JPS63181138A - Optical disk substrate - Google Patents
Optical disk substrateInfo
- Publication number
- JPS63181138A JPS63181138A JP62012476A JP1247687A JPS63181138A JP S63181138 A JPS63181138 A JP S63181138A JP 62012476 A JP62012476 A JP 62012476A JP 1247687 A JP1247687 A JP 1247687A JP S63181138 A JPS63181138 A JP S63181138A
- Authority
- JP
- Japan
- Prior art keywords
- hard coat
- coat layer
- substrate
- optical disk
- synthetic resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 30
- 230000003287 optical effect Effects 0.000 title claims abstract description 15
- 229920001296 polysiloxane Polymers 0.000 claims abstract description 11
- 229920003002 synthetic resin Polymers 0.000 claims abstract description 9
- 239000000057 synthetic resin Substances 0.000 claims abstract description 9
- 239000002904 solvent Substances 0.000 abstract description 11
- 239000000203 mixture Substances 0.000 abstract description 5
- 239000000463 material Substances 0.000 abstract description 4
- -1 polysiloxane Polymers 0.000 abstract description 4
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 abstract description 2
- 125000000217 alkyl group Chemical group 0.000 abstract description 2
- 150000002576 ketones Chemical class 0.000 abstract description 2
- 229910000077 silane Inorganic materials 0.000 abstract description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 abstract 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 abstract 1
- 150000004756 silanes Chemical class 0.000 abstract 1
- 238000000034 method Methods 0.000 description 6
- 239000004417 polycarbonate Substances 0.000 description 6
- 239000011521 glass Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 3
- 229920000515 polycarbonate Polymers 0.000 description 3
- VXQBJTKSVGFQOL-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethyl acetate Chemical compound CCCCOCCOCCOC(C)=O VXQBJTKSVGFQOL-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical group COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000007605 air drying Methods 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 239000005022 packaging material Substances 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 229920006268 silicone film Polymers 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Landscapes
- Laminated Bodies (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
Abstract
Description
【発明の詳細な説明】 〔発明の目的〕 （産業上の利用分野） 本発明は、光ディスク用合成樹脂基板に関する。[Detailed description of the invention] [Purpose of the invention] (Industrial application field) The present invention relates to a synthetic resin substrate for optical discs.
（従来の技術）
従来いわゆる光情報記録媒体に用いられる基板は、ガラ
スまたは透明な合成樹脂基板であって、合成樹脂基板の
場合、成形性、光学的透明性等の点で、ポリメチルメタ
クリレート（以下Ｐ聞Ａと略〉やポリカーボネート（以
下ＰＣと略）がよ（用いられている。また特開昭６１−
１６８１５号公報には、紫外線硬化樹脂よりなるハード
コート層を有した注型エポキシ樹脂光ディスク基板を得
る方法が開示されている。(Prior Art) Substrates conventionally used in so-called optical information recording media are glass or transparent synthetic resin substrates, and in the case of synthetic resin substrates, polymethyl methacrylate ( Polycarbonate (hereinafter abbreviated as PC) and polycarbonate (hereinafter abbreviated as PC) are also used.
Japanese Patent No. 16815 discloses a method for obtaining a cast epoxy resin optical disk substrate having a hard coat layer made of an ultraviolet curable resin.
（発明が解決しようとする問題点）
しかし、Ｐ聞へやＰＣを光情報記録媒体用の基板として
使用した場合、以下の様な欠点を有し、それらが実用上
の大きな問題になりつつある。すなわち、Ｐ）ｔＨＡ基
板では、
■ 耐熱性に劣るため、基板上に記録膜を蒸着法により
形成する際変形が生じる。(Problems to be Solved by the Invention) However, when PCs are used as substrates for optical information recording media, they have the following drawbacks, which are becoming major problems in practical use. . That is, the P)tHA substrate has (1) poor heat resistance, which causes deformation when a recording film is formed on the substrate by vapor deposition.
■ 耐溶剤性に劣るため、基板上に記録膜を溶剤コーテ
ィング法により形成する際変形が生じる。- Due to poor solvent resistance, deformation occurs when a recording film is formed on a substrate by a solvent coating method.
■ 吸湿性が大きく吸湿による反りが生じる。■ Highly hygroscopic, causing warping due to moisture absorption.
に）表面硬度が小さいため傷がつきやすい。2) Easy to scratch due to low surface hardness.
また、ＰＣ基板では、 ω 成形時の歪が残り複屈折が生じやすい。Also, on PC boards, ω Double refraction is likely to occur due to residual distortion during molding.
■ 耐熱性が劣る。■ Poor heat resistance.
等の問題点があり、いまだに十分な解決がなされていな
い。There are problems such as these, which have not yet been satisfactorily resolved.
本発明は、こうした問題点に対してなされたものであり
、硬度、透光性、耐溶剤性にすぐれた光ディスク基板を
提供することを目的とする。The present invention has been made to address these problems, and an object of the present invention is to provide an optical disc substrate with excellent hardness, light transmittance, and solvent resistance.
（問題点を解決するための手段）
本発明は、合成樹脂基板の少なくとも片面にラダー型シ
リコーンからなるハードコート層を有することを特徴と
する光ディスク基板である。(Means for Solving the Problems) The present invention is an optical disc substrate characterized by having a hard coat layer made of ladder-type silicone on at least one side of a synthetic resin substrate.
（作 用） 以下、本発明の光ディスク基板を詳細に説明する。(for production) Hereinafter, the optical disc substrate of the present invention will be explained in detail.
本発明において有用なハードコート材料としては、式Ｃ
Ｈ３Ｓ ｉ （ＯＲ＞ ３ マｔ：ハ式Ｃ６Ｈ５Ｓｉ
（ＯＲ）３のシランまたは前者と後者の混合物でその混
合モル比が１：１０〜１０：１としたシランの混合物（
ここでＲは炭素原子数１〜１］のアルキル基である）の
部分縮合された溶剤可溶性の有機ポリシロキサンがあげ
られる。そして、特に有用な有機ポリシロキサンとして
は、具体的には、フェニルトリエトキシシランとメチル
トリエトキシシランとの混合物で、前者と後者の混合モ
ル比において、前者の比率が大きいものである。特に適
切にはモル比が１：１〜４：１とした混合物から得られ
るラダー型シリコーンである。Hard coat materials useful in the present invention include formula C
H3S i (OR> 3 mat: H type C6H5Si
(OR)3 silane or a mixture of the former and the latter in a molar ratio of 1:10 to 10:1 (
Here, R is an alkyl group having 1 to 1 carbon atoms.) Partially condensed solvent-soluble organic polysiloxanes are mentioned. Specifically, a particularly useful organic polysiloxane is a mixture of phenyltriethoxysilane and methyltriethoxysilane, in which the molar ratio of the former to the latter is larger. Particularly suitable are ladder silicones obtained from mixtures in a molar ratio of 1:1 to 4:1.
前記ラダー型シリコーンの溶剤としては、各種溶剤が選
択的に使用されうる。例えば一般的な有機溶剤、例えば
アルカノール、ケトン、エーテル、アルコール等である
。特にジエチレングリコールモノブチルエーテルアセテ
ート及びエチレングリコールモツプチルエーテルまたは
これらの混合物が適する。Various solvents may be selectively used as the solvent for the ladder type silicone. For example, common organic solvents such as alkanols, ketones, ethers, alcohols, etc. Particularly suitable are diethylene glycol monobutyl ether acetate and ethylene glycol monobutyl ether or mixtures thereof.
また、ハードコート層の膜厚としては２ＪＭ！〜１０−
が好ましく、ざらには３〜７ＪＩＩ１１が好ましい。Also, the thickness of the hard coat layer is 2JM! ~10-
is preferable, and 3 to 7JII11 is preferable for roughness.
また、ハードコート層が設けられる基板の合成樹脂材料
としては、任意に広範囲の材料が使用可能である。例え
ばポリメチルメタクリレート、ポリカーボネート、ポリ
スルフォン、ポリオレフィン等が使用されうる。Further, as the synthetic resin material of the substrate on which the hard coat layer is provided, any wide range of materials can be used. For example, polymethyl methacrylate, polycarbonate, polysulfone, polyolefin, etc. can be used.
（実施例） 以下に実施例を示す。(Example) Examples are shown below.
実施例１
Ｐ）ＩＨＡ製射出成形ディスクをベース基板としてこの
上にフェニルトリエトキシシランとメチルトリエトキシ
シランの混合比４：１からなるラダー型シリコーン（ｏ
ｗｅｎｓ−■ｒ ｒ １ｎｏｉｓ社製、ＴＶＩ）８９０
８）のジエチレングリコールモノブチルエーテルアセテ
ート溶液をスピンコード法により５−の厚みで塗布した
のち、湿度３５〜５０％間で室温で３０分風乾復９０’
Ｃで２日加熱硬化して、ハードコート層を有する光ディ
スク基板を得た。Example 1 P) An injection molded disk made by IHA was used as a base substrate, and a ladder type silicone (o
Wens-■r r 1nois, TVI) 890
After applying the diethylene glycol monobutyl ether acetate solution of 8) to a thickness of 5 mm using a spin cord method, air drying was performed for 30 minutes at room temperature at a humidity of 35 to 50%.
C. for 2 days to obtain an optical disc substrate having a hard coat layer.
実施例２
表面平滑性の良好な２枚のガラス板上に、実施例１と同
様の有機ポリシロキサンの溶液をスピンコード法により
５Ｎ１の厚みで塗布したのち、湿度３５〜５０％ＲＨで
室温で３０分風乾させた。Example 2 A solution of the same organic polysiloxane as in Example 1 was applied to a thickness of 5N1 on two glass plates with good surface smoothness by a spin cord method, and then coated at room temperature with a humidity of 35 to 50% RH. It was air-dried for 30 minutes.
次に前記ラダー型シリコーンの膜を形成したガラス板を
処理面が内面になるように対向させ、スベーザーで周辺
部をシールしてキャビティを形成したのち、メタクリル
酸メチルモノマ―を注入し、９０’Ｃで２日硬化した。Next, the glass plates on which the ladder-type silicone film was formed were placed facing each other so that the treated surface was the inner surface, and the peripheral area was sealed with a swazer to form a cavity. Methyl methacrylate monomer was injected into the glass plate at 90'C. It was cured for 2 days.
脱型後、両面がガラス板面からハードコート層が転写さ
れた光ディスク基板を得た。After demolding, an optical disc substrate was obtained on both sides of which the hard coat layer was transferred from the glass plate surface.
以上の実施例及び従来のハードコートのない基板の特性
を評価した結果を以下の表に示す。The results of evaluating the characteristics of the above examples and the conventional substrate without hard coat are shown in the table below.
尚、前記実施例においてベース基板をＰＭ）ｔＡとした
が、他の合成樹脂基板も使用可能であることはいうまで
もない。また、膜の形成方法もスピンコード法に限らず
ディップ法、ロールコート法など種々の湿式塗布法が適
用できる。Although PM)tA was used as the base substrate in the above embodiment, it goes without saying that other synthetic resin substrates can also be used. Furthermore, the method for forming the film is not limited to the spin-coating method, and various wet coating methods such as a dip method and a roll coating method can be applied.
以上本発明による光ディスク基板は、硬度、透光性、耐
溶剤性にすぐれ、ベース基板とハードコート層との密着
性もきわめて良好であり、本光ディスク基板を光情報記
録媒体として使用したときの効果も大である。As described above, the optical disc substrate according to the present invention has excellent hardness, light transmittance, and solvent resistance, and also has extremely good adhesion between the base substrate and the hard coat layer, and has the following effects when used as an optical information recording medium. is also large.
Claims (1)
らなるハードコート層を有することを特徴とする光ディ
スク基板。An optical disc substrate comprising a hard coat layer made of ladder-type silicone on at least one side of a synthetic resin substrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62012476A JPS63181138A (en) | 1987-01-23 | 1987-01-23 | Optical disk substrate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62012476A JPS63181138A (en) | 1987-01-23 | 1987-01-23 | Optical disk substrate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63181138A true JPS63181138A (en) | 1988-07-26 |
Family
ID=11806431
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62012476A Pending JPS63181138A (en) | 1987-01-23 | 1987-01-23 | Optical disk substrate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63181138A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02162547A (en) * | 1988-12-15 | 1990-06-22 | Daicel Chem Ind Ltd | Production of optical disk |
-
1987
- 1987-01-23 JP JP62012476A patent/JPS63181138A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02162547A (en) * | 1988-12-15 | 1990-06-22 | Daicel Chem Ind Ltd | Production of optical disk |
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