JPS6450520A - Liquid growth method - Google Patents

Liquid growth method

Info

Publication number
JPS6450520A
JPS6450520A JP20846287A JP20846287A JPS6450520A JP S6450520 A JPS6450520 A JP S6450520A JP 20846287 A JP20846287 A JP 20846287A JP 20846287 A JP20846287 A JP 20846287A JP S6450520 A JPS6450520 A JP S6450520A
Authority
JP
Japan
Prior art keywords
melt
particles
contained
melts
aluminum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP20846287A
Other languages
Japanese (ja)
Inventor
Katsuji Yoshida
Hiroshi Nishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP20846287A priority Critical patent/JPS6450520A/en
Publication of JPS6450520A publication Critical patent/JPS6450520A/en
Pending legal-status Critical Current

Links

Landscapes

  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)

Abstract

PURPOSE:To obtain a budge melt in which oxidation of aluminum in the melt is eliminated even if time is elapsed and the composition ratio of the aluminum in GaAlAs is not varied, by making aluminum particles as single substance without dissolving in the melt by containing the particles in the low temperature melt. CONSTITUTION:In the step of manufacturing a melt to be conducted in the step of liquid growing GaAlAs on a semiconductor substrate, GaAs of saturating amount is contained in solvent to be dissolved in high temperature to produce melt 5, and the melt 5 is then divided into a plurality of crucibles 3. Then, the melt 5 is cooled to the state immediately before it is solidified, predetermined amounts of aluminum particles 9 are contained in the respective melts 5, the melts 5 are further cooled and solidified. For example, when the melts are contained in all the crucibles 3, they are immediately quickly cooled, and when the melts become approx. 35 deg.C, a vessel 7 containing the particles 9 of the weight corresponding to the composition ratio (x) of Ga1xAlxAs is moved on the crucible 3, and the hole of the vessel 7 is brought into coincidence with the crucible 3. Then, an intermediate cover 8 is moved, the particles 9 are contained in the crucible 3, and the melt is further quickly cooled and solidified.
JP20846287A 1987-08-21 1987-08-21 Liquid growth method Pending JPS6450520A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20846287A JPS6450520A (en) 1987-08-21 1987-08-21 Liquid growth method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20846287A JPS6450520A (en) 1987-08-21 1987-08-21 Liquid growth method

Publications (1)

Publication Number Publication Date
JPS6450520A true JPS6450520A (en) 1989-02-27

Family

ID=16556586

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20846287A Pending JPS6450520A (en) 1987-08-21 1987-08-21 Liquid growth method

Country Status (1)

Country Link
JP (1) JPS6450520A (en)

Similar Documents

Publication Publication Date Title
JPS6450520A (en) Liquid growth method
US4906325A (en) Method of making single-crystal mercury cadmium telluride layers
EP0390671A3 (en) Process for determination of concentrations of metal impurities in czochralski single crystal silicon
RU2035799C1 (en) Heterostructure based on indium arsenide-antimonide-bismuthide and process of its manufacture
JPS5710227A (en) Manufacture of semiconductor wafer
JPS5776821A (en) Liquid phase epitaxial growing method
JPS56149399A (en) Liquid phase epitaxial growing method
White Salyut 6' Cosmonauts Break More Space Records
JPS55140792A (en) Manufacture of 3-5 group compound semiconductor single crystal
JPS5228258A (en) Method for growth of crystals from liquid phase
JPS5771893A (en) Solution growth of crystal of compound semiconductor
JP2559721B2 (en) Method for manufacturing semiconductor crystal
JPS57123887A (en) Preparation of single crystal
JPS5567129A (en) Method of epitaxial growth at liquid phase
JPS56116616A (en) Manufacture of semiconductor wafers
JPS54162685A (en) Liquid phase epitaxial growth method
JPS57206033A (en) Method of liquid phase epitaxial growth
JPS57167624A (en) Liquid phase epitaxial growth method
JPS6064440A (en) Liquid phase epitaxial growth method
JPS5550619A (en) Manufacturing single crystal
Maksimov Methods of Producing Single Crystals of Alloys Based on the System Fe--Cr--Co
JPS55117231A (en) Growing method of crystal
JPS55100295A (en) Production of single crystal thin film
JPS6461392A (en) Production of gaas single crystal
JPH01301592A (en) Method for forming molten liquid for growth of iii-v compound single crystal doped with impurity