JPWO2021010490A5 - - Google Patents
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- Publication number
- JPWO2021010490A5 JPWO2021010490A5 JP2021533123A JP2021533123A JPWO2021010490A5 JP WO2021010490 A5 JPWO2021010490 A5 JP WO2021010490A5 JP 2021533123 A JP2021533123 A JP 2021533123A JP 2021533123 A JP2021533123 A JP 2021533123A JP WO2021010490 A5 JPWO2021010490 A5 JP WO2021010490A5
- Authority
- JP
- Japan
- Prior art keywords
- mol
- recording medium
- magnetic recording
- sputtering target
- less
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005477 sputtering target Methods 0.000 claims 18
- 229910052748 manganese Inorganic materials 0.000 claims 10
- 229910052720 vanadium Inorganic materials 0.000 claims 10
- 239000002184 metal Substances 0.000 claims 8
- 229910052751 metal Inorganic materials 0.000 claims 8
- 229910052804 chromium Inorganic materials 0.000 claims 6
- 239000012535 impurity Substances 0.000 claims 4
- 229910052697 platinum Inorganic materials 0.000 claims 4
- 229910052707 ruthenium Inorganic materials 0.000 claims 4
- 229910052796 boron Inorganic materials 0.000 claims 3
- 229910052684 Cerium Inorganic materials 0.000 claims 2
- 229910052693 Europium Inorganic materials 0.000 claims 2
- 229910052688 Gadolinium Inorganic materials 0.000 claims 2
- 229910052765 Lutetium Inorganic materials 0.000 claims 2
- 229910052779 Neodymium Inorganic materials 0.000 claims 2
- 229910052772 Samarium Inorganic materials 0.000 claims 2
- 229910052769 Ytterbium Inorganic materials 0.000 claims 2
- 229910052782 aluminium Inorganic materials 0.000 claims 2
- 229910052746 lanthanum Inorganic materials 0.000 claims 2
- 229910052750 molybdenum Inorganic materials 0.000 claims 2
- 229910052759 nickel Inorganic materials 0.000 claims 2
- 229910052758 niobium Inorganic materials 0.000 claims 2
- 229910052710 silicon Inorganic materials 0.000 claims 2
- 229910052715 tantalum Inorganic materials 0.000 claims 2
- 229910052721 tungsten Inorganic materials 0.000 claims 2
- 229910052727 yttrium Inorganic materials 0.000 claims 2
- 229910052725 zinc Inorganic materials 0.000 claims 2
- 229910052726 zirconium Inorganic materials 0.000 claims 2
- 229910004298 SiO 2 Inorganic materials 0.000 claims 1
- 229910010413 TiO 2 Inorganic materials 0.000 claims 1
- 238000004544 sputter deposition Methods 0.000 claims 1
- 230000005415 magnetization Effects 0.000 description 4
- 230000006911 nucleation Effects 0.000 description 3
- 238000010899 nucleation Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 2
- 101100457021 Caenorhabditis elegans mag-1 gene Proteins 0.000 description 1
- 101100067996 Mus musculus Gbp1 gene Proteins 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019132859 | 2019-07-18 | ||
| JP2019132859 | 2019-07-18 | ||
| PCT/JP2020/028611 WO2021010490A1 (ja) | 2019-07-18 | 2020-07-16 | 磁気記録媒体用スパッタリングターゲット |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPWO2021010490A1 JPWO2021010490A1 (https=) | 2021-01-21 |
| JPWO2021010490A5 true JPWO2021010490A5 (https=) | 2023-02-14 |
| JP7462636B2 JP7462636B2 (ja) | 2024-04-05 |
Family
ID=74210926
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021533123A Active JP7462636B2 (ja) | 2019-07-18 | 2020-07-16 | 磁気記録媒体用スパッタリングターゲット |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US12230485B2 (https=) |
| JP (1) | JP7462636B2 (https=) |
| CN (1) | CN114144541B (https=) |
| TW (1) | TWI812869B (https=) |
| WO (1) | WO2021010490A1 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20250182963A1 (en) * | 2022-03-11 | 2025-06-05 | Georgetown University | Boron-Based and High-Entropy Magnetic Materials |
| CN121219435A (zh) * | 2024-04-25 | 2025-12-26 | Ｊｘ金属株式会社 | 磁性材料靶材和磁性材料靶材组装件 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5988807A (ja) * | 1982-11-12 | 1984-05-22 | Nec Corp | 磁気記憶体 |
| JPH11175944A (ja) * | 1997-12-10 | 1999-07-02 | Hitachi Ltd | 磁気記録媒体及び磁気記憶装置 |
| US20060042938A1 (en) | 2004-09-01 | 2006-03-02 | Heraeus, Inc. | Sputter target material for improved magnetic layer |
| CN103180481B (zh) | 2010-12-22 | 2015-04-08 | 吉坤日矿日石金属株式会社 | 强磁性材料溅射靶 |
| JP6284126B2 (ja) * | 2014-12-15 | 2018-02-28 | 昭和電工株式会社 | 垂直記録媒体、垂直記録再生装置 |
| JP2016160530A (ja) * | 2015-03-05 | 2016-09-05 | 光洋應用材料科技股▲分▼有限公司 | 磁気合金スパッタリングターゲット及び磁気記録媒体用記録層 |
| WO2017170138A1 (ja) * | 2016-03-31 | 2017-10-05 | Ｊｘ金属株式会社 | 強磁性材スパッタリングターゲット |
| JP6958819B2 (ja) | 2016-11-01 | 2021-11-02 | 田中貴金属工業株式会社 | 磁気記録媒体用スパッタリングターゲット |
| MY191374A (en) * | 2016-12-28 | 2022-06-21 | Jx Nippon Mining & Metals Corp | Magnetic material sputtering target and method for manufacturing same |
-
2020
- 2020-07-16 US US17/628,065 patent/US12230485B2/en active Active
- 2020-07-16 WO PCT/JP2020/028611 patent/WO2021010490A1/ja not_active Ceased
- 2020-07-16 CN CN202080051547.8A patent/CN114144541B/zh active Active
- 2020-07-16 TW TW109124056A patent/TWI812869B/zh active
- 2020-07-16 JP JP2021533123A patent/JP7462636B2/ja active Active
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