JPS6364767U - - Google Patents
Info
- Publication number
- JPS6364767U JPS6364767U JP15910486U JP15910486U JPS6364767U JP S6364767 U JPS6364767 U JP S6364767U JP 15910486 U JP15910486 U JP 15910486U JP 15910486 U JP15910486 U JP 15910486U JP S6364767 U JPS6364767 U JP S6364767U
- Authority
- JP
- Japan
- Prior art keywords
- processing chamber
- processing
- porous member
- exhaust device
- evacuating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010586 diagram Methods 0.000 description 2
- 238000007738 vacuum evaporation Methods 0.000 description 2
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15910486U JPS6364767U (fr) | 1986-10-16 | 1986-10-16 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15910486U JPS6364767U (fr) | 1986-10-16 | 1986-10-16 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6364767U true JPS6364767U (fr) | 1988-04-28 |
Family
ID=31083222
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15910486U Pending JPS6364767U (fr) | 1986-10-16 | 1986-10-16 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6364767U (fr) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107567653A (zh) * | 2015-05-15 | 2018-01-09 | 应用材料公司 | 负载锁定腔室、具有负载锁定腔室的真空处理系统和用于抽空负载锁定腔室的方法 |
-
1986
- 1986-10-16 JP JP15910486U patent/JPS6364767U/ja active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107567653A (zh) * | 2015-05-15 | 2018-01-09 | 应用材料公司 | 负载锁定腔室、具有负载锁定腔室的真空处理系统和用于抽空负载锁定腔室的方法 |
KR20180008720A (ko) * | 2015-05-15 | 2018-01-24 | 어플라이드 머티어리얼스, 인코포레이티드 | 로드 록 챔버, 로드 록 챔버를 갖는 진공 프로세싱 시스템, 및 로드 록 챔버를 진공배기하기 위한 방법 |
JP2018515932A (ja) * | 2015-05-15 | 2018-06-14 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | ロードロックチャンバ、ロードロックチャンバを有する真空処理システム及びロードロックチャンバを排気する方法 |
CN107567653B (zh) * | 2015-05-15 | 2021-08-06 | 应用材料公司 | 负载锁定腔室、真空处理系统和抽空负载锁定腔室的方法 |