JPS63198329A - Photoresist coating apparatus - Google Patents

Photoresist coating apparatus

Info

Publication number
JPS63198329A
JPS63198329A JP3100487A JP3100487A JPS63198329A JP S63198329 A JPS63198329 A JP S63198329A JP 3100487 A JP3100487 A JP 3100487A JP 3100487 A JP3100487 A JP 3100487A JP S63198329 A JPS63198329 A JP S63198329A
Authority
JP
Japan
Prior art keywords
unit
thickness
film thickness
photoresist film
photoresist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3100487A
Other languages
Japanese (ja)
Inventor
Jiro Yamamoto
Original Assignee
Nec Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nec Corp filed Critical Nec Corp
Priority to JP3100487A priority Critical patent/JPS63198329A/en
Publication of JPS63198329A publication Critical patent/JPS63198329A/en
Granted legal-status Critical Current

Links

Abstract

PURPOSE: To reduce the irregularity of a film thickness by providing a film thickness control unit for controlling the rotation of a motor by measuring the thickness.
CONSTITUTION: A semiconductor wafer 1 is placed through a coating sequence on a conveyor belt 2 in a photoresist coating unit 9, and conveyed to a predetermined position. A laser beam from a laser irradiation unit 4 is projected, and a reflected beam from a photoresist film (and a semiconductor wafer disposed thereunder) is received by a laser light receiving unit 5. An output signal from the unit 5 is transmitted to a microcomputer unit 6, which feeds back a displacement of the desired thickness from a reference value to a spin motor 3 of the unit 9 to control the photoresist film thickness by altering its rotating speed. Thus, the photoresist film which is uniform and less irregular can be coated.
COPYRIGHT: (C)1988,JPO&Japio
JP3100487A 1987-02-13 1987-02-13 Photoresist coating apparatus Granted JPS63198329A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3100487A JPS63198329A (en) 1987-02-13 1987-02-13 Photoresist coating apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3100487A JPS63198329A (en) 1987-02-13 1987-02-13 Photoresist coating apparatus

Publications (1)

Publication Number Publication Date
JPS63198329A true JPS63198329A (en) 1988-08-17

Family

ID=12319420

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3100487A Granted JPS63198329A (en) 1987-02-13 1987-02-13 Photoresist coating apparatus

Country Status (1)

Country Link
JP (1) JPS63198329A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5409538A (en) * 1990-04-13 1995-04-25 Hitachi, Ltd. Controlling method of forming thin film, system for said controlling method, exposure method and system for said exposure method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5409538A (en) * 1990-04-13 1995-04-25 Hitachi, Ltd. Controlling method of forming thin film, system for said controlling method, exposure method and system for said exposure method

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