JPS6433012A - Production of globular silica - Google Patents

Production of globular silica

Info

Publication number
JPS6433012A
JPS6433012A JP18644887A JP18644887A JPS6433012A JP S6433012 A JPS6433012 A JP S6433012A JP 18644887 A JP18644887 A JP 18644887A JP 18644887 A JP18644887 A JP 18644887A JP S6433012 A JPS6433012 A JP S6433012A
Authority
JP
Japan
Prior art keywords
silica
sol
xerogel
purity
hydrogel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP18644887A
Other languages
Japanese (ja)
Other versions
JPH0764543B2 (en
Inventor
Mutsuhiro Ito
Katsutoshi Okamura
Goro Yamada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
FUJI DEBUISON KAGAKU KK
Fuji-Davison Chemical Ltd
Original Assignee
FUJI DEBUISON KAGAKU KK
Fuji-Davison Chemical Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by FUJI DEBUISON KAGAKU KK, Fuji-Davison Chemical Ltd filed Critical FUJI DEBUISON KAGAKU KK
Priority to JP18644887A priority Critical patent/JPH0764543B2/en
Publication of JPS6433012A publication Critical patent/JPS6433012A/en
Publication of JPH0764543B2 publication Critical patent/JPH0764543B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Silicon Compounds (AREA)

Abstract

PURPOSE:To obtain the title high-purity silica gel having excellent resistance to heat and wear by drying a specified silica hydrogel with superheated steam at high temp. to form a silica xerogel. CONSTITUTION:An aq. alkali silicate soln. contg. 5-30wt.% SiO2 is neutralized to 6-9 pH by an acid (e.g., sulfuric acid) to obtain a silica sol, and the sol is gelated within 0.5-3sec by spraying the sol into the air, etc., to obtain a high-purity silica hydrogel contg., on a dry basis, >=99.8% SiO2, <=0.01% Fe2O3' <=0.04% CaO, <=0.04% Na2O, and <=0.02% Al2O3. The hydrogel is previously aged, as required, in an autoclave at <=0.5-5kg/cm<2> pressure for 0.5-24hr, and then dried by superheated steam at 100-1000 deg.C to form a silica xerogel. The xerogel is further calcined, as required, and steamed to obtain high-purity globular silica having 0.8-1.8ml/g pore volume, 20-500 m<2>/g surface area, and 80-1000Angstrom mean pore diameter.
JP18644887A 1987-07-24 1987-07-24 Spherical silica and its manufacturing method Expired - Fee Related JPH0764543B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18644887A JPH0764543B2 (en) 1987-07-24 1987-07-24 Spherical silica and its manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18644887A JPH0764543B2 (en) 1987-07-24 1987-07-24 Spherical silica and its manufacturing method

Publications (2)

Publication Number Publication Date
JPS6433012A true JPS6433012A (en) 1989-02-02
JPH0764543B2 JPH0764543B2 (en) 1995-07-12

Family

ID=16188632

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18644887A Expired - Fee Related JPH0764543B2 (en) 1987-07-24 1987-07-24 Spherical silica and its manufacturing method

Country Status (1)

Country Link
JP (1) JPH0764543B2 (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1149992A (en) * 1997-08-04 1999-02-23 Fuji Silysia Chem Ltd Delustering agent for paint and manufacture thereof
AU738176B2 (en) * 1996-05-29 2001-09-13 Delsitech Oy Dissolvable oxides for biological applications
WO2008026387A1 (en) * 2006-08-28 2008-03-06 Catalysts & Chemicals Industries Co., Ltd. Method of forming amorphous silica coating of low dielectric constant and amorphous silica coating of low dielectric constant obtained thereby
JP2013511461A (en) * 2009-11-19 2013-04-04 ベーエスハー ボッシュ ウント シーメンス ハオスゲレート ゲーエムベーハー Method for producing porous SiO2 xerogel having characteristic pore diameter by bottom-up method using precursor having organic solid skeleton support
JP2013511460A (en) * 2009-11-19 2013-04-04 ベーエスハー ボッシュ ウント シーメンス ハオスゲレート ゲーエムベーハー Porous SiO2 xerogel with characteristic pore size, its stable dry precursor and its use.
AU2007268589B2 (en) * 2006-05-31 2013-05-23 Fuji Silysia Chemical Ltd. Agent for supplying silicic acid component to algae and method of supplying silicic acid component to algae

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU738176B2 (en) * 1996-05-29 2001-09-13 Delsitech Oy Dissolvable oxides for biological applications
JPH1149992A (en) * 1997-08-04 1999-02-23 Fuji Silysia Chem Ltd Delustering agent for paint and manufacture thereof
AU2007268589B2 (en) * 2006-05-31 2013-05-23 Fuji Silysia Chemical Ltd. Agent for supplying silicic acid component to algae and method of supplying silicic acid component to algae
WO2008026387A1 (en) * 2006-08-28 2008-03-06 Catalysts & Chemicals Industries Co., Ltd. Method of forming amorphous silica coating of low dielectric constant and amorphous silica coating of low dielectric constant obtained thereby
JP2008053657A (en) * 2006-08-28 2008-03-06 Catalysts & Chem Ind Co Ltd Forming method of low-dielectric constant amorphous silica-based coating and low-dielectric constant amorphous silica-based coating obtained by this method
US8227028B2 (en) 2006-08-28 2012-07-24 Jgc Catalysts And Chemicals Ltd. Method for forming amorphous silica-based coating film with low dielectric constant and thus obtained amorphous silica-based coating film
JP2013511461A (en) * 2009-11-19 2013-04-04 ベーエスハー ボッシュ ウント シーメンス ハオスゲレート ゲーエムベーハー Method for producing porous SiO2 xerogel having characteristic pore diameter by bottom-up method using precursor having organic solid skeleton support
JP2013511460A (en) * 2009-11-19 2013-04-04 ベーエスハー ボッシュ ウント シーメンス ハオスゲレート ゲーエムベーハー Porous SiO2 xerogel with characteristic pore size, its stable dry precursor and its use.

Also Published As

Publication number Publication date
JPH0764543B2 (en) 1995-07-12

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