP
Japan
Prior art keywords
transistor
semiconductor device
integrated semiconductor
gate
electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2022558553A
Other languages
English (en)
Japanese (ja)
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JP2023530546A5 (https=
JP2023530546A (ja
Publication date
Priority claimed from US16/903,961 external-priority patent/US11417644B2/en
Application filed filed Critical
Publication of JP2023530546A publication Critical patent/JP2023530546A/ja
Publication of JP2023530546A5 publication Critical patent/JP2023530546A5/ja
Publication of JPWO2021257180A5 publication Critical patent/JPWO2021257180A5/ja
Pending legal-status Critical Current

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JP2022558553A 2020-06-17 2021-04-23 共有電極を備えた集積トランジスタ Pending JP2023530546A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US16/903,961 US11417644B2 (en) 2020-06-17 2020-06-17 Integration of multiple discrete GaN devices
US16/903,961 2020-06-17
PCT/US2021/028740 WO2021257180A1 (en) 2020-06-17 2021-04-23 Integrated transistors with shared electrode

Publications (3)

Publication Number Publication Date
JP2023530546A JP2023530546A (ja) 2023-07-19
JP2023530546A5 JP2023530546A5 (https=) 2024-04-22
JPWO2021257180A5 true JPWO2021257180A5 (https=) 2024-04-22

Family

ID=75888280

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022558553A Pending JP2023530546A (ja) 2020-06-17 2021-04-23 共有電極を備えた集積トランジスタ

Country Status (5)

Country Link
US (1) US11417644B2 (https=)
EP (1) EP4169065A1 (https=)
JP (1) JP2023530546A (https=)
CN (1) CN115485827A (https=)
WO (1) WO2021257180A1 (https=)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11863130B2 (en) 2020-04-03 2024-01-02 Wolfspeed, Inc. Group III nitride-based radio frequency transistor amplifiers having source, gate and/or drain conductive vias
JP7474349B2 (ja) 2020-04-03 2024-04-24 ウルフスピード インコーポレイテッド Rf増幅器パッケージ
US12074123B2 (en) 2020-04-03 2024-08-27 Macom Technology Solutions Holdings, Inc. Multi level radio frequency (RF) integrated circuit components including passive devices
JP7691434B2 (ja) * 2020-04-03 2025-06-11 マコム テクノロジー ソリューションズ ホールディングス, インコーポレイテッド 裏面ソース端子、ゲート端子及び/又はドレイン端子を有するiii族窒化物ベースの高周波増幅器
US20220376041A1 (en) * 2021-04-12 2022-11-24 Innoscience (Suzhou) Technology Co., Ltd. Semiconductor device and method for manufacturing the same
US20240429870A1 (en) * 2023-06-23 2024-12-26 Macom Technology Solutions Holdings, Inc. Group III Nitride Doherty Amplifier Using Different Epitaxial Structures
WO2025197830A1 (ja) * 2024-03-21 2025-09-25 ヌヴォトンテクノロジージャパン株式会社 ドハティ増幅器

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4120394A1 (de) 1991-06-20 1992-12-24 Bosch Gmbh Robert Monolithisch integrierte schaltungsanordnung
JP3439290B2 (ja) * 1995-12-28 2003-08-25 日本電気株式会社 半導体装置
US7898047B2 (en) 2003-03-03 2011-03-01 Samsung Electronics Co., Ltd. Integrated nitride and silicon carbide-based devices and methods of fabricating integrated nitride-based devices
SE528473C2 (sv) * 2005-02-28 2006-11-21 Infineon Technologies Ag Monolitiskt integrerad effektförstärkaranordning
CN1893084A (zh) * 2005-07-07 2007-01-10 松下电器产业株式会社 半导体装置
KR20070036939A (ko) * 2005-09-30 2007-04-04 주식회사 하이닉스반도체 상변환 기억 소자 및 그의 제조방법
JP4743077B2 (ja) * 2006-10-23 2011-08-10 三菱電機株式会社 高周波電力増幅器
EP2339746B1 (en) 2009-12-15 2013-02-20 Nxp B.V. Doherty amplifier with composed transfer characteristic having multiple peak amplifiers
JP2012013664A (ja) * 2010-05-31 2012-01-19 Toshiba Corp 段間プローブ用パターン構造、段間測定方法、およびマルチチップモジュール高周波回路
JP6025295B2 (ja) * 2010-06-24 2016-11-16 富士通株式会社 化合物半導体装置
JP5361951B2 (ja) * 2011-06-17 2013-12-04 株式会社東芝 半導体電力増幅器
WO2014188651A1 (ja) * 2013-05-20 2014-11-27 パナソニックIpマネジメント株式会社 半導体装置
US9030260B2 (en) * 2013-07-19 2015-05-12 Alcatel Lucent Dual-band high efficiency Doherty amplifiers with hybrid packaged power devices
US10050139B2 (en) * 2016-06-24 2018-08-14 Infineon Technologies Ag Semiconductor device including a LDMOS transistor and method
US10978583B2 (en) * 2017-06-21 2021-04-13 Cree, Inc. Semiconductor devices having a plurality of unit cell transistors that have smoothed turn-on behavior and improved linearity
US20190028065A1 (en) * 2017-07-24 2019-01-24 Macom Technology Solutions Holdings, Inc. Fet operational temperature determination by gate structure resistance thermometry
US10325833B1 (en) 2018-02-20 2019-06-18 Newport Fab, Llc Bent polysilicon gate structure for small footprint radio frequency (RF) switch
US10600746B2 (en) * 2018-07-19 2020-03-24 Cree, Inc. Radio frequency transistor amplifiers and other multi-cell transistors having gaps and/or isolation structures between groups of unit cell transistors

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