JPS6410047U - - Google Patents
Info
- Publication number
- JPS6410047U JPS6410047U JP1987103644U JP10364487U JPS6410047U JP S6410047 U JPS6410047 U JP S6410047U JP 1987103644 U JP1987103644 U JP 1987103644U JP 10364487 U JP10364487 U JP 10364487U JP S6410047 U JPS6410047 U JP S6410047U
- Authority
- JP
- Japan
- Prior art keywords
- cover
- utility
- grounded electrode
- grounded
- plasma processing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000463 material Substances 0.000 claims 1
- 239000002184 metal Substances 0.000 claims 1
- 238000007789 sealing Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 1
Landscapes
- Treatment Of Fiber Materials (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987103644U JPH0646990Y2 (ja) | 1987-07-06 | 1987-07-06 | プラズマ処理装置 |
| US07/214,179 US4968918A (en) | 1987-07-06 | 1988-07-01 | Apparatus for plasma treatment |
| DE3887933T DE3887933T2 (de) | 1987-07-06 | 1988-07-05 | Plasma-Bearbeitungsgerät. |
| EP88110707A EP0298420B1 (en) | 1987-07-06 | 1988-07-05 | Apparatus for plasma treatment |
| KR1019880008345A KR950001541B1 (ko) | 1987-07-06 | 1988-07-06 | 플라즈마처리용 장치 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987103644U JPH0646990Y2 (ja) | 1987-07-06 | 1987-07-06 | プラズマ処理装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6410047U true JPS6410047U (cs) | 1989-01-19 |
| JPH0646990Y2 JPH0646990Y2 (ja) | 1994-11-30 |
Family
ID=31334664
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1987103644U Expired - Lifetime JPH0646990Y2 (ja) | 1987-07-06 | 1987-07-06 | プラズマ処理装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0646990Y2 (cs) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101367422B1 (ko) * | 2012-12-12 | 2014-02-26 | (주) 파카알지비 | 원단 표면처리장치 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58132161A (ja) * | 1982-01-26 | 1983-08-06 | 株式会社山東鉄工所 | 低温プラズマ処理装置 |
| JPS58163772A (ja) * | 1982-03-23 | 1983-09-28 | 株式会社山東鉄工所 | 低温プラズマ処理装置 |
| JPS59179631A (ja) * | 1983-03-31 | 1984-10-12 | Japan Synthetic Rubber Co Ltd | フイルムのプラズマ重合処理装置 |
| JPS59226028A (ja) * | 1983-06-06 | 1984-12-19 | Nitto Electric Ind Co Ltd | 真空処理装置 |
| JPS6048339A (ja) * | 1983-08-26 | 1985-03-16 | Unitika Ltd | シ−ト状物の低温プラズマ処理方法及び装置 |
-
1987
- 1987-07-06 JP JP1987103644U patent/JPH0646990Y2/ja not_active Expired - Lifetime
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58132161A (ja) * | 1982-01-26 | 1983-08-06 | 株式会社山東鉄工所 | 低温プラズマ処理装置 |
| JPS58163772A (ja) * | 1982-03-23 | 1983-09-28 | 株式会社山東鉄工所 | 低温プラズマ処理装置 |
| JPS59179631A (ja) * | 1983-03-31 | 1984-10-12 | Japan Synthetic Rubber Co Ltd | フイルムのプラズマ重合処理装置 |
| JPS59226028A (ja) * | 1983-06-06 | 1984-12-19 | Nitto Electric Ind Co Ltd | 真空処理装置 |
| JPS6048339A (ja) * | 1983-08-26 | 1985-03-16 | Unitika Ltd | シ−ト状物の低温プラズマ処理方法及び装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0646990Y2 (ja) | 1994-11-30 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR940010866A (ko) | 마이크로파 플라즈마 처리장치 및 처리방법 | |
| EP0295083A3 (en) | Apparatus and method for enhanced chemical processing in high pressure and atmospheric plasmas produced by high frequency electro-magnetic waves | |
| KR870010942A (ko) | 플라즈마표면처리장치 및 방법 | |
| JPH05179453A (ja) | プラズマ反応室およびプラズマ処理法 | |
| JPS6410047U (cs) | ||
| WO2004085693A3 (en) | Nonthermal plasma processor utilizing additive-gas injection and/or gas extraction | |
| JPS63136525A (ja) | ドライエツチング装置 | |
| GB1153787A (en) | Method and apparatus for Glow Cleaning | |
| KR920005270A (ko) | 미세가공장치 및 방법 | |
| JPS62136579A (ja) | エツチング方法 | |
| JP3079838B2 (ja) | プラズマcvd法およびプラズマcvd装置 | |
| JPS5846639A (ja) | プラズマ処理装置 | |
| DE3673981D1 (de) | Vorrichtung zur oberflaechenbehandlung von gegenstaenden. | |
| JP2952957B2 (ja) | 連続表面処理装置 | |
| JPS6215244Y2 (cs) | ||
| JP2791795B2 (ja) | エッチング装置 | |
| JPH069490Y2 (ja) | 半導体ウエハのプラズマアツシング装置 | |
| JPS5732637A (en) | Dry etching apparatus | |
| JPS5512632A (en) | Ion source device for mass spectrometer | |
| JPS63149941U (cs) | ||
| GB763541A (en) | Improvements in or relating to apparatus for the continuous treatment in vacuo of wire or other strip-like material | |
| JPS5917193B2 (ja) | スパツタリング装置 | |
| JPS5516475A (en) | Plasma processing unit | |
| JPS559107A (en) | Ion generation method and device for ionization detection | |
| JPS6230327A (ja) | ドライエツチング装置 |