JPS63249146A - Mask cleaning device - Google Patents

Mask cleaning device

Info

Publication number
JPS63249146A
JPS63249146A JP8317487A JP8317487A JPS63249146A JP S63249146 A JPS63249146 A JP S63249146A JP 8317487 A JP8317487 A JP 8317487A JP 8317487 A JP8317487 A JP 8317487A JP S63249146 A JPS63249146 A JP S63249146A
Authority
JP
Japan
Prior art keywords
mask
ashing
chamber
cleaning
asher
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8317487A
Other languages
Japanese (ja)
Inventor
Iwao Ejiri
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP8317487A priority Critical patent/JPS63249146A/en
Publication of JPS63249146A publication Critical patent/JPS63249146A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To improve the cleaning effect of a mask cleaning device, by providing an asher to be used for ashing the surface of a mask in the device and improving the wettability of the mask surface.
CONSTITUTION: An asher section 12 for ashing the surface of a mask is provided. A mask 4 is set on a mask holder 14 provided inside a chamber 13 and a reactive gas is led into the chamber 13 at the moment when a set degree of vacuum is attained after a lid 15 is closed and the chamber 13 is exhausted of air by means of a vacuum pump. Then a high-frequency power is supplied and gaseous plasma is produced between electrodes. The surface of the mask 4 is ashed by means of the plasma for a fixed time. After ashing, the lid 15 is opened and the mask 4 is raised. The mask 4 is then carried to a cleaning section along a carrying path. Therefore, the wettability of the mask surface is improved and organic matters are removed from the mask surface. As a result, the cleaning effect of the mask surface is improved.
COPYRIGHT: (C)1988,JPO&Japio
JP8317487A 1987-04-03 1987-04-03 Mask cleaning device Pending JPS63249146A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8317487A JPS63249146A (en) 1987-04-03 1987-04-03 Mask cleaning device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8317487A JPS63249146A (en) 1987-04-03 1987-04-03 Mask cleaning device

Publications (1)

Publication Number Publication Date
JPS63249146A true JPS63249146A (en) 1988-10-17

Family

ID=13794919

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8317487A Pending JPS63249146A (en) 1987-04-03 1987-04-03 Mask cleaning device

Country Status (1)

Country Link
JP (1) JPS63249146A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04163456A (en) * 1990-10-26 1992-06-09 Nec Kyushu Ltd Reticle washing device
JPH04186351A (en) * 1990-11-21 1992-07-03 Nec Kyushu Ltd Cleaning of reticle
KR101098968B1 (en) * 2010-08-03 2011-12-28 (주)지니아텍 Deposition mask cleaning apparatus and method for active matrix organic light emitting diode

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04163456A (en) * 1990-10-26 1992-06-09 Nec Kyushu Ltd Reticle washing device
JPH04186351A (en) * 1990-11-21 1992-07-03 Nec Kyushu Ltd Cleaning of reticle
KR101098968B1 (en) * 2010-08-03 2011-12-28 (주)지니아텍 Deposition mask cleaning apparatus and method for active matrix organic light emitting diode

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