JPS6447904A - Method for measuring gap between mask-wafer - Google Patents
Method for measuring gap between mask-waferInfo
- Publication number
- JPS6447904A JPS6447904A JP62204601A JP20460187A JPS6447904A JP S6447904 A JPS6447904 A JP S6447904A JP 62204601 A JP62204601 A JP 62204601A JP 20460187 A JP20460187 A JP 20460187A JP S6447904 A JPS6447904 A JP S6447904A
- Authority
- JP
- Japan
- Prior art keywords
- mask
- light
- interference fringes
- reflection
- incident
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Length Measuring Devices By Optical Means (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE:To remove the adverse effect of the reflection from the upper surface of a mask and to improve reliability in detecting a periodic length, by matching an incident angle at the upper surface of the mask with a Brewster angle, making the incident light to be the polarized light of a TM wave, and forming interference fringes. CONSTITUTION:A polarizing element 10 is provided in the light path of laser light 3. The incident light is made to be polarized light 3a of a TM wave. An incident angle at an upper surface 2b of a mask is matched with a Brewster angle thetai. The reflection from the upper surface 2b of the mask becomes zero. Therefore, the reflected lights are only the reflected light 4a from an upper surface 1a of a wafer and reflected light 5a from a lower surface 2a of the mask. Interference fringes 7a are formed at a light receiving plane 6. The interference fringes are not associated with the reflection from the upper surface 2b of the mask. The interference fringes are formed with the interference of two luminous fluxes based on only the reflected lights 4a and 5a. A beat phenomenon is removed. A desired periodic length X can be detected with high reliability.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62204601A JPS6447904A (en) | 1987-08-18 | 1987-08-18 | Method for measuring gap between mask-wafer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62204601A JPS6447904A (en) | 1987-08-18 | 1987-08-18 | Method for measuring gap between mask-wafer |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6447904A true JPS6447904A (en) | 1989-02-22 |
Family
ID=16493160
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62204601A Pending JPS6447904A (en) | 1987-08-18 | 1987-08-18 | Method for measuring gap between mask-wafer |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6447904A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101218542B1 (en) * | 2010-11-16 | 2013-01-21 | 한양대학교 에리카산학협력단 | Precision control stage |
US8413625B2 (en) | 2010-09-28 | 2013-04-09 | Fiat Powertrain Technologies S.P.A. | Transmission device between two camshafts of an internal combustion engine |
-
1987
- 1987-08-18 JP JP62204601A patent/JPS6447904A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8413625B2 (en) | 2010-09-28 | 2013-04-09 | Fiat Powertrain Technologies S.P.A. | Transmission device between two camshafts of an internal combustion engine |
KR101218542B1 (en) * | 2010-11-16 | 2013-01-21 | 한양대학교 에리카산학협력단 | Precision control stage |
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