JPWO2021020325A1 - - Google Patents

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Publication number
JPWO2021020325A1
JPWO2021020325A1 JP2021537013A JP2021537013A JPWO2021020325A1 JP WO2021020325 A1 JPWO2021020325 A1 JP WO2021020325A1 JP 2021537013 A JP2021537013 A JP 2021537013A JP 2021537013 A JP2021537013 A JP 2021537013A JP WO2021020325 A1 JPWO2021020325 A1 JP WO2021020325A1
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2021537013A
Other languages
Japanese (ja)
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JP7672652B2 (ja
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Publication of JPWO2021020325A1 publication Critical patent/JPWO2021020325A1/ja
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Publication of JP7672652B2 publication Critical patent/JP7672652B2/ja
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/10—Compounds having one or more C—Si linkages containing nitrogen having a Si-N linkage
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
JP2021537013A 2019-07-30 2020-07-27 ケイ素イソシアナト化合物含有組成物及びその製造方法 Active JP7672652B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2019139392 2019-07-30
JP2019139392 2019-07-30
PCT/JP2020/028634 WO2021020325A1 (ja) 2019-07-30 2020-07-27 ケイ素イソシアナト化合物含有組成物及びその製造方法

Publications (2)

Publication Number Publication Date
JPWO2021020325A1 true JPWO2021020325A1 (https=) 2021-02-04
JP7672652B2 JP7672652B2 (ja) 2025-05-08

Family

ID=74229129

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021537013A Active JP7672652B2 (ja) 2019-07-30 2020-07-27 ケイ素イソシアナト化合物含有組成物及びその製造方法

Country Status (5)

Country Link
JP (1) JP7672652B2 (https=)
KR (1) KR20220039729A (https=)
CN (1) CN114174307A (https=)
TW (1) TWI884161B (https=)
WO (1) WO2021020325A1 (https=)

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5444689A (en) * 1977-09-12 1979-04-09 Nippon Kasei Chem Manufacture of isocyanic acid ester
JPS54119419A (en) * 1978-03-09 1979-09-17 Toshiba Silicone Manufacture of organoisocyanate silane
JPS62167785A (ja) * 1987-01-08 1987-07-24 Matsumoto Seiyaku Kogyo Kk ケイ素イソシアネ−トの製造法
JP2001240796A (ja) * 2000-02-29 2001-09-04 Ube Nitto Kasei Co Ltd 有機無機ハイブリッド−無機複合傾斜材料およびその用途
JP2005314325A (ja) * 2004-04-30 2005-11-10 Shin Etsu Chem Co Ltd β−ケトエステル構造含有有機ケイ素化合物の製造方法
JP2012500804A (ja) * 2008-08-22 2012-01-12 バクスター・インターナショナル・インコーポレイテッド ポリマーベンジルカルボネート誘導体

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5626895A (en) 1979-08-09 1981-03-16 Ichiro Kijima Preparation of silicon isocyanate compound
JPS55102589A (en) 1980-01-26 1980-08-05 Toyama Chem Co Ltd Preparation of organo-silicon isocyanates
JPS5832887A (ja) * 1981-08-19 1983-02-25 Matsumoto Seiyaku Kogyo Kk ケイ素イソシアネ−トの製造法
JP3452598B2 (ja) 1993-03-10 2003-09-29 芳首 阿部 トリイソシアナトシランの製造法
JP3522902B2 (ja) * 1995-06-03 2004-04-26 信越化学工業株式会社 ウレイド基含有アルコキシシランの製造方法
JP2000247982A (ja) 1999-02-26 2000-09-12 Matsumoto Seiyaku Kogyo Kk イソシアナトジシロキサンの製造法
CN1249069C (zh) * 2001-09-21 2006-04-05 陶氏康宁东丽硅氧烷株式会社 带有氰硫基的有机烷氧基硅烷的制备方法
JP5444689B2 (ja) 2008-08-06 2014-03-19 東洋紡株式会社 レーザー彫刻用凸版印刷原版及びそれから得られる凸版印刷版
JP6243215B2 (ja) * 2013-12-18 2017-12-06 大陽日酸株式会社 トリイソシアナトシランの精製方法及び供給方法
US10266554B2 (en) * 2017-05-31 2019-04-23 Momentive Performance Materials Inc. Preparation of isocyanatosilanes

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5444689A (en) * 1977-09-12 1979-04-09 Nippon Kasei Chem Manufacture of isocyanic acid ester
JPS54119419A (en) * 1978-03-09 1979-09-17 Toshiba Silicone Manufacture of organoisocyanate silane
JPS62167785A (ja) * 1987-01-08 1987-07-24 Matsumoto Seiyaku Kogyo Kk ケイ素イソシアネ−トの製造法
JP2001240796A (ja) * 2000-02-29 2001-09-04 Ube Nitto Kasei Co Ltd 有機無機ハイブリッド−無機複合傾斜材料およびその用途
JP2005314325A (ja) * 2004-04-30 2005-11-10 Shin Etsu Chem Co Ltd β−ケトエステル構造含有有機ケイ素化合物の製造方法
JP2012500804A (ja) * 2008-08-22 2012-01-12 バクスター・インターナショナル・インコーポレイテッド ポリマーベンジルカルボネート誘導体

Also Published As

Publication number Publication date
WO2021020325A1 (ja) 2021-02-04
KR20220039729A (ko) 2022-03-29
CN114174307A (zh) 2022-03-11
TW202112789A (zh) 2021-04-01
TWI884161B (zh) 2025-05-21
JP7672652B2 (ja) 2025-05-08

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