JPS6423864U - - Google Patents
Info
- Publication number
- JPS6423864U JPS6423864U JP11829187U JP11829187U JPS6423864U JP S6423864 U JPS6423864 U JP S6423864U JP 11829187 U JP11829187 U JP 11829187U JP 11829187 U JP11829187 U JP 11829187U JP S6423864 U JPS6423864 U JP S6423864U
- Authority
- JP
- Japan
- Prior art keywords
- sample surface
- exhaust chamber
- preliminary exhaust
- sample
- beam irradiation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010894 electron beam technology Methods 0.000 claims description 2
- 230000001678 irradiating effect Effects 0.000 claims 1
- 238000005211 surface analysis Methods 0.000 claims 1
- 239000013078 crystal Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
Landscapes
- Analysing Materials By The Use Of Radiation (AREA)
- Electron Sources, Ion Sources (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11829187U JPH0548358Y2 (cs) | 1987-07-31 | 1987-07-31 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11829187U JPH0548358Y2 (cs) | 1987-07-31 | 1987-07-31 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6423864U true JPS6423864U (cs) | 1989-02-08 |
| JPH0548358Y2 JPH0548358Y2 (cs) | 1993-12-24 |
Family
ID=31362516
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11829187U Expired - Lifetime JPH0548358Y2 (cs) | 1987-07-31 | 1987-07-31 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0548358Y2 (cs) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0943174A (ja) * | 1995-07-28 | 1997-02-14 | Jeol Ltd | プラズマエッチング装置を備えた表面分析装置 |
| JP2016031928A (ja) * | 2014-07-29 | 2016-03-07 | ライカ ミクロジュステーメ ゲーエムベーハー | クライオ顕微鏡法のための操作容器 |
| WO2018020649A1 (ja) * | 2016-07-29 | 2018-02-01 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置 |
-
1987
- 1987-07-31 JP JP11829187U patent/JPH0548358Y2/ja not_active Expired - Lifetime
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0943174A (ja) * | 1995-07-28 | 1997-02-14 | Jeol Ltd | プラズマエッチング装置を備えた表面分析装置 |
| JP2016031928A (ja) * | 2014-07-29 | 2016-03-07 | ライカ ミクロジュステーメ ゲーエムベーハー | クライオ顕微鏡法のための操作容器 |
| US10144010B2 (en) | 2014-07-29 | 2018-12-04 | Leica Mikrosysteme Gmbh | Manipulation holder for cryomicroscopy |
| WO2018020649A1 (ja) * | 2016-07-29 | 2018-02-01 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0548358Y2 (cs) | 1993-12-24 |
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