JPS6325712B2 - - Google Patents
Info
- Publication number
- JPS6325712B2 JPS6325712B2 JP54162078A JP16207879A JPS6325712B2 JP S6325712 B2 JPS6325712 B2 JP S6325712B2 JP 54162078 A JP54162078 A JP 54162078A JP 16207879 A JP16207879 A JP 16207879A JP S6325712 B2 JPS6325712 B2 JP S6325712B2
- Authority
- JP
- Japan
- Prior art keywords
- drain
- source
- transistor
- semiconductor region
- well
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/80—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
- H10D84/82—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components
- H10D84/83—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET]
- H10D84/85—Complementary IGFETs, e.g. CMOS
- H10D84/858—Complementary IGFETs, e.g. CMOS comprising a P-type well but not an N-type well
Landscapes
- Semiconductor Integrated Circuits (AREA)
- Semiconductor Memories (AREA)
- Non-Volatile Memory (AREA)
- Static Random-Access Memory (AREA)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16207879A JPS5683963A (en) | 1979-12-13 | 1979-12-13 | Semiconductor memory element |
| DE8080304496T DE3067215D1 (en) | 1979-12-13 | 1980-12-12 | Charge-pumping semiconductor memory cell comprising a charge-storage region and memory device using such a cell |
| EP80304496A EP0030856B1 (en) | 1979-12-13 | 1980-12-12 | Charge-pumping semiconductor memory cell comprising a charge-storage region and memory device using such a cell |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16207879A JPS5683963A (en) | 1979-12-13 | 1979-12-13 | Semiconductor memory element |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5683963A JPS5683963A (en) | 1981-07-08 |
| JPS6325712B2 true JPS6325712B2 (enrdf_load_stackoverflow) | 1988-05-26 |
Family
ID=15747660
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16207879A Granted JPS5683963A (en) | 1979-12-13 | 1979-12-13 | Semiconductor memory element |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5683963A (enrdf_load_stackoverflow) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5893371A (ja) * | 1981-11-30 | 1983-06-03 | Nec Corp | Mosデバイス |
-
1979
- 1979-12-13 JP JP16207879A patent/JPS5683963A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5683963A (en) | 1981-07-08 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4622656A (en) | Non-volatile semiconductor memory | |
| US4233526A (en) | Semiconductor memory device having multi-gate transistors | |
| US4419744A (en) | Non-volatile static ram element | |
| US4425631A (en) | Non-volatile programmable integrated semiconductor memory cell | |
| JPS6112396B2 (enrdf_load_stackoverflow) | ||
| JPS58119667A (ja) | ダイナミツク・ランダム・アクセス・メモリ装置 | |
| US3882469A (en) | Non-volatile variable threshold memory cell | |
| JPS6059750B2 (ja) | 不揮発性半導体記憶装置 | |
| JPS608559B2 (ja) | 不揮発性半導体記憶装置 | |
| JPS6228518B2 (enrdf_load_stackoverflow) | ||
| JP2002043448A (ja) | 集積回路とメモリセルのトラップチャージ層のチャージ方法 | |
| KR100655028B1 (ko) | 비휘발성 반도체 기억장치 | |
| JPS6325712B2 (enrdf_load_stackoverflow) | ||
| US3908182A (en) | Non-volatile memory cell | |
| KR100304000B1 (ko) | 반도체메모리및반도체메모리용소거방법 | |
| US5313086A (en) | Semiconductor device | |
| JPH10223784A (ja) | フラッシュメモリセル | |
| JP2806552B2 (ja) | 半導体不揮発性記憶装置 | |
| JPS6343902B2 (enrdf_load_stackoverflow) | ||
| US4123771A (en) | Nonvolatile semiconductor memory | |
| JPH084114B2 (ja) | 半導体不揮発性ram | |
| JPH0340956B2 (enrdf_load_stackoverflow) | ||
| JP6232200B2 (ja) | 不揮発性半導体記憶装置 | |
| JPS609673B2 (ja) | 半導体記憶装置 | |
| EP0259158A2 (en) | Semiconductor non-volatile random access memory |