JPS63292100A - Ultrahigh vacuum apparatus - Google Patents

Abstract

PURPOSE:To achieve a higher working efficiency to attain ultrahigh vacuum, by high frequency heating of a vacuum chamber. CONSTITUTION:A synchrotron radiation light 3 radiated from a synchrotron radiation light source is introduced into a vacuum chamber 5 through a beam line 4. A heater 6 for baking is wound on the circumference of a side wall of the chamber 5 and a coil 7 is arranged outside the chamber 5 so as to wrap the chamber 5. A high frequency current 8 is supplied to the coil 7 from a high frequency current supply system 9. Thus, the chamber 5 can be baked by a high frequency heating and a higher efficiency of the baking is possible with the addition of the high frequency heating.

Description

DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to an ultra-high vacuum apparatus, and particularly to an ultra-high vacuum apparatus in the field of utilizing synchrotron radiation light emitted from a synchrotron radiation light source.

[Background Art] In recent years, industrial applications of ultra-high vacuum technologies such as synchrotron radiation utilization technology, MBE technology, and surface analysis technology have been rapidly expanding. Although ultra-high vacuum technology is an extension of vacuum technology, it is technologically distinct from normal vacuum technology in terms of pumps for evacuation, means for achieving ultimate pressure, etc. Ion pumps, sublimation pumps, turbo pumps, etc. are used as vacuum evacuation technologies, but unlike normal vacuum technologies, higher performance ones are used.For example, ion pumps are used for rare gases. Also, those with even higher exhaust performance are used. The most common means of achieving the ultimate pressure is baking using a heater.

FIG. 2 is a block diagram showing an example of a conventional ultra-high vacuum apparatus that utilizes synchrotron radiation. In FIG. 2, synchrotron radiation 3 is emitted from a radiation source 1 on an electron storage ring 2. As shown in FIG. Synchrotron radiation 3 is introduced into a vacuum chamber 5 through a beam line 4, and a desired reaction or treatment is performed. The electron storage ring 2 is usually t
It is evacuated to an ultra-high vacuum of o-11 to 10-10 Torr. In this conventional example, the beam line 4 and vacuum chamber 5 are also set to ultra-high vacuum. In particular, since samples are taken in and taken out of the vacuum chamber 5, a heating means using a baking heater 6 is usually used to maintain the vacuum at an ultra-high vacuum (a vacuum better than tO-9 Torr).

[Problems to be Solved by the Invention] A major problem with the conventional ultra-high vacuum apparatus described above is that a baking heater is used as a means for achieving ultra-high vacuum. In order to achieve an ultra-high vacuum, it is of course necessary to use a high-capacity evacuation device such as an ion pump, but it is most important to remove gas, moisture, etc. adhering to the inner wall surface of the vacuum chamber. Therefore, conventionally, the gas and moisture adhering to the inner wall surface of the vacuum chamber have been released by performing a baking process from the outside of the vacuum chamber. However, such conventional baking treatment has major drawbacks as described below. First, the baking process takes a very long time, usually requiring continuous baking day and night for several days, which significantly reduces work efficiency. Second, continuous baking day and night for long periods of time is unfavorable in terms of safety management. In other words, a safety management system is required because the baking process causes heat to be radiated to the surrounding area. Thirdly, once the ultra-high vacuum chamber is exposed to the atmosphere, another baking process is required, further reducing work efficiency.

An object of the present invention is to provide a practical ultra-high vacuum apparatus that eliminates such problems and greatly improves the working efficiency for achieving ultra-high vacuum.

[Means for Solving the Problems] The present invention provides an ultra-high-temperature system consisting of a synchrotron radiation light source, a beam line that forms a path for the synchrotron radiation, and a vacuum chamber that introduces and utilizes the synchrotron radiation. In vacuum equipment,
The vacuum chamber is an ultra-high vacuum device characterized in that it is surrounded by a coil through which a high frequency current is passed.

[Function] When the entire vacuum chamber is heated with high frequency, the rise time of baking is faster than when using a normal baking heater, and the efficiency of baking is further improved. Furthermore, in the case of high frequency heating, everything inside the coil is heated. That is, conductors are heated by eddy currents generated by electromagnetic induction, and dielectrics are also heated slowly by dielectric loss. Therefore, by high-frequency heating the vacuum chamber, everything within the vacuum chamber can be efficiently heated.

[Examples] Examples of the present invention will be described in detail below with reference to the drawings. FIG. 1 is a schematic diagram showing an embodiment of the present invention. Synchrotron radiation 3 emitted from a synchrotron radiation light source (not shown) is introduced into a vacuum chamber 5 through a beam line 4 . A baking heater 6 is wound around the outer peripheral surface of the side wall of the vacuum chamber 5 .

A coil 7 is arranged outside the vacuum chamber 5 so as to surround the vacuum chamber, and a high frequency current 8 is supplied to the coil 7 from a high frequency current supply system 9. By arranging the vacuum chamber as shown in J: above, the vacuum chamber can be baked by high frequency heating.

Baking using a baking heater alone is extremely inefficient, but baking efficiency can be greatly increased by adding high-frequency heating. In the case of high-frequency heating, the rise time of baking is faster and the baking efficiency is much better than that of ordinary baking heaters.

In addition, heating using only a conventional baking heater had extremely poor baking efficiency for things inside the vacuum chamber, but high-frequency heating heats everything inside the coil. Conductors are heated by eddy currents generated by electromagnetic induction, and dielectrics are also heated slowly by dielectric loss. In particular, since heat is generated from within, uniform heating is possible.

It is important that everything inside the coil is heated by high-frequency heating, and this is particularly effective for baking when optical systems such as mirrors are included in the vacuum chamber.

[Effects of the Invention] As explained above, according to the present invention, it is possible to provide an ultra-high vacuum device that uses synchrotron radiation light to improve the working efficiency of achieving an ultra-high vacuum, which greatly contributes to practical application. I can contribute.

[Brief explanation of the drawing]

FIG. 1 is a schematic diagram of an embodiment of the present invention, and FIG. 2 is a schematic diagram of a conventional ultra-high vacuum apparatus. 1... Synchrotron radiation source 2... Electron storage ring 3
... Synchrotron synchrotron radiation

Claims (1)

[Claims] (1) In an ultra-high vacuum apparatus consisting of a synchrotron radiation light source, a beam line that forms a path for the synchrotron radiation, and a vacuum chamber that introduces and utilizes the synchrotron radiation, the vacuum chamber has a high-frequency current. An ultra-high vacuum device characterized by being surrounded by a coil that passes through it.