JPS6341855A - Dry cleaning method for photomask - Google Patents

Dry cleaning method for photomask

Info

Publication number
JPS6341855A
JPS6341855A JP18665286A JP18665286A JPS6341855A JP S6341855 A JPS6341855 A JP S6341855A JP 18665286 A JP18665286 A JP 18665286A JP 18665286 A JP18665286 A JP 18665286A JP S6341855 A JPS6341855 A JP S6341855A
Authority
JP
Japan
Prior art keywords
mask
protection film
dust
dry cleaning
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP18665286A
Other languages
Japanese (ja)
Inventor
Noriaki Ishio
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP18665286A priority Critical patent/JPS6341855A/en
Publication of JPS6341855A publication Critical patent/JPS6341855A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82Auxiliary processes, e.g. cleaning or inspecting

Abstract

PURPOSE:To execute dry cleaning without damaging a mask by spin-coating a sublimatic organic protection film on the surface of a mask immediately after exposure and sublimating the protection film immediately before the succeeding exposure. CONSTITUTION:A naphthalene isopropyl alcohol solution is dropped on the surface of a mask substrate 1 free from dust to spin-coat a naphthalene protection film 4 with 500-200,000Angstrom thickness and the mask is stored under a condition that the protection film 4 does not disappears due to sublimation. Immediately before exposure, the mask is set up vertically downward in a dry cleaning device, the back of the substrate 1 is heated up to 40-80 deg.C by a heater 6 and evacuated to <=10<-3>Torr for 5-30min to remove the protection film 4 and dust 5 on the film 4. The film 4 and dust 5 can be similarly removed by evacuating to <=10<-3>Torr while radiating UV light 8 from a Hg lamp. The removing speed is increased by simultaneously executing the heating based upon the heater 6 and UV light 8 radiation based upon the Hg lamp. The removing speed is also increased by rotating the mask substrate 1 at 100-6,000rpm speed.
JP18665286A 1986-08-07 1986-08-07 Dry cleaning method for photomask Pending JPS6341855A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18665286A JPS6341855A (en) 1986-08-07 1986-08-07 Dry cleaning method for photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18665286A JPS6341855A (en) 1986-08-07 1986-08-07 Dry cleaning method for photomask

Publications (1)

Publication Number Publication Date
JPS6341855A true JPS6341855A (en) 1988-02-23

Family

ID=16192320

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18665286A Pending JPS6341855A (en) 1986-08-07 1986-08-07 Dry cleaning method for photomask

Country Status (1)

Country Link
JP (1) JPS6341855A (en)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5731229A (en) * 1994-06-28 1998-03-24 Nissan Motor Co., Ltd. Method of producing device having minute structure
US5851851A (en) * 1994-03-07 1998-12-22 Nippondenso Co., Ltd. Method for fabricating a semiconductor acceleration sensor
WO2006050950A1 (en) * 2004-11-10 2006-05-18 Universität Konstanz Method and apparatus for removing impurities, and use of a cleaning agent
US7306680B2 (en) 2002-09-12 2007-12-11 Asml Netherlands B.V. Method of cleaning by removing particles from surfaces, a cleaning apparatus and a lithographic projection apparatus
US7522263B2 (en) 2005-12-27 2009-04-21 Asml Netherlands B.V. Lithographic apparatus and method
JP2012243869A (en) * 2011-05-17 2012-12-10 Tokyo Electron Ltd Substrate drying method and substrate processing apparatus
JP2015092619A (en) * 2015-01-08 2015-05-14 東京エレクトロン株式会社 Substrate drying method and substrate processing apparatus
JP2017050576A (en) * 2016-12-15 2017-03-09 東京エレクトロン株式会社 Substrate drying method and substrate processing apparatus
JP2017050575A (en) * 2016-12-15 2017-03-09 東京エレクトロン株式会社 Substrate drying method and substrate processing apparatus

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5851851A (en) * 1994-03-07 1998-12-22 Nippondenso Co., Ltd. Method for fabricating a semiconductor acceleration sensor
US5731229A (en) * 1994-06-28 1998-03-24 Nissan Motor Co., Ltd. Method of producing device having minute structure
US7306680B2 (en) 2002-09-12 2007-12-11 Asml Netherlands B.V. Method of cleaning by removing particles from surfaces, a cleaning apparatus and a lithographic projection apparatus
WO2006050950A1 (en) * 2004-11-10 2006-05-18 Universität Konstanz Method and apparatus for removing impurities, and use of a cleaning agent
US7522263B2 (en) 2005-12-27 2009-04-21 Asml Netherlands B.V. Lithographic apparatus and method
US8064038B2 (en) 2005-12-27 2011-11-22 Asml Netherlands B.V. Inspection apparatus, lithographic system provided with the inspection apparatus and a method for inspecting a sample
JP2012243869A (en) * 2011-05-17 2012-12-10 Tokyo Electron Ltd Substrate drying method and substrate processing apparatus
JP2015092619A (en) * 2015-01-08 2015-05-14 東京エレクトロン株式会社 Substrate drying method and substrate processing apparatus
JP2017050576A (en) * 2016-12-15 2017-03-09 東京エレクトロン株式会社 Substrate drying method and substrate processing apparatus
JP2017050575A (en) * 2016-12-15 2017-03-09 東京エレクトロン株式会社 Substrate drying method and substrate processing apparatus

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