JPS6346575B2 - - Google Patents

Info

Publication number
JPS6346575B2
JPS6346575B2 JP54109161A JP10916179A JPS6346575B2 JP S6346575 B2 JPS6346575 B2 JP S6346575B2 JP 54109161 A JP54109161 A JP 54109161A JP 10916179 A JP10916179 A JP 10916179A JP S6346575 B2 JPS6346575 B2 JP S6346575B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP54109161A
Other versions
JPS5633839A (en
Inventor
Takashi Tsuchimoto
Yoshimichi Hirobe
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP54109161A priority Critical patent/JPS6346575B2/ja
Publication of JPS5633839A publication Critical patent/JPS5633839A/en
Publication of JPS6346575B2 publication Critical patent/JPS6346575B2/ja
Application status is Expired legal-status Critical

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • C23C16/507Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using external electrodes, e.g. in tunnel type reactors
JP54109161A 1979-08-29 1979-08-29 Expired JPS6346575B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP54109161A JPS6346575B2 (en) 1979-08-29 1979-08-29

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP54109161A JPS6346575B2 (en) 1979-08-29 1979-08-29

Publications (2)

Publication Number Publication Date
JPS5633839A JPS5633839A (en) 1981-04-04
JPS6346575B2 true JPS6346575B2 (en) 1988-09-16

Family

ID=14503183

Family Applications (1)

Application Number Title Priority Date Filing Date
JP54109161A Expired JPS6346575B2 (en) 1979-08-29 1979-08-29

Country Status (1)

Country Link
JP (1) JPS6346575B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1990013909A1 (en) * 1989-05-12 1990-11-15 Tadahiro Ohmi Reactive ion etching apparatus
JPH03122384A (en) * 1989-10-05 1991-05-24 Nakanishi Eng:Kk Window sash stay

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58122736A (en) * 1982-01-14 1983-07-21 Nippon Telegr & Teleph Corp <Ntt> Formation of insulating film
JPH0570930B2 (en) * 1983-10-19 1993-10-06 Hitachi Ltd
KR890004881B1 (en) * 1983-10-19 1989-11-30 미쓰다 가쓰시게 Plasma treating method and device thereof
EP0149089B1 (en) * 1984-01-06 1989-11-23 Tegal Corporation Single electrode, multiple frequency plasma apparatus
US4579618A (en) * 1984-01-06 1986-04-01 Tegal Corporation Plasma reactor apparatus
US4510172A (en) * 1984-05-29 1985-04-09 International Business Machines Corporation Technique for thin insulator growth
JPS611023A (en) * 1984-06-13 1986-01-07 Teru Saamuko Kk Batch plasma device
JPS61199079A (en) * 1985-02-28 1986-09-03 Anelva Corp Magnetic field generating apparatus in surface treating apparatus
US4585516A (en) * 1985-03-04 1986-04-29 Tegal Corporation Variable duty cycle, multiple frequency, plasma reactor
JPH0828345B2 (en) * 1987-07-10 1996-03-21 株式会社日立製作所 The dry etching method and apparatus
JP2519364B2 (en) * 1990-12-03 1996-07-31 アプライド マテリアルズ インコーポレイテッド Plasma reactor using Uhf / vhf resonant antenna source
US5330606A (en) * 1990-12-14 1994-07-19 Matsushita Electric Industrial Co., Ltd. Plasma source for etching
US6110287A (en) * 1993-03-31 2000-08-29 Tokyo Electron Limited Plasma processing method and plasma processing apparatus
TW269048B (en) * 1993-11-05 1996-01-21 Tokyo Electron Co Ltd
JPH07249586A (en) * 1993-12-22 1995-09-26 Tokyo Electron Ltd Treatment device and its manufacturing method and method for treating body to be treated
BE1008338A5 (en) * 1994-04-26 1996-04-02 Cobrain Nv Multi-frequency inductive method and device for working material.
JP2000269196A (en) 1999-03-19 2000-09-29 Toshiba Corp Method and apparatus for plasma treatment
KR100808862B1 (en) 2006-07-24 2008-03-03 삼성전자주식회사 Apparatus for treating substrate

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1990013909A1 (en) * 1989-05-12 1990-11-15 Tadahiro Ohmi Reactive ion etching apparatus
JPH03122384A (en) * 1989-10-05 1991-05-24 Nakanishi Eng:Kk Window sash stay

Also Published As

Publication number Publication date
JPS5633839A (en) 1981-04-04

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