JPWO2018177747A5 - - Google Patents

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Publication number
JPWO2018177747A5
JPWO2018177747A5 JP2019553253A JP2019553253A JPWO2018177747A5 JP WO2018177747 A5 JPWO2018177747 A5 JP WO2018177747A5 JP 2019553253 A JP2019553253 A JP 2019553253A JP 2019553253 A JP2019553253 A JP 2019553253A JP WO2018177747 A5 JPWO2018177747 A5 JP WO2018177747A5
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JP
Japan
Prior art keywords
measuring radiation
antireflection coating
measuring
microlithography
wafer
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JP2019553253A
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English (en)
Japanese (ja)
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JP2020515844A5 (https=
JP7300998B2 (ja
JP2020515844A (ja
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Priority claimed from DE102017205212.0A external-priority patent/DE102017205212A1/de
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Publication of JPWO2018177747A5 publication Critical patent/JPWO2018177747A5/ja
Publication of JP2020515844A5 publication Critical patent/JP2020515844A5/ja
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JP2019553253A 2017-03-28 2018-03-14 物体、ウェハ、及びマスクブランクの表面上の粒子を検出する方法 Active JP7300998B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102017205212.0 2017-03-28
DE102017205212.0A DE102017205212A1 (de) 2017-03-28 2017-03-28 Verfahren zum Detektieren von Partikeln an der Oberfläche eines Objekts, Wafer und Maskenblank
PCT/EP2018/056352 WO2018177747A1 (de) 2017-03-28 2018-03-14 Verfahren zum detektieren von partikeln an der oberfläche eines objekts, wafer und maskenblank

Publications (4)

Publication Number Publication Date
JP2020515844A JP2020515844A (ja) 2020-05-28
JPWO2018177747A5 true JPWO2018177747A5 (https=) 2022-11-17
JP2020515844A5 JP2020515844A5 (https=) 2022-11-17
JP7300998B2 JP7300998B2 (ja) 2023-06-30

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ID=61691960

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Application Number Title Priority Date Filing Date
JP2019553253A Active JP7300998B2 (ja) 2017-03-28 2018-03-14 物体、ウェハ、及びマスクブランクの表面上の粒子を検出する方法

Country Status (6)

Country Link
US (1) US11555783B2 (https=)
EP (1) EP3602198B1 (https=)
JP (1) JP7300998B2 (https=)
KR (1) KR102563712B1 (https=)
DE (1) DE102017205212A1 (https=)
WO (1) WO2018177747A1 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102020216258A1 (de) * 2020-12-18 2022-06-23 Q.ant GmbH Verfahren zum Kalibrieren eines Partikelsensors, Partikelsensor und Vorrichtung mit einem Partikelsensor
DE112021007875T5 (de) * 2021-06-24 2024-04-11 Beijing Tongmei Xtal Technology Co., Ltd. Verfahren und einrichtung zum detektieren von oberflächen-haze von materialien
CN116833169A (zh) * 2023-07-26 2023-10-03 青岛融合智能科技有限公司 盖板玻璃加工用非接触式除尘和缺陷检测装置

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JP2006270111A (ja) * 2006-04-21 2006-10-05 Hitachi Ltd 半導体デバイスの検査方法及びその装置
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