JPWO2021241052A1 - - Google Patents
Info
- Publication number
- JPWO2021241052A1 JPWO2021241052A1 JP2022527570A JP2022527570A JPWO2021241052A1 JP WO2021241052 A1 JPWO2021241052 A1 JP WO2021241052A1 JP 2022527570 A JP2022527570 A JP 2022527570A JP 2022527570 A JP2022527570 A JP 2022527570A JP WO2021241052 A1 JPWO2021241052 A1 JP WO2021241052A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/08—Electroplating with moving electrolyte e.g. jet electroplating
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
- H05K3/188—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by direct electroplating
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Electroplating Methods And Accessories (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2020091691 | 2020-05-26 | ||
PCT/JP2021/015510 WO2021241052A1 (ja) | 2020-05-26 | 2021-04-14 | メッキ槽、メッキ装置及び電解メッキ方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPWO2021241052A1 true JPWO2021241052A1 (ja) | 2021-12-02 |
Family
ID=78744281
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2022527570A Pending JPWO2021241052A1 (ja) | 2020-05-26 | 2021-04-14 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JPWO2021241052A1 (ja) |
KR (1) | KR20230015910A (ja) |
CN (1) | CN115667593A (ja) |
WO (1) | WO2021241052A1 (ja) |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3411103B2 (ja) * | 1994-09-14 | 2003-05-26 | イビデン株式会社 | 電解めっき方法、電解めっき装置、電解めっき用ラック |
JP3803968B2 (ja) | 2002-10-22 | 2006-08-02 | 荏原ユージライト株式会社 | 酸性銅めっき方法および酸性銅めっき装置 |
JP2011176085A (ja) * | 2010-02-24 | 2011-09-08 | Sumitomo Bakelite Co Ltd | 基板の処理方法および処理装置 |
JP5279810B2 (ja) * | 2010-12-27 | 2013-09-04 | アルメックスPe株式会社 | 平板形状物の表面処理装置 |
JP6937669B2 (ja) * | 2017-11-21 | 2021-09-22 | 富士通インターコネクトテクノロジーズ株式会社 | 基板処理装置 |
-
2021
- 2021-04-14 WO PCT/JP2021/015510 patent/WO2021241052A1/ja active Application Filing
- 2021-04-14 JP JP2022527570A patent/JPWO2021241052A1/ja active Pending
- 2021-04-14 KR KR1020227040292A patent/KR20230015910A/ko unknown
- 2021-04-14 CN CN202180037407.XA patent/CN115667593A/zh active Pending
Also Published As
Publication number | Publication date |
---|---|
KR20230015910A (ko) | 2023-01-31 |
WO2021241052A1 (ja) | 2021-12-02 |
CN115667593A (zh) | 2023-01-31 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A625 | Written request for application examination (by other person) |
Free format text: JAPANESE INTERMEDIATE CODE: A625 Effective date: 20231023 |