JPS63224321A - Molecular beam epitaxy system - Google Patents

Abstract

PURPOSE:To prevent other evaporation materials from mixing into evaporation sources by providing the evaporation sources so that the openings thereof are positioned within the space surrounded by the extended plane of the inner surface of a shroud, and providing partitions for separating the openings of the evaporation sources. CONSTITUTION:A bearer 2 and a shroud 5 are provided within a chamber 1, evaporation sources 3 are provided so that the openings thereof are positioned within the extended plane of the inner cylinder of the shroud 5, and there are provided partitions 6 for separating the openings of the evaporation sources. Accordingly, the molecular beam from an evaporation source 3a is intercepted by partitions 6a, 6b whereby shadows 7 of the partitions 6a, 6b are generated above the openings of evaporation sorces 3c-3f and there is no deposition of the evaporation material of the evaporation source 3a. With this the evaporation material from the evaporation source 3a can be prevented from mixing into the evaporation sources 3c-3f.

Description

DETAILED DESCRIPTION OF THE INVENTION C. Industrial Application Field The present invention relates to a molecular beam epitaxy apparatus (hereinafter abbreviated as MBE apparatus) for growing a desired thin film on a wafer using molecular beams.

(Summary of the Invention) A chamber includes a cylindrical shroud, a support for supporting a wafer, and a plurality of evaporation sources such that an opening is provided in a space surrounded by an extended surface of the inner surface of the shroud. is installed in the shroud, and a partition wall separating the opening of the evaporation source is installed in the shroud.

[Conventional technology]

Conventionally, as shown in FIG. 3, it has been known to install a shroud 8 using LN as a refrigerant in an MBE apparatus in order to prevent heat radiation from an evaporation source and improve the degree of vacuum.

(Problems to be Solved by the Invention) However, in the conventional MBE apparatus, the evaporated substance from the evaporator 'a3a adheres to a point P vertically above the opening of the evaporator B3b.
If there is a drop of deposits from the acid point P, the evaporation 71!3b
However, there was a drawback that the evaporated substance of evaporation #3a was mixed into the evaporation material.

Therefore, an object of the present invention is to obtain an MBE apparatus in which no other evaporated substances are mixed into the evaporation source.

[Means for solving problems]

In order to solve the above problems, the present invention provides an MBE apparatus that includes a chamber, a cylindrical shroud installed in the chamber, a support for supporting a wafer,
It consists of an evaporation source installed so that its opening is located inside a space surrounded by an extended surface of the inner surface of the shroud, and a partition wall for separating the opening of the evaporation source.

[Effect]

Even if the evaporative substances adhering to the shroud, chamber inner walls, and partition walls of the MBE apparatus configured as described above fall into the evaporation source, the evaporative substances in the evaporation source are not mixed with other evaporative substances, and the evaporation source It is possible to prevent impurities from entering the substance.

〔Example〕

Embodiments of the present invention will be described below based on the drawings.

In FIG. 1, a support 2. A shroud 5 is installed, an evaporation source 3 is installed so that the opening is located inside the extended surface of the inner cylinder of the shroud 5, and a partition wall 6 is installed to separate the opening of the evaporation source. Figure 2 shows a cross-sectional view.

In the embodiment described above, the molecular beams from the evaporation source 3a are blocked by the partition walls 6a and 6b, and the molecular beams from the evaporation source 3c+
Above the openings of 3d, 3e, and 3f, the partition wall 6a,
6b is formed, the evaporation material of the evaporation source 3a does not adhere to the evaporation source 3c, 3d, 3e, and 3f.
Contamination of evaporated substances from fi3a can be prevented.

〔Effect of the invention〕

As explained above, in this invention, a cylindrical shroud and a support for supporting a wafer are installed in a chamber, and an opening is located inside a space surrounded by an extended surface of the inner surface of the shroud. By installing the evaporation source in a similar manner and further installing a partition wall that separates the opening of the evaporation source, there is an effect of eliminating the contamination of other evaporation substances into the evaporation source.

[Brief explanation of the drawing]

FIG. 1 is a longitudinal cross-sectional view of the MBE apparatus according to the present invention, FIG. 2 is a cross-sectional view of the MBE apparatus according to the present invention, and FIG.
The figure is a longitudinal sectional view of a shroud used in a conventional MBE device. 1... Chamber 2... Support 3... Evaporation source 5... Shroud 6... Partition wall and above Applicant: Seiko Electronic Industries, Ltd. Conventional MBEK! /'lj Transmission [T] Figure Figure 3

Claims (1)

[Claims] a chamber, a cylindrical shroud installed in the chamber, a plurality of evaporation sources installed so that an opening is located inside a space surrounded by an extended surface of the inner surface of the shroud, and a wafer for supporting the wafer. It consists of a support device,
Furthermore, the molecular beam epitaxy apparatus is characterized in that the shroud has partition walls for separating the openings of the evaporation sources.