JPS6339109B2 - - Google Patents
Info
- Publication number
- JPS6339109B2 JPS6339109B2 JP54112468A JP11246879A JPS6339109B2 JP S6339109 B2 JPS6339109 B2 JP S6339109B2 JP 54112468 A JP54112468 A JP 54112468A JP 11246879 A JP11246879 A JP 11246879A JP S6339109 B2 JPS6339109 B2 JP S6339109B2
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor region
- semiconductor
- region
- junction
- doping concentration
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/102—Constructional design considerations for preventing surface leakage or controlling electric field concentration
- H10D62/103—Constructional design considerations for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse-biased devices
- H10D62/105—Constructional design considerations for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse-biased devices by having particular doping profiles, shapes or arrangements of PN junctions; by having supplementary regions, e.g. junction termination extension [JTE]
- H10D62/106—Constructional design considerations for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse-biased devices by having particular doping profiles, shapes or arrangements of PN junctions; by having supplementary regions, e.g. junction termination extension [JTE] having supplementary regions doped oppositely to or in rectifying contact with regions of the semiconductor bodies, e.g. guard rings with PN or Schottky junctions
Landscapes
- Thyristors (AREA)
- Bipolar Transistors (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH1053978 | 1978-10-11 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5553455A JPS5553455A (en) | 1980-04-18 |
| JPS6339109B2 true JPS6339109B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1988-08-03 |
Family
ID=4364288
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11246879A Granted JPS5553455A (en) | 1978-10-11 | 1979-09-04 | Semiconductor circuit element having at least one planar pn junction and region protective ring |
Country Status (5)
Families Citing this family (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS56126968A (en) * | 1980-03-10 | 1981-10-05 | Mitsubishi Electric Corp | Semiconductor device |
| JPS5778171A (en) * | 1980-11-04 | 1982-05-15 | Hitachi Ltd | Thyristor |
| DE3110000C2 (de) * | 1981-03-14 | 1986-04-30 | SEMIKRON Gesellschaft für Gleichrichterbau u. Elektronik mbH, 8500 Nürnberg | Halbleiterbauelement hoher Sperrfähigkeit |
| CH657478A5 (en) * | 1982-08-16 | 1986-08-29 | Bbc Brown Boveri & Cie | Power semiconductor component |
| JPS5976466A (ja) * | 1982-10-25 | 1984-05-01 | Mitsubishi Electric Corp | プレ−ナ形半導体装置 |
| JPS60119776A (ja) * | 1983-11-30 | 1985-06-27 | Mitsubishi Electric Corp | ゲ−トタ−ンオフサイリスタ |
| US4757363A (en) * | 1984-09-14 | 1988-07-12 | Harris Corporation | ESD protection network for IGFET circuits with SCR prevention guard rings |
| GB2193596A (en) * | 1986-08-08 | 1988-02-10 | Philips Electronic Associated | A semiconductor diode |
| EP0360036B1 (de) * | 1988-09-20 | 1994-06-01 | Siemens Aktiengesellschaft | Planarer pn-Übergang hoher Spannungsfestigkeit |
| DE3832748A1 (de) * | 1988-09-27 | 1990-03-29 | Asea Brown Boveri | Leistungshalbleiterdiode |
| JP2513010B2 (ja) * | 1988-12-27 | 1996-07-03 | 日本電気株式会社 | 半導体集積回路の入力保護装置 |
| US5155568A (en) * | 1989-04-14 | 1992-10-13 | Hewlett-Packard Company | High-voltage semiconductor device |
| US5032878A (en) * | 1990-01-02 | 1991-07-16 | Motorola, Inc. | High voltage planar edge termination using a punch-through retarding implant |
| JP2701502B2 (ja) * | 1990-01-25 | 1998-01-21 | 日産自動車株式会社 | 半導体装置 |
| CH683388A5 (de) * | 1991-03-15 | 1994-02-28 | Landis & Gyr Business Support | Anordnung zur Eigenschaftsverbesserung von mit P/N-Uebergängen versehenen Halbleiterstrukturen. |
| SE9701724D0 (sv) * | 1997-05-09 | 1997-05-09 | Abb Research Ltd | A pn-diode of SiC and a method for production thereof |
| GB2355110A (en) * | 1999-08-11 | 2001-04-11 | Mitel Semiconductor Ltd | High voltage semiconductor device termination structure |
| JP2008277353A (ja) * | 2007-04-25 | 2008-11-13 | Matsushita Electric Ind Co Ltd | 半導体装置 |
| US7915129B2 (en) * | 2009-04-22 | 2011-03-29 | Polar Semiconductor, Inc. | Method of fabricating high-voltage metal oxide semiconductor transistor devices |
| US8536659B2 (en) * | 2009-07-30 | 2013-09-17 | Polar Seminconductor, Inc. | Semiconductor device with integrated channel stop and body contact |
| US9818742B2 (en) | 2012-05-11 | 2017-11-14 | Polar Semiconductor, Llc | Semiconductor device isolation using an aligned diffusion and polysilicon field plate |
| DE112013006871T5 (de) * | 2013-03-27 | 2015-12-10 | Toyota Jidosha Kabushiki Kaisha | Vertikale Halbleitervorrichtung |
| RU188679U1 (ru) * | 2018-12-25 | 2019-04-22 | Закрытое акционерное общество "ГРУППА КРЕМНИЙ ЭЛ" | Полупроводниковый прибор |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3391287A (en) * | 1965-07-30 | 1968-07-02 | Westinghouse Electric Corp | Guard junctions for p-nu junction semiconductor devices |
| US3430110A (en) * | 1965-12-02 | 1969-02-25 | Rca Corp | Monolithic integrated circuits with a plurality of isolation zones |
| DE1614751A1 (de) * | 1967-01-07 | 1970-12-03 | Telefunken Patent | Halbleiteranordnung |
| DE1789043A1 (de) * | 1967-10-14 | 1972-01-05 | Sgs Sa | Mit Schutzringen versehene Planar-Halbleitervorrichtungen |
| US3911473A (en) * | 1968-10-12 | 1975-10-07 | Philips Corp | Improved surface breakdown protection for semiconductor devices |
| NL6904543A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1969-03-25 | 1970-09-29 | ||
| FR2108781B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1970-10-05 | 1974-10-31 | Radiotechnique Compelec | |
| US4157563A (en) * | 1971-07-02 | 1979-06-05 | U.S. Philips Corporation | Semiconductor device |
| JPS523277B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1973-05-19 | 1977-01-27 | ||
| JPS573225B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1974-08-19 | 1982-01-20 | ||
| JPS51122567U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1975-03-25 | 1976-10-04 | ||
| CH594989A5 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1976-09-03 | 1978-01-31 | Bbc Brown Boveri & Cie |
-
1978
- 1978-10-26 DE DE19782846637 patent/DE2846637A1/de not_active Withdrawn
-
1979
- 1979-09-04 JP JP11246879A patent/JPS5553455A/ja active Granted
- 1979-09-18 US US06/076,671 patent/US4305085A/en not_active Expired - Lifetime
- 1979-10-09 FR FR7925103A patent/FR2438916A1/fr active Granted
- 1979-10-09 GB GB7935015A patent/GB2033657B/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| FR2438916B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1984-10-12 |
| FR2438916A1 (fr) | 1980-05-09 |
| JPS5553455A (en) | 1980-04-18 |
| US4305085A (en) | 1981-12-08 |
| GB2033657B (en) | 1983-05-18 |
| GB2033657A (en) | 1980-05-21 |
| DE2846637A1 (de) | 1980-04-30 |