JPS63244657A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JPS63244657A
JPS63244657A JP62077071A JP7707187A JPS63244657A JP S63244657 A JPS63244657 A JP S63244657A JP 62077071 A JP62077071 A JP 62077071A JP 7707187 A JP7707187 A JP 7707187A JP S63244657 A JPS63244657 A JP S63244657A
Authority
JP
Japan
Prior art keywords
bed
leads
metal layers
semiconductor device
layers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62077071A
Other languages
Japanese (ja)
Other versions
JP2618883B2 (en
Inventor
Toru Furuyama
古山 透
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP62077071A priority Critical patent/JP2618883B2/en
Publication of JPS63244657A publication Critical patent/JPS63244657A/en
Application granted granted Critical
Publication of JP2618883B2 publication Critical patent/JP2618883B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

PURPOSE:To make a large-sized bed and a small-sized package compatible with each other by a method wherein metal layers where a lead or a bed is formed are laminated by laying an insulating layer between the metal layers to form a multilayer structure and a semiconductor chip mounted on the bed is plastic-sealed. CONSTITUTION:Metal layers 1a, 1b where leads 2 or a bed 3 have been formed on separate layers and which have been formed by bending individual metal plates 1 are laminated by laying an insulating layer such as a sealing resin 5, a dielectric or the like between two layers to form a multilayer substrate; a semiconductor chip 8 which has been mounted on the bed 3 is plastic-sealed. That is to say, if the two or more metal layers 1a, 1b are used and the metal layers 1a, 1b where, e.g., the leads 2 are formed and the metal layers 1a, 1b where the bed 3 is formed are overlapped by laying the insulating layer between them, a greater degree of freedom is given to a layout of the leads 2 and the bed 3. By this setup, the assembly which has the large-sized bed 3 and where the semiconductor chip 8 corresponding to this size is mounted can be realized in a small-sized package and without being obstructed by the leads 2.

Description

【発明の詳細な説明】 〔発明の目的〕 (産業上の利用分野) 本発明は、特に樹脂封止型の半導体素子容器(プラスチ
ックパッケージ)を使用した半導体装置であって、集積
度が高く、しかも集積度が容易に損なわれてしまうこと
がない高性能、高信頼性を実現した半導体装置に関する
[Detailed Description of the Invention] [Object of the Invention] (Industrial Application Field) The present invention particularly relates to a semiconductor device using a resin-sealed semiconductor element container (plastic package), which has a high degree of integration. Moreover, the present invention relates to a semiconductor device that achieves high performance and high reliability without easily losing its degree of integration.

(従来の技術) 半導体装置における半導体チップを収納するパッケージ
には、大別してセラミックとプラスチックに21EJ類
の材料が使用されている。このセラミックは一般に信頼
性の面でプラスチックより優れているが、かなり高価で
ある。これに対して、プラスチックは安価で、しかも自
動化に適し、例えばメモリー等のように大量生産で価格
競争力が求められる半導体チップのパッケージとしては
最適である。
(Prior Art) Materials of the 21EJ class are used for packages that house semiconductor chips in semiconductor devices, which are broadly classified into ceramic and plastic. This ceramic is generally superior to plastic in terms of reliability, but is considerably more expensive. On the other hand, plastic is inexpensive and suitable for automation, making it ideal for use as a package for semiconductor chips, such as memory, which are mass-produced and require price competitiveness.

従来の上記プラスチックパッケージを使用した半導体装
置は、第6図に示すように、一枚の金属板1に加工を施
して複数のリード2、ベッド3及び吊りピン4を成形し
、このベッド2の上面に半導体チップをマウントし、こ
の半導体チップのパッドと上記各リード2とをワイヤボ
ンディングした後、パッケージ樹脂5で樹脂封止し、し
かる後にリード2やベッド3を金属板(フレーム)1か
ら切離し、更にリード2を所望の形状に折曲げて、半導
体装置を構成していた。
As shown in FIG. 6, a conventional semiconductor device using the above-mentioned plastic package is manufactured by processing a single metal plate 1 to form a plurality of leads 2, a bed 3, and a hanging pin 4. After mounting a semiconductor chip on the top surface and wire-bonding the pads of this semiconductor chip and each of the above-mentioned leads 2, resin sealing is performed with a package resin 5, and then the leads 2 and bed 3 are separated from the metal plate (frame) 1. Furthermore, the leads 2 are bent into a desired shape to construct a semiconductor device.

この半導体装置のメモリーのパッケージの形態の一つと
して、第7図に示すようなZIP (ジグザグ・インラ
イン・パッケージ)がある。これは、リード2のパッケ
ージ樹脂5からの出口を一側面に集中させ、この側面か
ら突出したり−ド2を互い違いに上下に屈曲させたもの
である。
One type of package for the memory of this semiconductor device is a ZIP (zigzag inline package) as shown in FIG. In this case, the exits of the leads 2 from the package resin 5 are concentrated on one side, and the leads 2 are made to protrude from this side and are alternately bent up and down.

(発明が解決しようとする問題点) しかしながら、上記従来例の場合、金属層が一層であっ
たため、例えばリードとベッドとを重合させることがで
きず、このためリードのレイアウトが制限されたり、所
望の面積と形状を確保したベッドを得ようとすると、リ
ードのレイアウトの関係でパッケージのサイズが大きく
なったりする不都合があった。
(Problems to be Solved by the Invention) However, in the case of the above-mentioned conventional example, since the metal layer was one layer, it was not possible to polymerize the leads and the bed, for example, and as a result, the layout of the leads was restricted or the desired When trying to obtain a bed with a certain area and shape, there was an inconvenience that the size of the package became large due to the layout of the leads.

また、逆に一定のパッケージサイズを得ようとすると、
ベッドが小さくなり、従ってここにマウントする半導体
素子のチップ面積も小さくせねばならず、このため極端
に微細な寸法を用いて設計しなければならないといった
不都合があった。
On the other hand, if you try to obtain a constant package size,
As the bed becomes smaller, the chip area of the semiconductor element mounted there must also be reduced, which is disadvantageous in that it must be designed using extremely fine dimensions.

特に、上記ZIPの場合、リードの出口が一辺に集中し
ているため、この引き廻しが激しく、リードのキャパシ
タンスやインダクタンスは増し、またベッドサイズは小
さくなってしまうといった不都合があった。
In particular, in the case of the above-mentioned ZIP, since the lead exits are concentrated on one side, this leads to severe pulling, which increases the capacitance and inductance of the leads, and also reduces the bed size.

本発明は上記に鑑み、大きなベッドサイズと小さなパッ
ケージサイズを両立することができるばかりでなく、耐
ノイズ性や、例えば耐湿性等の信頼性の高い半導体装置
を提供することを目的としてなされたものである。
In view of the above, the present invention has been made for the purpose of providing a semiconductor device that is not only capable of achieving both a large bed size and a small package size, but also has high reliability such as noise resistance and moisture resistance. It is.

〔発明の構成〕[Structure of the invention]

(問題点を解決するための手段) 本発明は上記目的を達成するため、リードまたはベッド
を別々の層で形成したり単一の金属板を折曲げて形成し
た金属層を、封止用樹脂やその他の誘電体等の絶縁層を
介在させて多層に積層し、このベッド上に搭載した半導
体チップを樹脂封止したものである。
(Means for Solving the Problems) In order to achieve the above object, the present invention forms leads or beds in separate layers or bends a single metal plate to form a metal layer with a sealing resin. A semiconductor chip is stacked in multiple layers with an insulating layer of dielectric or other dielectric material interposed therebetween, and a semiconductor chip mounted on this bed is sealed with a resin.

(作 用) 而して、2層以上の金属層を利用し、例えばリードを形
成した金属層とベッドを形成した金属層等とを絶縁層を
介在させつつオーバーラツプさせることにより、リード
及びベッドのレイアウトに、より大きな自由度を与えた
ものである。
(Function) By using two or more metal layers, for example, by overlapping the metal layer forming the leads and the metal layer forming the bed with an insulating layer interposed, the leads and the bed can be formed. This gives greater freedom in layout.

(実施例) 第1図及び第2図は本発明の一実施例を示し、上記ZI
Pに適応させたものである。
(Example) FIGS. 1 and 2 show an example of the present invention, and the above ZI
It is adapted to P.

即ち、一枚の金属板1に加工を施して、折曲げ線6を境
として、上層の金属膜となる上層部1aと下層の金属膜
となる下層部1bとに分割するとともに、この上層部1
aにはリード2、ベース3及び吊りビン4を、下層部1
bにこのベース3との重合部7と交差するり−ド2を夫
々レイアウトして形成し、組立ての際に、ベース3の上
面に半導体チップ8をマウントした後、折曲げ線6に沿
って折曲げるとともに、折曲げた2層の金属膜1a、l
bの間に、ベース3とリード2の重合面のどちらか一方
に絶縁物質を付着させることにより絶縁層を介在させて
、両金属膜1a、lbとの間を絶縁させる。
That is, a single metal plate 1 is processed and divided into an upper layer part 1a, which is an upper layer metal film, and a lower layer part 1b, which is a lower layer metal film, with the bending line 6 as a boundary, and this upper layer part 1
The lead 2, base 3 and hanging bottle 4 are attached to the lower part 1.
A board 2 is laid out and formed to intersect with the overlapping part 7 with the base 3, and after mounting the semiconductor chip 8 on the top surface of the base 3 during assembly, the board 2 is laid out along the bending line 6. As well as bending, the bent two-layer metal films 1a, l
An insulating layer is interposed between the two metal films 1a and 1b by attaching an insulating material to one of the overlapping surfaces of the base 3 and the lead 2, thereby insulating the two metal films 1a and 1b.

そして、このように折曲げた後、この半導体チップ8の
パッド8aとリード2の先端との間をボンディングワイ
ヤ9でワイヤボンディングした後にパッケージ樹脂5で
樹脂封止し、しかる後に金属板(フレーム)1からリー
ド2及びベッド3を切離して半導体装置を構成したもの
である。
After bending in this way, wire bonding is performed between the pads 8a of this semiconductor chip 8 and the tips of the leads 2 using a bonding wire 9, and then resin sealing is performed with a package resin 5. After that, a metal plate (frame) is formed. A semiconductor device is constructed by separating leads 2 and bed 3 from 1.

この場合、折曲げられた2層間の絶縁層の膜厚は厚く、
誘電率は低い方が、ベッド3とオーバーラツプするり−
ド2の寄生容量を小さくする上で好ましい。
In this case, the thickness of the insulating layer between the two folded layers is thick;
The lower the dielectric constant, the more overlap with bed 3.
This is preferable in terms of reducing the parasitic capacitance of the node 2.

なお、上記絶縁膜は折曲げる時に金属膜1 a +1b
の間に空間を作っておき、封止時の樹脂をこの空間に充
填して絶縁するようにしても良く、また半導体チップ8
のベッド3へのマウントは金属板1を折曲げた後に行う
ようにしても良い。
Note that when the above insulating film is bent, the metal film 1a + 1b
A space may be created between the semiconductor chips 8 and 8, and this space may be filled with resin for sealing to insulate the semiconductor chip 8.
The mounting on the bed 3 may be performed after the metal plate 1 is bent.

第3図は他の実施例で、いわゆるDIP (デュアル・
インライン・パッケージ)に適用した例を示し、一枚の
金属板1を折曲げ線6を境として、を層の金属膜となる
上層部1aと下層の金属膜となる下層部1bとに二分し
て、その上方の下層部1bに四方に広がるリード2を、
その下方の上層部1aにベッド3及び上下の吊りビン4
を夫々形成し、組立ての際にこれを折曲げ線6に沿って
折曲げるとともに、両者の重合部に絶縁層を介在させ、
上記と同様に半導体装置を構成するようにしたものであ
る。
Figure 3 shows another embodiment, the so-called DIP (dual
An example of application to an in-line package is shown in which a single metal plate 1 is divided into two parts, with the bending line 6 as the boundary, into an upper layer part 1a, which is the metal film of the layer, and a lower layer part 1b, which is the metal film of the lower layer. and the leads 2 that spread out in all directions on the lower layer 1b above it,
A bed 3 and upper and lower hanging bins 4 are provided in the upper layer 1a below.
are formed respectively, and bent along the bending line 6 during assembly, and an insulating layer is interposed between the overlapping parts of the two,
A semiconductor device is configured in the same manner as above.

第4図は更に他の実施例を示し、一枚の金属板1を折曲
げ線6を境として、上層の金属膜となる上層部1aと下
層の金属膜となる下層部1bとに二分し、その上方の上
層部1aにベッド3と吊りビン4を形成するとともに、
その下方の下層部1bに上記ベッド3との重合板10を
形成し、この重合板10に吊りビン4を連接し、この重
合板10に先端を近接させてリード2を配設するととも
に、更にこの吊りビン4に接地端子11又は電源端子を
連接したものである。
FIG. 4 shows still another embodiment, in which a single metal plate 1 is divided into two parts, with a bending line 6 as a boundary, into an upper layer part 1a which is an upper layer metal film, and a lower layer part 1b which is a lower layer metal film. , a bed 3 and a hanging bin 4 are formed in the upper layer 1a above it, and
A superimposed board 10 with the bed 3 is formed in the lower layer 1b below, a hanging bottle 4 is connected to this superimposed board 10, and a lead 2 is disposed with its tip close to this superimposed board 10. A grounding terminal 11 or a power terminal is connected to this hanging bottle 4.

このようにすることによって、半導体チップ上で基板電
位を発生させる半導体素子、例えばダイナミックRAM
では、基板電位のノイズ対策が重要な課題となるが、ベ
ッドにlX1M端子又は接地端子と大きな静電容量を持
たせることができ、基板電位の安定化を図るようにする
ことができる。
By doing this, a semiconductor element that generates a substrate potential on a semiconductor chip, such as a dynamic RAM,
In this case, countermeasures against noise in the substrate potential are an important issue, but the bed can have a large capacitance with the lX1M terminal or the ground terminal, and the substrate potential can be stabilized.

更に、第5図に示すように、2つに分離した重合板10
a、10bで上記第4図に示す重合板10を構成し、一
方の重合板10aの吊りビン4を接地端子11に、他方
の重合板10bの吊りビン4を電源端子12に夫々連続
させることにより、ベッド3に接地端子及び電源端子の
両方との静電容量を持たせるようにすることができる。
Furthermore, as shown in FIG. 5, a polymeric board 10 separated into two
a and 10b constitute the overlapping board 10 shown in FIG. This allows the bed 3 to have capacitance with both the ground terminal and the power supply terminal.

なお、基板電位のみならず、電源端子と接地端、子の間
にこの容量を形成して、電源ノイズの低減を図るように
することもできる。
Note that this capacitance can be formed not only between the substrate potential but also between the power supply terminal, the ground terminal, and the terminal to reduce power supply noise.

このような場合、2層間の絶縁膜は耐圧が持つ範囲で極
力薄い方が良く、また誘電率が高い方が好ましい。
In such a case, it is preferable that the insulating film between the two layers be as thin as possible within the range of withstand voltage, and preferably have a high dielectric constant.

なお、上記実施例は、いずれも2層の金属層を備えたも
のを示しているが、3層又はこれ以上の多層にして、よ
り効果を高めるようにすることもできる。更に、例えば
第3図に示すものに、第5図に示すものを加えて、双方
の効果を同時に存するようにすることもできる。
Note that, although the above embodiments each include two metal layers, it is also possible to use three or more layers to further enhance the effect. Furthermore, for example, what is shown in FIG. 5 can be added to what is shown in FIG. 3, so that the effects of both can be present at the same time.

更に、上記実施例では、組立て工程中に折曲げ工程を含
むことにより、単層の金属板を多層(2層)にするもの
を示しているが、例えば最初から2層以上の金属層を用
い、これらを貼り合せるようにして、ベッドやリードを
形成するようにしても良い。
Furthermore, in the above example, a single layer metal plate is made into a multilayer (two layers) by including a bending process during the assembly process, but for example, it is possible to use two or more metal layers from the beginning. , these may be bonded together to form a bed or lead.

この場合は、リードやベッドのパターンをテープ状に何
チップを連ねたリードテープの製造工程を変えることに
より、従来の組立て工程で対処することができる。また
、単一の金属層の場合は、リードテープの製造工程は従
来のままで対処することができ、しかも金型も一種類で
済み安価であるが、組立て工程の中に新たに折曲げ工程
を追加する必要が生じる。
In this case, it is possible to deal with the conventional assembly process by changing the manufacturing process of the lead tape in which several chips are connected in a tape-like manner to the lead or bed pattern. In addition, in the case of a single metal layer, the manufacturing process for the lead tape can be handled as usual, and only one type of mold is required, making it inexpensive, but a new bending process is added during the assembly process. will need to be added.

〔発明の効果〕〔Effect of the invention〕

本発明は上記のような構成であるので、大きなベッドを
有し、これに合った半導体チップを搭載したものを、小
さなパッケージで、しかもリードに阻害されることなく
実現することができる。
Since the present invention has the above-described configuration, it is possible to realize a device having a large bed and mounting a semiconductor chip suitable for the bed in a small package without being obstructed by leads.

しかも、耐ノイズ性や、例えば耐湿性等の信頼性の向上
を図ることができるばかりでなく、引抜き等の外力に対
するリードの強度を強化するようにすることができると
いった効果がある。
Moreover, it is possible not only to improve reliability such as noise resistance and moisture resistance, but also to strengthen the strength of the lead against external forces such as pulling out.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図及び第2図は本発明の一実施例を示し、第1図は
半導体チップをボンディングした状態を示す平面図、第
2図は屈曲前の金属板のレイアウトを示す平面図、第3
図乃至第5図は夫々異なる他の実施例を示す第2図相当
図、第6図は従来の金属板のレイアウトを示す平面図、
第7図は従来のZIPを示し、同図(イ)は平面図、同
図(ロ)は側面図、同図(ハ)は正面図である。 1・・・金属板、1a・・・同上層部(金属層)、1b
・・・同下層部(金属層)、2・・・リード、3・・・
ベッド、4・・・吊りピン、5・・・パッケージ樹脂、
8・・・半導体チップ、10・・・重合板、11・・・
接地端子、12・・・電源端子。 出願人代理人  佐  藤  −雄 芋 1 図 蔓 2 図 呼 第 3 図 第 4 図 牟 5 図 第6 図     2
1 and 2 show one embodiment of the present invention, FIG. 1 is a plan view showing a state in which semiconductor chips are bonded, FIG. 2 is a plan view showing the layout of a metal plate before bending, and FIG.
5 to 5 are views corresponding to FIG. 2 showing other different embodiments, and FIG. 6 is a plan view showing the layout of a conventional metal plate.
FIG. 7 shows a conventional ZIP, in which (A) is a plan view, (B) is a side view, and (C) is a front view. 1... Metal plate, 1a... Upper layer part (metal layer), 1b
...lower layer part (metal layer), 2...lead, 3...
Bed, 4... Hanging pin, 5... Package resin,
8... Semiconductor chip, 10... Polymer board, 11...
Ground terminal, 12...power terminal. Applicant's agent Sato - Yuimo 1 Figure vine 2 Figure 3 Figure 4 Figure 5 Figure 6 Figure 2

Claims (1)

【特許請求の範囲】 1、リードまたはベッドを形成した金属層を絶縁層を介
在させて多層に積層し、このベッド上に搭載した半導体
チップを樹脂封止したことを特徴とする半導体装置。 2、上記絶縁層に封止用樹脂を用いたことを特徴とする
特許請求の範囲第1項記載の半導体装置。 3、上記絶縁層に封止用樹脂とは異なる誘電体を用いた
ことを特徴とする特許請求の範囲第1項記載の半導体装
置。 4、リードとベッドとを夫々別々の金属層で形成し、両
者を重合させて構成したことを特徴とする特許請求の範
囲第1項乃至第3項のいずれかに記載の半導体装置。 5、単一の金属板を折曲げて多層の金属層を形成したこ
とを特徴とする特許請求の範囲第1項乃至第4項のいず
れかに記載の半導体装置。
[Claims] 1. A semiconductor device characterized in that metal layers forming leads or beds are laminated in multiple layers with an insulating layer interposed therebetween, and a semiconductor chip mounted on the bed is sealed with a resin. 2. The semiconductor device according to claim 1, wherein a sealing resin is used for the insulating layer. 3. The semiconductor device according to claim 1, wherein a dielectric material different from the sealing resin is used for the insulating layer. 4. A semiconductor device according to any one of claims 1 to 3, characterized in that the leads and the bed are each formed of separate metal layers, and the two are polymerized. 5. The semiconductor device according to any one of claims 1 to 4, characterized in that a single metal plate is bent to form multiple metal layers.
JP62077071A 1987-03-30 1987-03-30 Semiconductor device Expired - Fee Related JP2618883B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62077071A JP2618883B2 (en) 1987-03-30 1987-03-30 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62077071A JP2618883B2 (en) 1987-03-30 1987-03-30 Semiconductor device

Related Child Applications (1)

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02246257A (en) * 1989-03-20 1990-10-02 Miyazaki Oki Electric Co Ltd Lead frame for zip
JPH038363A (en) * 1989-06-05 1991-01-16 Hitachi Ltd Resin sealed type semiconductor device
JPH0669409A (en) * 1992-04-18 1994-03-11 Temic Telefunken Microelectron Gmbh Semiconductor constitution member group

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS574239U (en) * 1980-06-06 1982-01-09
JPS57120361A (en) * 1981-01-17 1982-07-27 Sanyo Electric Co Ltd Structure of film substrate
JPS5927549A (en) * 1982-08-03 1984-02-14 Toshiba Corp Semiconductor device
JPS5927549U (en) * 1982-08-12 1984-02-21 キヤノン株式会社 electrophotographic copying device
JPS6043849A (en) * 1983-08-19 1985-03-08 Fuji Electric Co Ltd Lead frame

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS574239U (en) * 1980-06-06 1982-01-09
JPS57120361A (en) * 1981-01-17 1982-07-27 Sanyo Electric Co Ltd Structure of film substrate
JPS5927549A (en) * 1982-08-03 1984-02-14 Toshiba Corp Semiconductor device
JPS5927549U (en) * 1982-08-12 1984-02-21 キヤノン株式会社 electrophotographic copying device
JPS6043849A (en) * 1983-08-19 1985-03-08 Fuji Electric Co Ltd Lead frame

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02246257A (en) * 1989-03-20 1990-10-02 Miyazaki Oki Electric Co Ltd Lead frame for zip
JPH038363A (en) * 1989-06-05 1991-01-16 Hitachi Ltd Resin sealed type semiconductor device
JPH0669409A (en) * 1992-04-18 1994-03-11 Temic Telefunken Microelectron Gmbh Semiconductor constitution member group

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