JPS6363028A - Illuminating optical device - Google Patents

Illuminating optical device

Info

Publication number
JPS6363028A
JPS6363028A JP61208648A JP20864886A JPS6363028A JP S6363028 A JPS6363028 A JP S6363028A JP 61208648 A JP61208648 A JP 61208648A JP 20864886 A JP20864886 A JP 20864886A JP S6363028 A JPS6363028 A JP S6363028A
Authority
JP
Japan
Prior art keywords
mask
image forming
forming surface
illuminance distribution
optical system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP61208648A
Other languages
Japanese (ja)
Inventor
Hideo Mizutani
Masahiro Nakagawa
Makoto Uehara
Masato Shibuya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP61208648A priority Critical patent/JPS6363028A/en
Publication of JPS6363028A publication Critical patent/JPS6363028A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70058Mask illumination systems

Abstract

PURPOSE: To prevent an uneven illuminance on an image forming surface and to obtain a prescribed illuminance distribution by correcting an illuminance distribution on a mask obtained by a illuminating light in accordance with a transmittivity characteristic of a projecting optical system.
CONSTITUTION: An illuminating optical device 1 makes an illuminating light obtained from light source parts 2W8 incident onto the mask 9, allows a transmission light obtained through the mask 9 to form an image on an image forming surface 11 through a projecting optical system 10, and projects a pattern which has been formed on the mask 9, to the image forming surface 11. Also, this device is provided with a correcting means 8 for correcting an illuminance distribution on the mask 9 obtained by an illuminating light in accordance with a transmittivity characteristic of the projecting optical system 10. In this way, an illuminance of each part in which the transmission light of the mask 9 forms an image in the image forming surface 11 can be set to a prescribed illuminance distribution.
COPYRIGHT: (C)1988,JPO&Japio
JP61208648A 1986-09-04 1986-09-04 Illuminating optical device Pending JPS6363028A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61208648A JPS6363028A (en) 1986-09-04 1986-09-04 Illuminating optical device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61208648A JPS6363028A (en) 1986-09-04 1986-09-04 Illuminating optical device

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP8132784A Division JPH0922119A (en) 1996-04-30 1996-04-30 Production of semiconductor

Publications (1)

Publication Number Publication Date
JPS6363028A true JPS6363028A (en) 1988-03-19

Family

ID=16559727

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61208648A Pending JPS6363028A (en) 1986-09-04 1986-09-04 Illuminating optical device

Country Status (1)

Country Link
JP (1) JPS6363028A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5715089A (en) * 1991-09-06 1998-02-03 Nikon Corporation Exposure method and apparatus therefor
US5798823A (en) * 1994-11-21 1998-08-25 Nikon Corporation Illumination optical apparatus and projection exposure apparatus using it

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49130224A (en) * 1973-04-13 1974-12-13
JPS6076728A (en) * 1983-10-04 1985-05-01 Nippon Kogaku Kk <Nikon> Projecting and exposing device
JPS62115119A (en) * 1985-09-24 1987-05-26 American Semiconductor Equip T Higher uniformity in output illumination of optical system

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49130224A (en) * 1973-04-13 1974-12-13
JPS6076728A (en) * 1983-10-04 1985-05-01 Nippon Kogaku Kk <Nikon> Projecting and exposing device
JPS62115119A (en) * 1985-09-24 1987-05-26 American Semiconductor Equip T Higher uniformity in output illumination of optical system

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5715089A (en) * 1991-09-06 1998-02-03 Nikon Corporation Exposure method and apparatus therefor
US6094305A (en) * 1991-09-06 2000-07-25 Nikon Corporation Exposure method and apparatus therefor
US5798823A (en) * 1994-11-21 1998-08-25 Nikon Corporation Illumination optical apparatus and projection exposure apparatus using it

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