JPS63146038A - Photosensitive composition - Google Patents

Photosensitive composition

Info

Publication number
JPS63146038A
JPS63146038A JP29248786A JP29248786A JPS63146038A JP S63146038 A JPS63146038 A JP S63146038A JP 29248786 A JP29248786 A JP 29248786A JP 29248786 A JP29248786 A JP 29248786A JP S63146038 A JPS63146038 A JP S63146038A
Authority
JP
Japan
Prior art keywords
group
ray
titled composition
different
same
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP29248786A
Inventor
Shuji Hayase
Rumiko Horiguchi
Kiyonobu Onishi
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP29248786A priority Critical patent/JPS63146038A/en
Publication of JPS63146038A publication Critical patent/JPS63146038A/en
Application status is Pending legal-status Critical

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/60Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which all the silicon atoms are connected by linkages other than oxygen atoms
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/075Silicon-containing compounds
    • G03F7/0757Macromolecular compounds containing Si-O, Si-C or Si-N bonds

Abstract

PURPOSE:To obtain the titled composition composed of a polysilane or a polysiloxane type polymer capable of forming a fine resist pattern by incorporating a specific polymer to the titled composition, thereby dissolving fully said composition in an alkaline solution, after photodecomposition by exposing it. CONSTITUTION:The titled composition is composed of the polymer having a structural unit shown by formula I or II wherein R1-R4 and R14-R17 may be the same or different with each other, and are each hydrogen atom, 1-10C an aliphatic group, 6-14C an unsubstd. or a substd. aromatic group, R5-R8 may be the same or different with each other and are each hydrogen atom, hydroxyl, alkoxy, 1-10C an aliphatic, 6-14C an unsatd. or a satd. aromatic group, R9-R13 may be the same or different with each other, and are each hydrogen or halogen atom, 1-12C alkyl group, 1-12C alkoxy group, cyano, nitro or hydroxy group, (m) is a positive integer, (n) is a positive integer, including zero. Thus, the component soluble to an alkaline solution is formed by decomposing the irradiated part of the titled composition by irradiating an energy ray such as a UV ray, a visible ray, an electron beam or a X ray, etc.
JP29248786A 1986-12-10 1986-12-10 Photosensitive composition Pending JPS63146038A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP29248786A JPS63146038A (en) 1986-12-10 1986-12-10 Photosensitive composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP29248786A JPS63146038A (en) 1986-12-10 1986-12-10 Photosensitive composition

Publications (1)

Publication Number Publication Date
JPS63146038A true JPS63146038A (en) 1988-06-18

Family

ID=17782453

Family Applications (1)

Application Number Title Priority Date Filing Date
JP29248786A Pending JPS63146038A (en) 1986-12-10 1986-12-10 Photosensitive composition

Country Status (1)

Country Link
JP (1) JPS63146038A (en)

Cited By (126)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01202749A (en) * 1988-02-09 1989-08-15 Matsushita Electric Ind Co Ltd Photosensitive polymer and its production and pattern forming process
EP0410606A2 (en) 1989-07-12 1991-01-30 Fuji Photo Film Co., Ltd. Siloxane polymers and positive working light-sensitive compositions comprising the same
EP0747768A2 (en) 1995-06-05 1996-12-11 Fuji Photo Film Co., Ltd. Chemically amplified positive resist composition
EP1522891A1 (en) 2003-10-08 2005-04-13 Fuji Photo Film Co., Ltd. Positive resist composition and pattern forming method using the same
EP1628159A2 (en) 2004-08-18 2006-02-22 Fuji Photo Film Co., Ltd. Chemical amplification resist composition and pattern-forming method using the same
EP1635218A2 (en) 2004-09-14 2006-03-15 Fuji Photo Film Co., Ltd. Photosensitive composition, compound for use in the photosensitive composition, and pattern-forming method using the photosensitive composition
EP1637927A1 (en) 2004-09-02 2006-03-22 Fuji Photo Film Co., Ltd. Positive resist composition and pattern forming method using the same
EP1684116A2 (en) 2005-01-24 2006-07-26 Fuji Photo Film Co., Ltd. Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition
EP1684119A2 (en) 2005-01-24 2006-07-26 Fuji Photo Film Co., Ltd. Positive resist composition for immersion exposure and pattern-forming method using the same
EP1688791A2 (en) 2005-01-28 2006-08-09 Fuji Photo Film Co., Ltd. Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition
EP1693704A2 (en) 2005-02-02 2006-08-23 Fuji Photo Film Co., Ltd. Resist composition and pattern forming method using the same
EP1693705A2 (en) 2005-02-18 2006-08-23 Fuji Photo Film Co., Ltd. Resist composition, compound for use in the resist composition and pattern forming method using the resist composition
EP1698937A2 (en) 2005-03-04 2006-09-06 Fuji Photo Film Co., Ltd. Positive resist composition and pattern-forming method using the same
EP1700890A2 (en) 2005-03-08 2006-09-13 Fuji Photo Film Co., Ltd. Ink composition, inkjet recording method, printed material, method of producing planographic printing plate, and planographic printing plate
EP1703322A2 (en) 2005-03-17 2006-09-20 Fuji Photo Film Co., Ltd. Positive resist composition and pattern forming method using the resist composition
EP1720072A1 (en) 2005-05-01 2006-11-08 Rohm and Haas Electronic Materials, L.L.C. Compositons and processes for immersion lithography
EP1736824A2 (en) 2005-05-23 2006-12-27 Fuji Photo Film Co., Ltd. Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition
EP1755000A2 (en) 2005-08-16 2007-02-21 Fuji Photo Film Co., Ltd. Positive resist composition and a pattern forming method using the same
EP1757635A1 (en) 2005-08-23 2007-02-28 Fuji Photo Film Co., Ltd. Curable modified oxetane compound and ink composition comprising it
EP1762599A1 (en) 2005-09-07 2007-03-14 FUJIFILM Corporation Ink composition, inkjet recording method, printed material, process for producing lithographic plate, and lithographic printing plate
EP1764647A2 (en) 2005-08-19 2007-03-21 FUJIFILM Corporation Positive resist composition for immersion exposure and pattern-forming method using the same
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JP2008013745A (en) * 2006-06-09 2008-01-24 Canon Inc Photosensitive compound, photosensitive composition, method of forming resist pattern and method of processing substrates
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Cited By (137)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01202749A (en) * 1988-02-09 1989-08-15 Matsushita Electric Ind Co Ltd Photosensitive polymer and its production and pattern forming process
EP0410606A2 (en) 1989-07-12 1991-01-30 Fuji Photo Film Co., Ltd. Siloxane polymers and positive working light-sensitive compositions comprising the same
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