JPS6466956A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JPS6466956A
JPS6466956A JP62224478A JP22447887A JPS6466956A JP S6466956 A JPS6466956 A JP S6466956A JP 62224478 A JP62224478 A JP 62224478A JP 22447887 A JP22447887 A JP 22447887A JP S6466956 A JPS6466956 A JP S6466956A
Authority
JP
Japan
Prior art keywords
substrate
superconductor
thermal expansion
oxide superconductor
oxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62224478A
Other languages
Japanese (ja)
Inventor
Kazuyuki Sugahara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP62224478A priority Critical patent/JPS6466956A/en
Publication of JPS6466956A publication Critical patent/JPS6466956A/en
Pending legal-status Critical Current

Links

Landscapes

  • Superconductor Devices And Manufacturing Methods Thereof (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)

Abstract

PURPOSE:To prevent the generation of cracks in a superconductor wiring by using a substance, the difference of a thermal expansion coefficient of which with a superconductor is kept within twice, as a substrate and forming a thin insulator layer between the substrate and a semiconductor layer. CONSTITUTION:A Y-Ba-Cu-O group oxide superconductor 4 is employed as a wiring, and a MOS type FET having SOI structure is shaped. The thermal expansion coefficients of an silicon film 7 and oxide films 6, 22 largely differ from that of the oxide superconductor 4, but thickness is thinned as approximately 2mum, and stress generated at the time of the heat treatment of the formation of the oxide superconductor is reduced. A substrate 11 is composed of YSZ, a thermal expansion coefficient of which does not differ twice or more, and no stress is generated between the substrate 11 and the oxide superconductor 4 to heat treatment.
JP62224478A 1987-09-08 1987-09-08 Semiconductor device Pending JPS6466956A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62224478A JPS6466956A (en) 1987-09-08 1987-09-08 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62224478A JPS6466956A (en) 1987-09-08 1987-09-08 Semiconductor device

Publications (1)

Publication Number Publication Date
JPS6466956A true JPS6466956A (en) 1989-03-13

Family

ID=16814424

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62224478A Pending JPS6466956A (en) 1987-09-08 1987-09-08 Semiconductor device

Country Status (1)

Country Link
JP (1) JPS6466956A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10291231B2 (en) 2016-07-20 2019-05-14 Microsoft Technology Licensing, Llc Superconducting device with dummy elements

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10291231B2 (en) 2016-07-20 2019-05-14 Microsoft Technology Licensing, Llc Superconducting device with dummy elements

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