JPS63248115A - Discrimination device for semiconductor device - Google Patents

Discrimination device for semiconductor device

Info

Publication number
JPS63248115A
JPS63248115A JP8230587A JP8230587A JPS63248115A JP S63248115 A JPS63248115 A JP S63248115A JP 8230587 A JP8230587 A JP 8230587A JP 8230587 A JP8230587 A JP 8230587A JP S63248115 A JPS63248115 A JP S63248115A
Authority
JP
Japan
Prior art keywords
pattern
semiconductor
identification
wafers
classification
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8230587A
Other languages
Japanese (ja)
Inventor
Akihiro Hosoya
明宏 細谷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP8230587A priority Critical patent/JPS63248115A/en
Publication of JPS63248115A publication Critical patent/JPS63248115A/en
Pending legal-status Critical Current

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  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

PURPOSE:To cut down the cost of manufacture of the title discriminating device by a method wherein the discrimination pattern, which was formed simultaneously with a semiconductor element pattern, is classified automatically. CONSTITUTION:Wafers 21 are sent to the position detecting part 11 of a discrimination pattern 22 from a stoker 15 by a belt 18, the positioning operation of the linear point of intersection of a stripe line 23 in conducted by the detection of a stepping using a laser beam. The position of the pattern 22 is recognized by the relative position from the linear point of intersection, the wafers 21 are sent to a pattern recognition part 12. Then, the pattern 22 is discriminated by the laser beam, the discriminated wafers 21 are classified by a classification part 13 using the method of classification which was inputted into a control part 14 in advance and the wafers are housed in a stoker 16.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明に半導体装置に形成きれたパターンを自動で識別
する半導体装置の識別方法に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a semiconductor device identification method for automatically identifying a pattern completely formed on a semiconductor device.

〔従来の技術〕[Conventional technology]

笹米半導体装置の識別に関しては自動装置を用いずに人
間の顕微鏡による目視チェックにより識別を行うか識別
を行うための専用のマークを半導体基板に、別工程で付
けることによって自動的に半導体装置の識別を行ってい
た。
Regarding the identification of Sasamai semiconductor devices, identification can be done by visual inspection using a human microscope without using automatic equipment, or by attaching a special mark for identification to the semiconductor substrate in a separate process. I was making an identification.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

上述した従来の半導体装置のν別方法では、識別用のマ
ークを付与する工程が発生するだけでなく半導体基板に
マークを付与する場所を確保しなけれfiならないとい
う欠点があった。
The above-mentioned conventional ν method for semiconductor devices has the disadvantage that not only does it require the step of applying an identification mark, but also a place must be secured on the semiconductor substrate to place the mark.

〔間1点を解決す不ための手段〕 本発明の半導体装置の識別方法に半導体素子を形成する
パターンと四時に形成された識別用パターンの位置を検
出する工程とパターンを識別する工程と識別きれた半導
体装置を分類する工程を有している。
[Means for solving the problem] The method for identifying a semiconductor device of the present invention includes a step of detecting the position of a pattern forming a semiconductor element and an identification pattern formed at four o'clock, a step of identifying the pattern, and identification. The process includes a process of classifying broken semiconductor devices.

〔実施例〕〔Example〕

次に本発明について1ヌI而を畠照して歓明する。 Next, I would like to explain briefly about the present invention.

論1図σ本発明の一実MII例を実埃する半導体識別装
置の概略図である。図において11rt識別用パターン
の位置検出部、12riパタ一ン識別部、13ri半導
体装置の分類部、14riこれらの制御部でちる。第2
図1’lt識別される半導体装置の概略図であり、21
がウェハー、22が識別用パターン、23がスクライプ
絢である。また本実施例における識別パターン22とは
半導体装置の製品名でありチップサイズの大小r16つ
でも製品名はチ・ツブの1′6」−位置に存在するよう
マスクパターンは設定されている。まずウェハ−21r
i半導体ウェハー搬出用ストフカ−15より自動搬送ベ
ルト18によって識別用パターンの位置検出部11へ送
られる検出部11ではレーザー光を用いてスフライフ線
23の段差を検出することによりスフライ7゜線の交点
の位置出しが行なわれる。ここで識別用パターン22は
チップの同一位置に存在ブるのでスクライブ脚23の交
点からの相対位置によりその位置を認識できパターン識
別部12ヘウエハ−21が搬送されたときにri識別用
パターン22の位置出しは完了している。パターンの識
別方法としては光の明暗を利用したりパターンの段差レ
ーザ光の反射など極々の方法が考えられるが本装置とし
てはレーザ光をオリ用することによりパターン識別を行
っている。識別されたウェハー21ri、制御部14に
あらかじめ入力された分類方法によって分類部13にで
分類されて各々の半導体ウェハー搬入用ストヴカ−16
に収納される。また、本装置は一度でパターン識別でき
なかった場合の再識別制御や識別不能ウェハーの分類機
能を兼ね備えている。
FIG. 1 is a schematic diagram of a semiconductor identification device implementing an actual MII example of the present invention. In the figure, 11 rt identification pattern position detection section, 12 ri pattern identification section, 13 ri semiconductor device classification section, and 14 ri these control sections. Second
FIG. 1'lt is a schematic diagram of an identified semiconductor device, 21
is a wafer, 22 is an identification pattern, and 23 is a scribe pattern. Further, the identification pattern 22 in this embodiment is the product name of the semiconductor device, and the mask pattern is set so that the product name is present at the 1'6'' position of the chip for 16 chip sizes. First, wafer-21r
i The detection section 11 sends the identification pattern from the semiconductor wafer unloading stoker 15 to the identification pattern position detection section 11 by the automatic conveyance belt 18. The detection section 11 uses a laser beam to detect the level difference in the swipe life line 23, thereby detecting the intersection of the 7° swipe line. positioning is performed. Here, since the identification pattern 22 exists at the same position on the chip, its position can be recognized from the relative position from the intersection of the scribe legs 23. When the wafer 21 is transferred to the pattern identification section 12, the RI identification pattern 22 is Positioning is complete. There are various methods for identifying patterns, such as using the brightness of light or reflecting laser light on the steps of the pattern, but this device identifies patterns by using laser light. The identified wafers 21ri are sorted by the sorting section 13 according to the sorting method inputted in advance to the control section 14, and then transported to the stovker 16 for carrying in each semiconductor wafer.
is stored in. Additionally, this device has a re-identification control function in case a pattern cannot be identified the first time, and a classification function for unidentifiable wafers.

〔実施例2〕 第3図は本発明の実施例2の半導体装置を表す概略図で
ゲートアレー、ROM品権l8の製品をコート別に分け
るものであり、31riウエハー。
[Embodiment 2] FIG. 3 is a schematic diagram showing a semiconductor device according to Embodiment 2 of the present invention, in which products of gate array and ROM quality 18 are divided by coat, and are made of a 31ri wafer.

32はパターン識別グされたウェハーの品種を表すコー
ド名、33riスクライ7°膀である。
32 is a code name representing the type of wafer subjected to pattern identification, 33ri 7° wafer.

本実施例においては図1の識別装置を用いることl’j
 1cIj様であるが入庫する段階などのコードごとの
凸極分類を自動で行うことができる。尚品種コードパタ
ーンの転写される半導体装置上の位置ニ図2と同様スフ
ライフ線との位置関係が一定の胸1係となっている。
In this embodiment, the identification device shown in FIG. 1 is used.
1cIj, it is possible to automatically perform convex pole classification for each code, such as the stage of stocking. The position on the semiconductor device to which the type code pattern is transferred has a constant positional relationship with the life line as shown in FIG.

〔発明の効果〕〔Effect of the invention〕

以上説明したように本発明は、半導体素子を形成するパ
ターンと同時に形成された識別パターンを自動で分類す
ることにより識別パターンを付与する必要がなくなり半
導体装置の製造費用を低減することができる効果がある
As explained above, the present invention has the effect of automatically classifying the identification pattern formed at the same time as the pattern forming the semiconductor element, thereby eliminating the need to add an identification pattern and reducing the manufacturing cost of semiconductor devices. be.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の一実施例を実現する半導体識別装置の
に略図、第2図、第3図は識別さnる半導体装置の概略
図である。 11・・・・・・識別パターンの位置杵出fR1,12
・・・・・・パターンの識別部、13・・・・・・半導
体装置の分類部、14・・・・・・制御部、15・・・
・・・半導体ウェハー搬出用キャリアストッカー、16
・・・・・・半導体ウェハー搬入用キャリアスト、カー
、17・・・・・・モニターテレビ、18・・・・・・
搬送用ベル)、21・・川・半導体ウェハー、22・・
・・・・識別パターン(製品名)、23・・・・・・ス
フライフ’i、31・・・・・・半導体ウェハー、32
・・・・・・識別パターン(品種コード)、33・・・
・・・スフライフ線。 −“、1ユン 葛f図 フ 2イ $2区 第3凹  j1
FIG. 1 is a schematic diagram of a semiconductor identification device implementing an embodiment of the present invention, and FIGS. 2 and 3 are schematic diagrams of a semiconductor device to be identified. 11...Identification pattern position punching fR1, 12
...Pattern identification section, 13...Semiconductor device classification section, 14...Control section, 15...
...Carrier stocker for carrying out semiconductor wafers, 16
...Carrier strike for loading semiconductor wafers, car, 17...Monitor TV, 18...
Transport bell), 21... River/Semiconductor wafer, 22...
...Identification pattern (product name), 23...Suflife'i, 31...Semiconductor wafer, 32
...Identification pattern (product code), 33...
...Suflife line. -“, 1 Yun Ge f Map F 2 I $ 2 Ward 3rd concave j1

Claims (1)

【特許請求の範囲】[Claims] 半導体基板上または該半導体基板上に形成された種々の
膜上に半導体素子を形成するパターンと同時に形成され
た文字、数字あるいは記号、コードなどのパターンを識
別しあらかじめ入力された分類基準に従って半導体基板
の分類を自動的に行うことを特徴とする半導体装置の識
別装置。
Patterns such as letters, numbers, symbols, codes, etc. formed simultaneously with patterns for forming semiconductor elements on a semiconductor substrate or various films formed on the semiconductor substrate are identified, and semiconductor substrates are classified according to pre-entered classification criteria. An identification device for semiconductor devices, characterized in that it automatically performs classification of semiconductor devices.
JP8230587A 1987-04-02 1987-04-02 Discrimination device for semiconductor device Pending JPS63248115A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8230587A JPS63248115A (en) 1987-04-02 1987-04-02 Discrimination device for semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8230587A JPS63248115A (en) 1987-04-02 1987-04-02 Discrimination device for semiconductor device

Publications (1)

Publication Number Publication Date
JPS63248115A true JPS63248115A (en) 1988-10-14

Family

ID=13770840

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8230587A Pending JPS63248115A (en) 1987-04-02 1987-04-02 Discrimination device for semiconductor device

Country Status (1)

Country Link
JP (1) JPS63248115A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04215452A (en) * 1990-12-14 1992-08-06 N M B Semiconductor:Kk Device for automatically reading wafer lot number

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04215452A (en) * 1990-12-14 1992-08-06 N M B Semiconductor:Kk Device for automatically reading wafer lot number
JPH06105737B2 (en) * 1990-12-14 1994-12-21 日鉄セミコンダクター株式会社 Wafer lot number automatic reader

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