JPS6356920B2 - - Google Patents
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- Publication number
- JPS6356920B2 JPS6356920B2 JP56184496A JP18449681A JPS6356920B2 JP S6356920 B2 JPS6356920 B2 JP S6356920B2 JP 56184496 A JP56184496 A JP 56184496A JP 18449681 A JP18449681 A JP 18449681A JP S6356920 B2 JPS6356920 B2 JP S6356920B2
- Authority
- JP
- Japan
- Prior art keywords
- sio
- wavelength
- shows
- spectral characteristics
- reflection spectral
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 229910004283 SiO 4 Inorganic materials 0.000 claims description 13
- 239000000463 material Substances 0.000 claims description 9
- 230000003287 optical effect Effects 0.000 claims description 8
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 7
- 150000001875 compounds Chemical class 0.000 claims description 7
- 229910052709 silver Inorganic materials 0.000 claims description 3
- 239000010944 silver (metal) Substances 0.000 description 53
- 230000003595 spectral effect Effects 0.000 description 36
- 230000035945 sensitivity Effects 0.000 description 13
- 238000010438 heat treatment Methods 0.000 description 9
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 6
- 206010034972 Photosensitivity reaction Diseases 0.000 description 5
- 230000036211 photosensitivity Effects 0.000 description 5
- 239000011521 glass Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 101710134784 Agnoprotein Proteins 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 230000001678 irradiating effect Effects 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 229910052697 platinum Inorganic materials 0.000 description 3
- 238000003786 synthesis reaction Methods 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- 229910016066 BaSi Inorganic materials 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000002178 crystalline material Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000002845 discoloration Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000010946 fine silver Substances 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 108091008695 photoreceptors Proteins 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
Landscapes
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Silicates, Zeolites, And Molecular Sieves (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
Description
【発明の詳細な説明】
本発明は、書換え可能な光学記録材料に関す
る。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to rewritable optical recording materials.
銀Agと二酸化ケイ素SiO2を含む感光材料とし
ては、フオトクロミツクガラスが知られている。
これは、SiO2及びB2O3を主成分としたガラスマ
トリツクス中に、銀とハロゲンを導入し、600℃
〜700℃の温度で数十分〜数時間熱処理し、感光
体となるハロゲン化銀微粒子を析出させたもので
ある。フオトクロミツクガラスは、紫外光及び可
視光の照射により黒化し、また加熱することによ
り速やかに退色するため、書換え可能な記録材料
として使用しうるものである。しかし、銅Cu等
の添加物の導入及びガラス製造中に飛散しやすい
Agやハロゲンの量の最適化を図るために、製造
工程が複雑であつたり、また感光波長の長波長化
が難しく、更に室温においても退色して記録が失
われる等の欠点があつた。 Photochromic glass is known as a photosensitive material containing silver Ag and silicon dioxide SiO 2 .
This involves introducing silver and halogen into a glass matrix mainly composed of SiO 2 and B 2 O 3 , and heating it at 600°C.
It is heat-treated at a temperature of ~700°C for several tens of minutes to several hours to precipitate fine silver halide particles that will become the photoreceptor. Photochromic glass can be used as a rewritable recording material because it turns black when irradiated with ultraviolet light and visible light, and rapidly fades when heated. However, it is easy to scatter during the introduction of additives such as copper and glass manufacturing.
In order to optimize the amount of Ag and halogen, the manufacturing process was complicated, it was difficult to increase the sensitivity wavelength to a longer wavelength, and there were also drawbacks such as discoloration and loss of recording even at room temperature.
本発明の目的は、製造方法が簡便で、現像処理
が不要であり、且つ書換え可能な光学記録材料を
提供するにある。 An object of the present invention is to provide an optical recording material that is easy to manufacture, does not require development processing, and is rewritable.
すなわち本発明を概説すれば、本発明は、
Ag2O―SO2系の化合物で構成することを特徴と
する光学記録材料に関する。 That is, if the present invention is summarized, the present invention has the following features:
The present invention relates to an optical recording material comprising an Ag 2 O—SO 2 based compound.
Ag2O―SiO2系の化合物としては、従来、
Ag4SiO4，Ag6Si2O7，Ag2SiO3及びAg2Si2O5が
知られており、それらの合成法も公知である〔E.
シロ（E.Thilo）、F.ウオトク（F.Wodtcke）“ツ
アイトシユリフト フユール アンオルガニツシ
ユ ウント アルゲマイネ ヘミー”（Z.anorg.
allg.Chem.）247，p295（1978）及びV.M.ヤンセ
ン（V.M.Jansen）“アクタ クリスタログラフイ
カ”（Acta Cryst.）B33，p3584（1977）参照〕。 Conventionally, Ag 2 O―SiO 2 compounds include
Ag 4 SiO 4 , Ag 6 Si 2 O 7 , Ag 2 SiO 3 and Ag 2 Si 2 O 5 are known, and their synthesis methods are also known [E.
E. Thilo, F. Wodtcke “Zaitoschrift für unorganizsch und Allgemeine Hemie” (Z.anorg.
247 , p. 295 (1978) and VM Jansen, Acta Cryst., B33 , p. 3584 (1977)
これらの化合物の光学的性質は未知であつた
が、感光性を調べた結果、光照射により黒化し、
加熱により退色することを見出した。 The optical properties of these compounds were unknown, but as a result of examining their photosensitivity, they turned black when exposed to light.
It was discovered that the color fades when heated.
本発明のAg2O―SiO2系２成分酸化物光学記録
材料は、これら化合物自体が感光性を有し、加熱
することにより容易に記録を消去することができ
るので、記録・消去を繰返すことができる点に特
徴がある。そのため、
(1) 現像が不要である。 In the Ag 2 O--SiO 2 -based binary oxide optical recording material of the present invention, these compounds themselves have photosensitivity, and records can be easily erased by heating, so that recording and erasing cannot be repeated. It is characterized by the ability to Therefore, (1) Development is unnecessary.
(2) 感光感度が高い。(2) High photosensitivity.
(3) Ag2O―SiO2系の成分比を変えることによ
り、感光波長域を選択することが可能である。(3) By changing the component ratio of the Ag 2 O—SiO 2 system, it is possible to select the sensitive wavelength range.
(4) 結晶性材料であるため、熱的に安定である。(4) Being a crystalline material, it is thermally stable.
(5) 製造工程に特殊な工夫を要しない。(5) No special efforts are required in the manufacturing process.
という利点がある。There is an advantage.
以下、実施例により本発明を詳細に説明する
が、本発明はこれらに限定されるものではない。 EXAMPLES Hereinafter, the present invention will be explained in detail with reference to Examples, but the present invention is not limited thereto.
なお添付図面について概説すると、第１図は、
Ag4SiO4の反射分光特性を、波長（nm）（横軸）
と反射率（％）（縦軸）との関係で表すグラフで
ある。第２図は、Ag4SiO4の分光感度を、照射波
長（nm）（横軸）と光照射による波長700nmにお
ける反射率の低下（％）（縦軸）との関係で表す
グラフである。第３図は、Ag2SiO3の反射分光特
性を、前記関係で表すグラフである。第４図は、
Ag2SiO3の分光感度を、前記関係で表すグラフで
ある。第５図は、380℃で熱処理したAg2SiO3の
反射分光特性を、前記関係で表すグラフである。
第６図は、Ag2Si2O5の反射分光特性を、前記関
係で表すグラフである。第７図は、Ag2Si2O5の
分光感度を、前記関係で表すグラフである。第８
図は、380℃で熱処理したAg2Si2O5の反射分光特
性を、前記関係で表すグラフである。 To give an overview of the attached drawings, Figure 1 is as follows:
The reflection spectral characteristics of Ag 4 SiO 4 are expressed as wavelength (nm) (horizontal axis).
It is a graph expressed by the relationship between and reflectance (%) (vertical axis). FIG. 2 is a graph showing the spectral sensitivity of Ag 4 SiO 4 in terms of the relationship between the irradiation wavelength (nm) (horizontal axis) and the decrease (%) in reflectance at a wavelength of 700 nm due to light irradiation (vertical axis). FIG. 3 is a graph showing the reflection spectral characteristics of Ag 2 SiO 3 using the above relationship. Figure 4 shows
It is a graph showing the spectral sensitivity of Ag 2 SiO 3 using the above relationship. FIG. 5 is a graph showing the reflection spectral characteristics of Ag 2 SiO 3 heat-treated at 380° C. using the above relationship.
FIG. 6 is a graph showing the reflection spectral characteristics of Ag 2 Si 2 O 5 using the above relationship. FIG. 7 is a graph showing the spectral sensitivity of Ag 2 Si 2 O 5 using the above relationship. 8th
The figure is a graph showing the reflection spectral characteristics of Ag 2 Si 2 O 5 heat-treated at 380° C. using the above relationship.
実施例１ （Ag4SiO4）
Ag4SiO4は、Ca2SiO4とAgNO3を１：32のモル
比で混合し、白金るつぼに投入し、260℃で30時
間保持し、冷却後、水洗、乾燥して得た。第１図
は、Ag4SiO4の反射分光特性を示すグラフであ
る。曲線１は、前記のようにして合成後の
Ag4SiO4の反射分光特性及び波長550nmの光を約
750mJ／cm2照射後、更に200℃で30分間加熱した
後の反射分光特性を示すもので、両者は全く同一
である。そして曲線２は、Ag4SiO4に前記のよう
に波長550nmの光を約750mJ／cm2照射後の反射分
光特性を示す。曲線１と２を比較すると、波長
800nmにおける反射率の低下は８％に達し、記録
が行われていることを示している。また、この記
録後、200℃、30分間の加熱により反射分光特性
が照射前の状態に復帰することも明らかである。
そして、再度、記録、消去を繰返すことも可能で
ある。第２図は、Ag4SiO4の分光感度曲線を示
し、縦軸は、300mJ／cm2照射後の波長700nmにお
ける反射率の低下％を示す。波長750nm以下の光
で記録が可能なことがわかる。記録の読出しに
は、波長約750nm以上の微弱な光源を用い、反射
率の差を検出する等の方法を用いる。Example 1 (Ag 4 SiO 4 ) Ag 4 SiO 4 was prepared by mixing Ca 2 SiO 4 and AgNO 3 at a molar ratio of 1:32, placing the mixture in a platinum crucible, holding it at 260°C for 30 hours, and cooling it. Obtained by washing with water and drying. FIG. 1 is a graph showing the reflection spectral characteristics of Ag 4 SiO 4 . Curve 1 is the result after synthesis as described above.
Reflection spectral characteristics of Ag 4 SiO 4 and light with a wavelength of 550 nm
This shows the reflection spectral characteristics after 750 mJ/cm 2 irradiation and further heating at 200°C for 30 minutes, and both are exactly the same. Curve 2 shows the reflection spectral characteristics after irradiating Ag 4 SiO 4 with light having a wavelength of 550 nm at approximately 750 mJ/cm 2 as described above. Comparing curves 1 and 2, the wavelength
The decrease in reflectance at 800 nm reached 8%, indicating that recording was occurring. It is also clear that after this recording, the reflection spectral characteristics return to the state before irradiation by heating at 200° C. for 30 minutes.
It is also possible to repeat recording and erasing again. FIG. 2 shows the spectral sensitivity curve of Ag 4 SiO 4 , and the vertical axis shows the percentage decrease in reflectance at a wavelength of 700 nm after 300 mJ/cm 2 irradiation. It can be seen that recording is possible using light with a wavelength of 750 nm or less. To read the records, a method such as using a weak light source with a wavelength of about 750 nm or more and detecting the difference in reflectance is used.
実施例２ （Ag2SiO3）
Ag2SiO3は、BaSiO3とAgNO3を１：16のモル
比で混合し、白金つぼに投入し、290℃で30時間
保持し、冷却後、水洗、乾燥して得た。第３図に
おける曲線３は、合成後のAg2SiO3の反射分光特
性を示す。そして曲線４は、それに波長450nmの
光を50mJ／cm2照射した後の反射分光特性を示す。
波長700nmにおける反射率の低下は13％に達し、
可視光により感度良く記録が行われていることを
示す。第４図は、Ag2SiO3の分光感度曲線を示
し、縦軸は、40mJ／cm2照射後の波長700nmにお
ける反射率の低下％を示す。この図は、Ag2SiO3
が可視光のほぼ全域にわたつて高い感度を有して
いることを示している。このAg2SiO3は、加熱す
ると250℃付近で一旦黒化し、更に350〜380℃ま
で加熱すると、ほぼ加熱前の色に戻る。このよう
に一度熱処理すると、もはや室温から380℃以下
の温度範囲では、加熱による黒化は生じない。熱
処理したAg2SiO3も感光性を示す。第５図におけ
る曲線５は、380℃で熱処理したAg2SiO3の反射
分光特性を示す。そして曲線６は、380℃で熱処
理したAg2SO3に波長450nmの光を100mJ／cm2照
射した後の反射分光特性を示す。第５図は、可視
光照射により記録が可能であることを示してい
る。記録後350℃で60分間の加熱により、反射分
光特性は、元の曲線５の状態に復し、記録、消去
を繰返すことも可能である。記録の読出しには、
波長約650nm以上の微弱な光源を用い、反射率の
差を検出する等の方法を用いる。Example 2 (Ag 2 SiO 3 ) Ag 2 SiO 3 was prepared by mixing BaSiO 3 and AgNO 3 at a molar ratio of 1:16, putting it into a platinum pot, holding it at 290°C for 30 hours, cooling it, washing it with water, Obtained by drying. Curve 3 in FIG. 3 shows the reflection spectral characteristics of Ag 2 SiO 3 after synthesis. Curve 4 shows the reflection spectral characteristics after 50 mJ/cm 2 of light with a wavelength of 450 nm was irradiated thereon.
The decrease in reflectance at a wavelength of 700 nm reaches 13%,
This shows that recording is performed with high sensitivity using visible light. FIG. 4 shows the spectral sensitivity curve of Ag 2 SiO 3 , and the vertical axis shows the percentage decrease in reflectance at a wavelength of 700 nm after 40 mJ/cm 2 irradiation. This figure shows Ag 2 SiO 3
This shows that it has high sensitivity over almost the entire visible light range. When this Ag 2 SiO 3 is heated, it once turns black at around 250°C, and when it is further heated to 350 to 380°C, it returns to almost its color before heating. Once heat treated in this way, blackening due to heating no longer occurs in the temperature range from room temperature to 380°C or less. Heat-treated Ag 2 SiO 3 also exhibits photosensitivity. Curve 5 in FIG. 5 shows the reflection spectral characteristics of Ag 2 SiO 3 heat-treated at 380°C. Curve 6 shows the reflection spectral characteristics after irradiating Ag 2 SO 3 heat-treated at 380° C. with 100 mJ/cm 2 of light with a wavelength of 450 nm. FIG. 5 shows that recording is possible by visible light irradiation. By heating at 350° C. for 60 minutes after recording, the reflection spectral characteristics return to the original state of curve 5, making it possible to repeat recording and erasing. To read records,
A method such as using a weak light source with a wavelength of about 650 nm or more and detecting the difference in reflectance is used.
実施例３ （Ag2Si2O5）
Ag2Si2O5は、α―Na2Si2O5とAgNO3を１：16
のモル比で混合し、白金るつぼに投入し、290℃
の温度で48時間保持し、冷却後水洗、乾燥して得
た。ここで、α―Na2Si2O5をβ―Na2Si2O5又は
Li2Si2O5，K2Si2O5，BaSi2O5で代用することは
できない〔V.F.ウオトク（V.F.Wodtcke）“Z.
anorg.allg・Chem.”314，p341（1962）参照〕。
α―Na2Si2O5は、Na2CO3とSiO2を１：２のモル
比で混合し、810℃の温度で30時間焼成して調製
した。第６図における曲線７は、合成後の
Ag2Si2O5の反射分光特性を示す。そして曲線８
は、それに波長450nmの光を100mJ／cm2照射した
後の反射分光特性を示す。波長700nmにおける反
射率は９％減少しており、記録が行われているこ
とを示している。第７図は、Ag2Si2O5の分光感
度曲線を示し、縦軸は、照射エネルギー100mJ／
cm2で照射後の波長700nmにおける反射率の低下％
を示す。第７図は、Ag2Si2O5が可視光のほぼ全
域にわたつて感度を有していることを示してい
る。このAg2Si2O5は、加熱するとAg2SiO3と同
様に250℃付近で一旦黒化し、更に350〜380℃ま
で昇温すると、ほぼ加熱前の色に戻る。このよう
に一度熱処理すると、もはや室温から380℃まで
の温度範囲では、加熱しても黒化は生じない。熱
処理したAg2Si2O5も感光性を示す。第８図にお
ける曲線９は、380℃で熱処理したAg2Si2O5の反
射分光特性を示す。そして曲線１０は、380℃で
熱処理したAg2Si2O5に波長450nmの光を
100mJ／cm2照射した後の反射分光特性を示す。第
８図は、可視光照射により記録が行えることを示
している。記録後360℃で30分間の加熱により、
反射分光特性は、元の曲線９の状態に復し、記
録、消去を繰返すことができる。記録の読出しに
は、波長約700nm以上の微弱な光源を用い、反射
率の差を検出する等の方法を用いる。Example 3 (Ag 2 Si 2 O 5 ) Ag 2 Si 2 O 5 is a mixture of α-Na 2 Si 2 O 5 and AgNO 3 in a ratio of 1:16.
Mix at a molar ratio of , put into a platinum crucible, and heat at 290℃
The sample was kept at a temperature of 48 hours, cooled, washed with water, and dried. Here, α-Na 2 Si 2 O 5 is replaced with β-Na 2 Si 2 O 5 or
Li 2 Si 2 O 5 , K 2 Si 2 O 5 , BaSi 2 O 5 cannot be substituted [VFWodtcke “Z.
anorg.allg・Chem.” 314 , p. 341 (1962)].
α-Na 2 Si 2 O 5 was prepared by mixing Na 2 CO 3 and SiO 2 at a molar ratio of 1:2 and firing the mixture at a temperature of 810° C. for 30 hours. Curve 7 in Figure 6 shows the result after synthesis.
The reflection spectral characteristics of Ag 2 Si 2 O 5 are shown. and curve 8
shows the reflection spectral characteristics after irradiating it with 100 mJ/cm 2 of light with a wavelength of 450 nm. The reflectance at a wavelength of 700 nm decreased by 9%, indicating that recording was occurring. Figure 7 shows the spectral sensitivity curve of Ag 2 Si 2 O 5 , and the vertical axis is the irradiation energy of 100 mJ/
% reduction in reflectance at wavelength 700 nm after irradiation in cm2
shows. FIG. 7 shows that Ag 2 Si 2 O 5 has sensitivity over almost the entire visible light range. When this Ag 2 Si 2 O 5 is heated, like Ag 2 SiO 3 , it once turns black around 250°C, and when the temperature is further increased to 350 to 380°C, it returns to almost its color before heating. Once heat treated in this manner, blackening no longer occurs even when heated in the temperature range from room temperature to 380°C. Heat-treated Ag 2 Si 2 O 5 also exhibits photosensitivity. Curve 9 in FIG. 8 shows the reflection spectral characteristics of Ag 2 Si 2 O 5 heat-treated at 380°C. Curve 10 shows that Ag 2 Si 2 O 5 heat-treated at 380°C is exposed to light with a wavelength of 450 nm.
Shows the reflection spectral characteristics after irradiation with 100mJ/ cm2 . FIG. 8 shows that recording can be performed by visible light irradiation. By heating at 360℃ for 30 minutes after recording,
The reflection spectral characteristics return to the original state of the curve 9, and recording and erasing can be repeated. To read the records, a method such as using a weak light source with a wavelength of about 700 nm or more and detecting the difference in reflectance is used.
以上の各実施例から明らかなように、本発明の
光学記録材料は、既述の各種の利点を有し、顕著
な効果を奏するものである。 As is clear from the above examples, the optical recording material of the present invention has the various advantages described above and exhibits remarkable effects.
第１図は、Ag4SiO4の反射分光特性を、波長と
反射率との関係を表すグラフである。第２図は、
Ag4SiO4の分光感度を、照射波長と光照射による
波長700nmにおける反射率の低下との関係を表す
グラフである。第３図は、Ag2SiO3の反射分光特
性を、前記関係で表すグラフ、第４図は、
Ag2SiO3の分光感度を、前記関係で表すグラフ、
第５図は、380℃で熱処理したAg2SiO3の反射分
光特性を、前記関係で表すグラフ、第６図は、
Ag2Si2O5の反射分光特性を、前記関係で表すグ
ラフ、第７図は、Ag2Si2O5の分光感度を、前記
関係で表すグラフ、第８図は、380℃で熱処理し
たAg2Si2O5の反射分光特性を、前記関係で表す
グラフである。
FIG. 1 is a graph showing the reflection spectral characteristics of Ag 4 SiO 4 as a relationship between wavelength and reflectance. Figure 2 shows
It is a graph showing the spectral sensitivity of Ag 4 SiO 4 in relation to the irradiation wavelength and the decrease in reflectance at a wavelength of 700 nm due to light irradiation. Figure 3 is a graph showing the reflection spectral characteristics of Ag 2 SiO 3 using the above relationship, and Figure 4 is a graph showing the reflection spectral characteristics of Ag 2 SiO 3.
A graph expressing the spectral sensitivity of Ag 2 SiO 3 using the above relationship,
Figure 5 is a graph showing the reflection spectral characteristics of Ag 2 SiO 3 heat-treated at 380°C using the above relationship, and Figure 6 is
Figure 7 is a graph showing the reflection spectral characteristics of Ag 2 Si 2 O 5 using the above relationship. Figure 8 is a graph showing the spectral sensitivity of Ag 2 Si 2 O 5 using the above relationship. Figure 8 is a graph showing the reflection spectral characteristics of Ag 2 Si 2 O 5 using the above relationship. It is a graph showing the reflection spectral characteristics of Ag 2 Si 2 O 5 using the above relationship.
Claims (1)
徴とする光学記録材料。 ２ 該化合物が、Ag4SiO4，Ag2SiO3及び
Ag2Si2O5よりなる群から選択した化合物である
特許請求の範囲第１項に記載の光学記録材料。[Claims] 1. An optical recording material comprising an Ag 2 O—SiO 2 based compound. 2 The compound is Ag 4 SiO 4 , Ag 2 SiO 3 and
Optical recording material according to claim 1, which is a compound selected from the group consisting of Ag 2 Si 2 O 5 .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56184496A JPS5887183A (en) | 1981-11-19 | 1981-11-19 | Optical recording material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56184496A JPS5887183A (en) | 1981-11-19 | 1981-11-19 | Optical recording material |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5887183A JPS5887183A (en) | 1983-05-24 |
| JPS6356920B2 true JPS6356920B2 (en) | 1988-11-09 |
Family
ID=16154194
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56184496A Granted JPS5887183A (en) | 1981-11-19 | 1981-11-19 | Optical recording material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5887183A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3088168B2 (en) * | 1991-12-13 | 2000-09-18 | ティーディーケイ株式会社 | Optical recording medium and manufacturing method thereof |
| KR20130120314A (en) * | 2012-04-25 | 2013-11-04 | 삼성전자주식회사 | Visible light sensitive photocatalyst, method of producing the same, electrochemical water decomposition cell, and organic material decomposition system comprising the same |
-
1981
- 1981-11-19 JP JP56184496A patent/JPS5887183A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5887183A (en) | 1983-05-24 |
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