JPWO2021252213A5 - - Google Patents

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Publication number
JPWO2021252213A5
JPWO2021252213A5 JP2022576080A JP2022576080A JPWO2021252213A5 JP WO2021252213 A5 JPWO2021252213 A5 JP WO2021252213A5 JP 2022576080 A JP2022576080 A JP 2022576080A JP 2022576080 A JP2022576080 A JP 2022576080A JP WO2021252213 A5 JPWO2021252213 A5 JP WO2021252213A5
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JP
Japan
Prior art keywords
substrate
enclosure
robot
end effector
arm
Prior art date
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Application number
JP2022576080A
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English (en)
Japanese (ja)
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JP2023530629A (ja
JP7609897B2 (ja
JP2023530629A5 (https=
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Priority claimed from US17/018,912 external-priority patent/US11315816B2/en
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Publication of JP2023530629A publication Critical patent/JP2023530629A/ja
Publication of JPWO2021252213A5 publication Critical patent/JPWO2021252213A5/ja
Publication of JP2023530629A5 publication Critical patent/JP2023530629A5/ja
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Publication of JP7609897B2 publication Critical patent/JP7609897B2/ja
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JP2022576080A 2020-06-10 2021-05-30 基板ハンドリング用局所化パージモジュール Active JP7609897B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US202063037008P 2020-06-10 2020-06-10
US63/037,008 2020-06-10
US17/018,912 2020-09-11
US17/018,912 US11315816B2 (en) 2020-06-10 2020-09-11 Localized purge module for substrate handling
PCT/US2021/035055 WO2021252213A1 (en) 2020-06-10 2021-05-30 Localized purge module for substrate handling

Publications (4)

Publication Number Publication Date
JP2023530629A JP2023530629A (ja) 2023-07-19
JPWO2021252213A5 true JPWO2021252213A5 (https=) 2024-03-19
JP2023530629A5 JP2023530629A5 (https=) 2024-03-19
JP7609897B2 JP7609897B2 (ja) 2025-01-07

Family

ID=78825911

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JP2022576080A Active JP7609897B2 (ja) 2020-06-10 2021-05-30 基板ハンドリング用局所化パージモジュール

Country Status (6)

Country Link
US (1) US11315816B2 (https=)
JP (1) JP7609897B2 (https=)
KR (1) KR102861296B1 (https=)
CN (2) CN119427428A (https=)
TW (1) TWI870578B (https=)
WO (1) WO2021252213A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12578285B2 (en) 2022-10-25 2026-03-17 Kla Corporation Gas flow configurations for semiconductor inspections

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JPH06326036A (ja) 1993-05-11 1994-11-25 Nissin Electric Co Ltd 気相成長装置
JP2000040730A (ja) 1998-07-24 2000-02-08 Dainippon Screen Mfg Co Ltd 基板搬送装置および基板処理装置
TW471008B (en) * 1999-07-09 2002-01-01 Tokyo Electron Ltd Substrate transport device
JP2003092335A (ja) 2001-09-18 2003-03-28 Toshiba Corp 基板搬送装置、これを用いた基板処理装置および基板処理方法
KR20040013965A (ko) 2002-08-09 2004-02-14 삼성전자주식회사 멀티 챔버형의 공정설비
JP3560962B1 (ja) * 2003-07-02 2004-09-02 エス・イー・エス株式会社 基板処理法及び基板処理装置
KR100534027B1 (ko) * 2004-02-09 2005-12-07 세메스 주식회사 기판 반송 장치
US7542127B2 (en) 2005-12-21 2009-06-02 Asml Netherlands B.V. Lithographic apparatus and method for manufacturing a device
US7755764B2 (en) 2007-01-26 2010-07-13 Kla-Tencor Corporation Purge gas flow control for high-precision film measurements using ellipsometry and reflectometry
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JP2009170740A (ja) * 2008-01-18 2009-07-30 Rorze Corp 搬送装置
KR100980706B1 (ko) * 2008-09-19 2010-09-08 세메스 주식회사 기판 이송 장치, 이를 갖는 기판 처리 장치 및 이의 기판 이송 방법
JP2010080469A (ja) * 2008-09-24 2010-04-08 Tokyo Electron Ltd 真空処理装置及び真空搬送装置
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US8830486B2 (en) 2011-07-04 2014-09-09 Kla-Tencor Corporation Atmospheric molecular contamination control with local purging
JP2013161924A (ja) * 2012-02-03 2013-08-19 Tokyo Electron Ltd 基板収容容器のパージ装置及びパージ方法
US9244368B2 (en) 2012-09-26 2016-01-26 Kla-Tencor Corporation Particle control near reticle and optics using showerhead
US9257320B2 (en) 2013-06-05 2016-02-09 GlobalFoundries, Inc. Wafer carrier purge apparatuses, automated mechanical handling systems including the same, and methods of handling a wafer carrier during integrated circuit fabrication
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JP6226190B2 (ja) 2014-02-20 2017-11-08 Tdk株式会社 パージシステム、及び該パージシステムに供せられるポッド及びロードポート装置
CN104907283B (zh) * 2014-03-11 2018-03-27 上海华虹宏力半导体制造有限公司 一种晶片清洁室
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KR20210080633A (ko) 2014-11-25 2021-06-30 어플라이드 머티어리얼스, 인코포레이티드 기판 캐리어 및 퍼지 챔버 환경 제어들을 이용하는 기판 프로세싱 시스템들, 장치, 및 방법들
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JP6876417B2 (ja) * 2016-12-02 2021-05-26 東京エレクトロン株式会社 基板処理装置の洗浄方法および基板処理装置の洗浄システム
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KR102212996B1 (ko) * 2019-01-02 2021-02-08 피에스케이홀딩스 (주) 기판 처리 장치 및 기판 처리 방법

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