JPS6430222A - Method and device for coating - Google Patents

Method and device for coating

Info

Publication number
JPS6430222A
JPS6430222A JP18619287A JP18619287A JPS6430222A JP S6430222 A JPS6430222 A JP S6430222A JP 18619287 A JP18619287 A JP 18619287A JP 18619287 A JP18619287 A JP 18619287A JP S6430222 A JPS6430222 A JP S6430222A
Authority
JP
Japan
Prior art keywords
resist
peripheral part
sec
substrate
water soluble
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP18619287A
Other languages
Japanese (ja)
Inventor
Masataka Endo
Hideaki Shimoda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP18619287A priority Critical patent/JPS6430222A/en
Publication of JPS6430222A publication Critical patent/JPS6430222A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To prevent dust raised by scattering resist due to DUV (far ultraviolet ray) irradiation from accumulating by a method wherein, after spin-coating a substrate with a resist or a sensing resin material, only the peripheral part of substrate is spincoated with a water soluble polymer. CONSTITUTION:A substrate 1 is spin-coated with resist 2 in specified thickness. Next, only the peripheral part of resist 2 is spincoated with water soluble polymer 5. A coating device is turned, after dripping the resist 2, at 1000 RPM for 10 sec and then at 4000 RPM for 5 sec and additional 15 sec. Thus, the peripheral part of resist 2 is covered with the polyvinyl alcohol film 5 covering a bump of the resist 2. Later, the breakdown of peripheral part of resist 2 due to DUV irradiation can be completely avoided by the action of the covering water soluble polymer 5.
JP18619287A 1987-07-24 1987-07-24 Method and device for coating Pending JPS6430222A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18619287A JPS6430222A (en) 1987-07-24 1987-07-24 Method and device for coating

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18619287A JPS6430222A (en) 1987-07-24 1987-07-24 Method and device for coating

Publications (1)

Publication Number Publication Date
JPS6430222A true JPS6430222A (en) 1989-02-01

Family

ID=16183998

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18619287A Pending JPS6430222A (en) 1987-07-24 1987-07-24 Method and device for coating

Country Status (1)

Country Link
JP (1) JPS6430222A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8080364B2 (en) 2003-05-09 2011-12-20 Panasonic Corporation Pattern formation method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8080364B2 (en) 2003-05-09 2011-12-20 Panasonic Corporation Pattern formation method

Similar Documents

Publication Publication Date Title
EP1542078A4 (en) Composition for antireflection coating and method for forming pattern
KR870010148A (en) Profile lapping method and method of manufacturing adhesive composition by the method
JPS5434839A (en) Roller in fixing device
JPS6430222A (en) Method and device for coating
JPS57208556A (en) Photosensitive printing plate material
JPS5565949A (en) Subbing method for photographic material
JPS5651345A (en) Formation of cured rubber film
EP0304313A3 (en) Pattern forming material
ES446098A1 (en) Method to capture cockroaches. (Machine-translation by Google Translate, not legally binding)
JPS535283A (en) Resin coated sheet
JPS5354239A (en) Method of bonding photosensitive flexographic plate and rubber backingmaterial
JPS5276343A (en) Method of manufacturing goods with abrasion resistant film
EP0288220A3 (en) Doped polymer films for waveguides
JPS5434338A (en) Protective coating method
JPS5347270A (en) Semiconductor waver protecting film
JPS54153631A (en) Relief image formation method
JPS5330395A (en) Automatic ticket inspecting system
JPS55105607A (en) False teeth polymerization device
JPS5291666A (en) Photodiode
JPS5277186A (en) Films coated with resins
JPS57102930A (en) Surface finish of acryl resin substrate
JPS52111935A (en) Method of forming paint film on metal by ultraviolet curing.
JPS5373972A (en) Manufacture for semiconductor device
JPS5290160A (en) Waste water treatment method and its device
JPS57145325A (en) Manufacture of semiconductor device