JPS6354789A - Gas laser - Google Patents
Gas laserInfo
- Publication number
- JPS6354789A JPS6354789A JP19800886A JP19800886A JPS6354789A JP S6354789 A JPS6354789 A JP S6354789A JP 19800886 A JP19800886 A JP 19800886A JP 19800886 A JP19800886 A JP 19800886A JP S6354789 A JPS6354789 A JP S6354789A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- discharge
- cathode
- laser
- heated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000011144 upstream manufacturing Methods 0.000 claims abstract description 11
- 230000003287 optical effect Effects 0.000 claims abstract description 7
- 238000002347 injection Methods 0.000 abstract description 4
- 239000007924 injection Substances 0.000 abstract description 4
- 238000007599 discharging Methods 0.000 abstract 6
- 230000007423 decrease Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/038—Electrodes, e.g. special shape, configuration or composition
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Lasers (AREA)
Abstract
Description
【発明の詳細な説明】
[発明の目的コ
(産業上の利用分野)
この発明は、高出力のガスレーザ装置、例えばCO2レ
ーザ、Coレーザ装置に関する。DETAILED DESCRIPTION OF THE INVENTION [Object of the Invention (Industrial Application Field) The present invention relates to a high-output gas laser device, such as a CO2 laser or a Co laser device.
(従来の技術)
三軸方式のガスレーザ装置で°分割されたカソード列が
複数から構成される例として特公昭60−26318が
知れている。この方式では流れに沿った放電分布を一様
にしようとすると、各陰極列への放電電力を小さくしな
いと、レーザガスの温度が上昇し放電がアークに移行し
やすい。放電電力を小さくすると光のゲインが不足し発
振しにく く な る 。(Prior Art) Japanese Patent Publication No. 60-26318 is known as an example of a three-axis gas laser device in which a plurality of cathode rows are divided into degrees. In this method, if an attempt is made to make the discharge distribution along the flow uniform, the temperature of the laser gas will rise and the discharge will easily shift to an arc unless the discharge power to each cathode array is reduced. When the discharge power is reduced, the optical gain becomes insufficient and oscillation becomes difficult.
(発明が解決しようとする問題点)
従来技術の問題点はレーザガスの下流側でガス温度が高
くなることであった。(Problems to be Solved by the Invention) A problem with the prior art is that the gas temperature becomes high on the downstream side of the laser gas.
(本発明の目的)
放電によって加熱されないガスを放電域の中間から注入
することにより、レーザガスの加熱を防ぎ、広い放電空
間にわたり高いゲインの放電を実現させることのできる
ガスレーザ装置を提供することにある。(Objective of the present invention) It is an object of the present invention to provide a gas laser device that can prevent heating of the laser gas and realize high gain discharge over a wide discharge space by injecting gas that is not heated by discharge from the middle of the discharge region. .
[発明の構成コ
(問題を解決するための手段)
各カソード列でのレーザガスの温度上昇が同じになるよ
うに、カソード列の中間から低温のガスを供給する。こ
のためのガス流路を設ける。[Configuration of the Invention (Means for Solving the Problem) Low-temperature gas is supplied from the middle of the cathode rows so that the temperature rise of the laser gas in each cathode row is the same. A gas flow path is provided for this purpose.
(作用)
各カソード列での放電によるガスの1H度上昇ΔTが各
カソード列毎にほぼ等しくなるように構成出来るので、
各カソード列ともほぼ等しくかつ高いゲインを持たせる
ことが可能で、共振器光路の構成が容易となる。(Function) Since the structure can be configured so that the 1H degree rise ΔT of gas due to discharge in each cathode row is approximately equal for each cathode row,
Each cathode row can have substantially equal and high gain, and the configuration of the resonator optical path becomes easy.
(実施例)
第1図は本発明の一実施例で、レーザ放電部を光路にほ
ぼ垂直に切断した面を示す。(Embodiment) FIG. 1 shows an embodiment of the present invention, showing a surface of a laser discharge section cut approximately perpendicular to the optical path.
ガス流1.2は流路を構成するダクト3に案内され流れ
る。ガスの上流側に第1のカソード列4が、下流側に第
2のカソード列5が設けられ、これらに対向してアノー
ド6.7が設けられている。The gas flow 1.2 is guided and flows through a duct 3 forming a flow path. A first cathode row 4 is provided on the upstream side of the gas, a second cathode row 5 is provided on the downstream side, and an anode 6.7 is provided opposite to these.
これらアノード、カソードは放電電源8にそれぞれ抵抗
9.10,11.12を介して接続されている。These anodes and cathodes are connected to the discharge power source 8 via resistors 9.10 and 11.12, respectively.
下流側のカソード5.アノード7との放電領域には上流
側の放電域を通過しなかったガス流2がガス流出口(溝
)13を通して注入される。Downstream cathode 5. The gas flow 2 that has not passed through the upstream discharge region is injected into the discharge region with the anode 7 through the gas outlet (groove) 13 .
このような構成にすると、上流側の放電域で、加熱され
たガス流1はガス流2と混合し、ガス温度が低下するの
で、下流側の放電部カソード5゜アノード7での放電電
力の注入能力を高める。With this configuration, heated gas flow 1 mixes with gas flow 2 in the discharge area on the upstream side, and the gas temperature decreases, so that the discharge power at the discharge section cathode 5° and anode 7 on the downstream side is reduced. Increase injection capacity.
抵抗14を介して、電源に接続されている電極15は補
助放電電極で上流側の放電空間の放電の一様性を高める
作用をする。下流側の放電域に対してはその上流側の放
電部が補助放電の役割をはたす。An electrode 15 connected to a power source through a resistor 14 is an auxiliary discharge electrode and serves to improve the uniformity of discharge in the discharge space on the upstream side. For the discharge area on the downstream side, the discharge section on the upstream side serves as an auxiliary discharge.
流路2の注入部はアノード側と限定されず、例えばカソ
ード列の間から行っても、アノード側、カソード側の両
側から行っても良い。16.17はレーザビームの光路
断面で、ゲインが高くかつ一様性の良い所に設定される
。The injection part of the flow path 2 is not limited to the anode side, and may be performed, for example, from between the cathode rows or from both the anode side and the cathode side. Reference numeral 16 and 17 represent the optical path cross section of the laser beam, which is set at a location where the gain is high and uniformity is good.
第1−図は本発明の一実施例でレーザ放電部を光路にほ
ぼ垂直に切断した断面図である。
1.2・・・分流したガス流、4,5・・・カソード6
.7・・・アノード、13・・・ガス注入部8・・・放
電電源FIG. 1 is a cross-sectional view of a laser discharge section according to an embodiment of the present invention, taken approximately perpendicular to the optical path. 1.2... Divided gas flow, 4, 5... Cathode 6
.. 7...Anode, 13...Gas injection part 8...Discharge power supply
Claims (1)
方向とが概略互いに直行し、複数個に分割されたカソー
ドが、レーザガスの上流側と下流側に少なくとも2列以
上配列され、下流側のカソード列の放電部に流入するガ
スは上流側カソードの放電から流出したガスと放電部を
通過しないガス流とが合流するように構成されることを
特徴とするガスレーザ装置。The optical axis of the laser beam, the flow direction of the laser gas, and the direction of the discharge path are approximately perpendicular to each other, and the cathodes divided into a plurality of pieces are arranged in at least two rows on the upstream and downstream sides of the laser gas. A gas laser device characterized in that the gas flowing into the discharge section of the column is configured such that the gas flowing out from the discharge of the upstream cathode and the gas flow that does not pass through the discharge section merge.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19800886A JPS6354789A (en) | 1986-08-26 | 1986-08-26 | Gas laser |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19800886A JPS6354789A (en) | 1986-08-26 | 1986-08-26 | Gas laser |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6354789A true JPS6354789A (en) | 1988-03-09 |
Family
ID=16383975
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP19800886A Pending JPS6354789A (en) | 1986-08-26 | 1986-08-26 | Gas laser |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6354789A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH042773A (en) * | 1990-04-20 | 1992-01-07 | Mitsubishi Heavy Ind Ltd | High speed film forming sputtering apparatus |
US6156172A (en) * | 1997-06-02 | 2000-12-05 | Sadao Kadkura | Facing target type sputtering apparatus |
-
1986
- 1986-08-26 JP JP19800886A patent/JPS6354789A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH042773A (en) * | 1990-04-20 | 1992-01-07 | Mitsubishi Heavy Ind Ltd | High speed film forming sputtering apparatus |
US6156172A (en) * | 1997-06-02 | 2000-12-05 | Sadao Kadkura | Facing target type sputtering apparatus |
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