JPWO2021216352A5 - - Google Patents

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Publication number
JPWO2021216352A5
JPWO2021216352A5 JP2022564144A JP2022564144A JPWO2021216352A5 JP WO2021216352 A5 JPWO2021216352 A5 JP WO2021216352A5 JP 2022564144 A JP2022564144 A JP 2022564144A JP 2022564144 A JP2022564144 A JP 2022564144A JP WO2021216352 A5 JPWO2021216352 A5 JP WO2021216352A5
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JP
Japan
Prior art keywords
flow
mode
control valve
pressure sensor
lcv
Prior art date
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Application number
JP2022564144A
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English (en)
Japanese (ja)
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JP2023523921A5 (https=
JP2023523921A (ja
JP7771082B2 (ja
Publication date
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Priority claimed from PCT/US2021/027555 external-priority patent/WO2021216352A1/en
Publication of JP2023523921A publication Critical patent/JP2023523921A/ja
Publication of JPWO2021216352A5 publication Critical patent/JPWO2021216352A5/ja
Publication of JP2023523921A5 publication Critical patent/JP2023523921A5/ja
Priority to JP2025186007A priority Critical patent/JP2026027337A/ja
Application granted granted Critical
Publication of JP7771082B2 publication Critical patent/JP7771082B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2022564144A 2020-04-24 2021-04-15 分流レスガス投与 Active JP7771082B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2025186007A JP2026027337A (ja) 2020-04-24 2025-11-05 分流レスガス投与

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US202063015243P 2020-04-24 2020-04-24
US63/015,243 2020-04-24
US202062706328P 2020-08-10 2020-08-10
US62/706,328 2020-08-10
PCT/US2021/027555 WO2021216352A1 (en) 2020-04-24 2021-04-15 Divertless gas-dosing

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2025186007A Division JP2026027337A (ja) 2020-04-24 2025-11-05 分流レスガス投与

Publications (4)

Publication Number Publication Date
JP2023523921A JP2023523921A (ja) 2023-06-08
JPWO2021216352A5 true JPWO2021216352A5 (https=) 2024-04-23
JP2023523921A5 JP2023523921A5 (https=) 2024-04-23
JP7771082B2 JP7771082B2 (ja) 2025-11-17

Family

ID=78270147

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2022564144A Active JP7771082B2 (ja) 2020-04-24 2021-04-15 分流レスガス投与
JP2025186007A Pending JP2026027337A (ja) 2020-04-24 2025-11-05 分流レスガス投与

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2025186007A Pending JP2026027337A (ja) 2020-04-24 2025-11-05 分流レスガス投与

Country Status (5)

Country Link
US (1) US12410517B2 (https=)
JP (2) JP7771082B2 (https=)
KR (1) KR20230007427A (https=)
CN (1) CN115443348A (https=)
WO (1) WO2021216352A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021216352A1 (en) 2020-04-24 2021-10-28 Lam Research Corporation Divertless gas-dosing

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4964484A (https=) * 1972-10-20 1974-06-21
US7628860B2 (en) 2004-04-12 2009-12-08 Mks Instruments, Inc. Pulsed mass flow delivery system and method
KR101161020B1 (ko) * 2006-03-30 2012-07-02 미쯔이 죠센 가부시키가이샤 원자층 성장 장치
JP4964484B2 (ja) 2006-03-31 2012-06-27 ステラケミファ株式会社 微細加工処理方法
JP5750281B2 (ja) 2011-03-07 2015-07-15 株式会社アルバック 真空一貫基板処理装置及び成膜方法
JP2013151720A (ja) * 2012-01-25 2013-08-08 Ulvac Japan Ltd 真空成膜装置
KR101661483B1 (ko) 2012-10-22 2016-09-30 다이요 닛산 가부시키가이샤 셀렌화수소 혼합 가스의 공급 방법 및 공급 장치
JP6413293B2 (ja) * 2014-03-27 2018-10-31 東京エレクトロン株式会社 成膜方法及び記憶媒体
JP6359913B2 (ja) * 2014-08-12 2018-07-18 東京エレクトロン株式会社 処理装置
JP6533740B2 (ja) * 2015-12-15 2019-06-19 Ckd株式会社 ガス流量監視方法及びガス流量監視装置
US10515783B2 (en) * 2016-02-23 2019-12-24 Lam Research Corporation Flow through line charge volume
JP7107648B2 (ja) * 2017-07-11 2022-07-27 株式会社堀場エステック 流体制御装置、流体制御システム、流体制御方法、及び、流体制御装置用プログラム
US10947621B2 (en) * 2017-10-23 2021-03-16 Applied Materials, Inc. Low vapor pressure chemical delivery
JP7182988B2 (ja) 2018-10-12 2022-12-05 東京エレクトロン株式会社 原料ガス供給装置、成膜装置及び原料ガス供給方法
WO2021216352A1 (en) 2020-04-24 2021-10-28 Lam Research Corporation Divertless gas-dosing

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