JPS6367350B2 - - Google Patents
Info
- Publication number
- JPS6367350B2 JPS6367350B2 JP59001921A JP192184A JPS6367350B2 JP S6367350 B2 JPS6367350 B2 JP S6367350B2 JP 59001921 A JP59001921 A JP 59001921A JP 192184 A JP192184 A JP 192184A JP S6367350 B2 JPS6367350 B2 JP S6367350B2
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor layer
- layer
- semiconductor
- laminated
- gaas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000004065 semiconductor Substances 0.000 claims description 38
- 229910001218 Gallium arsenide Inorganic materials 0.000 claims description 12
- 230000031700 light absorption Effects 0.000 claims description 11
- 239000000203 mixture Substances 0.000 claims description 5
- 150000001875 compounds Chemical class 0.000 claims description 3
- 239000013078 crystal Substances 0.000 description 18
- 239000007791 liquid phase Substances 0.000 description 15
- 238000005253 cladding Methods 0.000 description 11
- 238000010521 absorption reaction Methods 0.000 description 6
- 230000010355 oscillation Effects 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000001020 plasma etching Methods 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 230000007547 defect Effects 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 230000002411 adverse Effects 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 125000005842 heteroatom Chemical group 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/2205—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure comprising special burying or current confinement layers
- H01S5/2218—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure comprising special burying or current confinement layers having special optical properties
- H01S5/2219—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure comprising special burying or current confinement layers having special optical properties absorbing
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/223—Buried stripe structure
- H01S5/2231—Buried stripe structure with inner confining structure only between the active layer and the upper electrode
Landscapes
- Semiconductor Lasers (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP192184A JPS59171188A (ja) | 1984-01-11 | 1984-01-11 | 半導体レ−ザ素子 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP192184A JPS59171188A (ja) | 1984-01-11 | 1984-01-11 | 半導体レ−ザ素子 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS59171188A JPS59171188A (ja) | 1984-09-27 |
JPS6367350B2 true JPS6367350B2 (fr) | 1988-12-26 |
Family
ID=11515054
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP192184A Granted JPS59171188A (ja) | 1984-01-11 | 1984-01-11 | 半導体レ−ザ素子 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59171188A (fr) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05254378A (ja) * | 1991-11-18 | 1993-10-05 | Eberhard Wissmann | 後ろ向き駐車援助装置 |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2585230B2 (ja) * | 1986-09-16 | 1997-02-26 | 株式会社日立製作所 | 半導体レ−ザ装置 |
JPH01186688A (ja) * | 1987-09-02 | 1989-07-26 | Sharp Corp | 半導体レーザ装置 |
JP2674594B2 (ja) * | 1996-05-31 | 1997-11-12 | 株式会社日立製作所 | 半導体レーザ装置 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5228281A (en) * | 1975-08-28 | 1977-03-03 | Fujitsu Ltd | Light emitting semiconductor device |
-
1984
- 1984-01-11 JP JP192184A patent/JPS59171188A/ja active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5228281A (en) * | 1975-08-28 | 1977-03-03 | Fujitsu Ltd | Light emitting semiconductor device |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05254378A (ja) * | 1991-11-18 | 1993-10-05 | Eberhard Wissmann | 後ろ向き駐車援助装置 |
Also Published As
Publication number | Publication date |
---|---|
JPS59171188A (ja) | 1984-09-27 |
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