JPWO2020241703A1 - - Google Patents
Info
- Publication number
- JPWO2020241703A1 JPWO2020241703A1 JP2021522824A JP2021522824A JPWO2020241703A1 JP WO2020241703 A1 JPWO2020241703 A1 JP WO2020241703A1 JP 2021522824 A JP2021522824 A JP 2021522824A JP 2021522824 A JP2021522824 A JP 2021522824A JP WO2020241703 A1 JPWO2020241703 A1 JP WO2020241703A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45563—Gas nozzles
- C23C16/45565—Shower nozzles
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F28—HEAT EXCHANGE IN GENERAL
- F28F—DETAILS OF HEAT-EXCHANGE AND HEAT-TRANSFER APPARATUS, OF GENERAL APPLICATION
- F28F9/00—Casings; Header boxes; Auxiliary supports for elements; Auxiliary members within casings
- F28F9/22—Arrangements for directing heat-exchange media into successive compartments, e.g. arrangements of guide plates
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Engineering & Computer Science (AREA)
- Thermal Sciences (AREA)
- Physics & Mathematics (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019101507 | 2019-05-30 | ||
| JP2019101507 | 2019-05-30 | ||
| PCT/JP2020/020956 WO2020241703A1 (ja) | 2019-05-30 | 2020-05-27 | 流路部材 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2020241703A1 true JPWO2020241703A1 (https=) | 2020-12-03 |
| JP7267413B2 JP7267413B2 (ja) | 2023-05-01 |
Family
ID=73553811
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021522824A Active JP7267413B2 (ja) | 2019-05-30 | 2020-05-27 | 流路部材 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US12516416B2 (https=) |
| JP (1) | JP7267413B2 (https=) |
| WO (1) | WO2020241703A1 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US12516416B2 (en) * | 2019-05-30 | 2026-01-06 | Kyocera Corporation | Flow path member |
| JP7678120B2 (ja) * | 2021-09-29 | 2025-05-15 | 京セラ株式会社 | シャワープレート |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02113333U (https=) * | 1989-02-23 | 1990-09-11 | ||
| JP2005123159A (ja) * | 2003-05-27 | 2005-05-12 | Matsushita Electric Works Ltd | プラズマ処理装置、プラズマ生成用の反応器の製造方法、及びプラズマ処理方法 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS56162499U (https=) * | 1980-05-07 | 1981-12-03 | ||
| US7543546B2 (en) | 2003-05-27 | 2009-06-09 | Matsushita Electric Works, Ltd. | Plasma processing apparatus, method for producing reaction vessel for plasma generation, and plasma processing method |
| KR200452532Y1 (ko) * | 2008-11-06 | 2011-03-07 | 주식회사 테스 | 가스 분사 유닛 |
| JP5062144B2 (ja) * | 2008-11-10 | 2012-10-31 | 東京エレクトロン株式会社 | ガスインジェクター |
| JP2015095551A (ja) | 2013-11-12 | 2015-05-18 | 東京エレクトロン株式会社 | シャワーヘッドアセンブリ及びプラズマ処理装置 |
| US10023959B2 (en) * | 2015-05-26 | 2018-07-17 | Lam Research Corporation | Anti-transient showerhead |
| JP2018148143A (ja) | 2017-03-08 | 2018-09-20 | 株式会社東芝 | シャワープレート、処理装置、及び吐出方法 |
| KR102204026B1 (ko) | 2018-07-06 | 2021-01-18 | 주식회사 케이에스엠컴포넌트 | 세라믹 샤워 헤드 및 그를 구비한 화학 기상 증착 장치 |
| US12516416B2 (en) * | 2019-05-30 | 2026-01-06 | Kyocera Corporation | Flow path member |
-
2020
- 2020-05-27 US US17/613,684 patent/US12516416B2/en active Active
- 2020-05-27 JP JP2021522824A patent/JP7267413B2/ja active Active
- 2020-05-27 WO PCT/JP2020/020956 patent/WO2020241703A1/ja not_active Ceased
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02113333U (https=) * | 1989-02-23 | 1990-09-11 | ||
| JP2005123159A (ja) * | 2003-05-27 | 2005-05-12 | Matsushita Electric Works Ltd | プラズマ処理装置、プラズマ生成用の反応器の製造方法、及びプラズマ処理方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| US12516416B2 (en) | 2026-01-06 |
| JP7267413B2 (ja) | 2023-05-01 |
| US20220298641A1 (en) | 2022-09-22 |
| WO2020241703A1 (ja) | 2020-12-03 |
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