JPS6472997A - Heat treatment of compound semiconductor single crystal - Google Patents
Heat treatment of compound semiconductor single crystalInfo
- Publication number
- JPS6472997A JPS6472997A JP23150387A JP23150387A JPS6472997A JP S6472997 A JPS6472997 A JP S6472997A JP 23150387 A JP23150387 A JP 23150387A JP 23150387 A JP23150387 A JP 23150387A JP S6472997 A JPS6472997 A JP S6472997A
- Authority
- JP
- Japan
- Prior art keywords
- temp
- single crystal
- semiconductor single
- heat treatment
- crystal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23150387A JPS6472997A (en) | 1987-09-14 | 1987-09-14 | Heat treatment of compound semiconductor single crystal |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23150387A JPS6472997A (en) | 1987-09-14 | 1987-09-14 | Heat treatment of compound semiconductor single crystal |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6472997A true JPS6472997A (en) | 1989-03-17 |
| JPH0411520B2 JPH0411520B2 (enrdf_load_stackoverflow) | 1992-02-28 |
Family
ID=16924514
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP23150387A Granted JPS6472997A (en) | 1987-09-14 | 1987-09-14 | Heat treatment of compound semiconductor single crystal |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6472997A (enrdf_load_stackoverflow) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59190300A (ja) * | 1983-04-08 | 1984-10-29 | Hitachi Ltd | 半導体製造方法および装置 |
| JPS60210591A (ja) * | 1984-04-05 | 1985-10-23 | Hitachi Cable Ltd | 半絶縁性GaAs単結晶の製造方法 |
| JPS62162700A (ja) * | 1986-01-09 | 1987-07-18 | Furukawa Electric Co Ltd:The | 化合物半導体インゴツトの製造方法 |
-
1987
- 1987-09-14 JP JP23150387A patent/JPS6472997A/ja active Granted
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59190300A (ja) * | 1983-04-08 | 1984-10-29 | Hitachi Ltd | 半導体製造方法および装置 |
| JPS60210591A (ja) * | 1984-04-05 | 1985-10-23 | Hitachi Cable Ltd | 半絶縁性GaAs単結晶の製造方法 |
| JPS62162700A (ja) * | 1986-01-09 | 1987-07-18 | Furukawa Electric Co Ltd:The | 化合物半導体インゴツトの製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0411520B2 (enrdf_load_stackoverflow) | 1992-02-28 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| LAPS | Cancellation because of no payment of annual fees |