JPS6394962U - - Google Patents
Info
- Publication number
- JPS6394962U JPS6394962U JP19021486U JP19021486U JPS6394962U JP S6394962 U JPS6394962 U JP S6394962U JP 19021486 U JP19021486 U JP 19021486U JP 19021486 U JP19021486 U JP 19021486U JP S6394962 U JPS6394962 U JP S6394962U
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- plasma
- microwave
- utility
- model registration
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims description 7
- 238000006243 chemical reaction Methods 0.000 claims description 3
- 238000001816 cooling Methods 0.000 claims description 3
- 238000005268 plasma chemical vapour deposition Methods 0.000 claims description 3
- 239000002826 coolant Substances 0.000 claims 1
- 239000003507 refrigerant Substances 0.000 description 2
- 239000010453 quartz Substances 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19021486U JPS6394962U (https=) | 1986-12-09 | 1986-12-09 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19021486U JPS6394962U (https=) | 1986-12-09 | 1986-12-09 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6394962U true JPS6394962U (https=) | 1988-06-18 |
Family
ID=31143230
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19021486U Pending JPS6394962U (https=) | 1986-12-09 | 1986-12-09 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6394962U (https=) |
-
1986
- 1986-12-09 JP JP19021486U patent/JPS6394962U/ja active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US6156667A (en) | Methods and apparatus for plasma processing | |
| US4804431A (en) | Microwave plasma etching machine and method of etching | |
| KR970067610A (ko) | 유도결합형 플라즈마 cvd장치 | |
| JPS5578524A (en) | Manufacture of semiconductor device | |
| JPS5930130B2 (ja) | 気相成長方法 | |
| US5491112A (en) | Method and arrangement for treating silicon plates | |
| US4836902A (en) | Method and apparatus for removing coating from substrate | |
| JPS6394962U (https=) | ||
| CA1333786C (en) | Process for producing patterns in dielectric layers formed by plasma enhanced chemical vapor deposition (pecvd) | |
| JPH04181646A (ja) | マイクロ波プラズマ装置 | |
| JP2697464B2 (ja) | マイクロ波プラズマ処理装置 | |
| JPS63190635A (ja) | マイクロ波プラズマ処理装置 | |
| JPH01120810A (ja) | マイクロ波プラズマ発生装置 | |
| JPS63235480A (ja) | マイクロ波プラズマｃｖｄ装置 | |
| JPH01176700A (ja) | 熱プラズマ発生装置 | |
| JP3251643B2 (ja) | プラズマ処理装置及び基板の処理方法 | |
| JPH0543097Y2 (https=) | ||
| JPH036862U (https=) | ||
| JP2972507B2 (ja) | マイクロ波プラズマ処理装置 | |
| JPS60253212A (ja) | 気相成長装置 | |
| JPH04127426A (ja) | プラズマエッチング装置 | |
| JPS6446916A (en) | Vacuum thin-film formation device | |
| JPH07283203A (ja) | 表面処理装置 | |
| JPH07130493A (ja) | マイクロ波放電管の冷却方法及び装置 | |
| JPS6188527A (ja) | 半導体プロセス装置 |