JPS63136316A - Magnetic recording body - Google Patents
Magnetic recording bodyInfo
- Publication number
- JPS63136316A JPS63136316A JP28179086A JP28179086A JPS63136316A JP S63136316 A JPS63136316 A JP S63136316A JP 28179086 A JP28179086 A JP 28179086A JP 28179086 A JP28179086 A JP 28179086A JP S63136316 A JPS63136316 A JP S63136316A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic recording
- carbon protective
- layers
- magnetic
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010410 layer Substances 0.000 claims abstract description 42
- 239000011241 protective layer Substances 0.000 claims abstract description 35
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 31
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 29
- 230000001050 lubricating effect Effects 0.000 claims abstract description 14
- 125000000524 functional group Chemical group 0.000 claims abstract description 13
- 239000000463 material Substances 0.000 claims description 15
- 239000010409 thin film Substances 0.000 claims description 14
- 239000000758 substrate Substances 0.000 claims 1
- 229910045601 alloy Inorganic materials 0.000 abstract description 13
- 239000000956 alloy Substances 0.000 abstract description 13
- 239000000314 lubricant Substances 0.000 abstract description 9
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 abstract description 6
- 229920000642 polymer Polymers 0.000 abstract description 6
- 239000000126 substance Substances 0.000 abstract description 6
- 125000005372 silanol group Chemical group 0.000 abstract description 4
- 230000003647 oxidation Effects 0.000 abstract description 3
- 238000007254 oxidation reaction Methods 0.000 abstract description 3
- 230000001590 oxidative effect Effects 0.000 abstract description 3
- 238000009832 plasma treatment Methods 0.000 abstract description 3
- 238000004381 surface treatment Methods 0.000 abstract description 2
- 229910007157 Si(OH)3 Inorganic materials 0.000 abstract 1
- -1 for example Chemical group 0.000 abstract 1
- 238000000034 method Methods 0.000 description 12
- 229910001004 magnetic alloy Inorganic materials 0.000 description 10
- 239000010408 film Substances 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 5
- 150000001875 compounds Chemical class 0.000 description 5
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 4
- 229910020630 Co Ni Inorganic materials 0.000 description 3
- 229910002440 Co–Ni Inorganic materials 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000005498 polishing Methods 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- PYJJCSYBSYXGQQ-UHFFFAOYSA-N trichloro(octadecyl)silane Chemical compound CCCCCCCCCCCCCCCCCC[Si](Cl)(Cl)Cl PYJJCSYBSYXGQQ-UHFFFAOYSA-N 0.000 description 3
- 206010016275 Fear Diseases 0.000 description 2
- 229910000861 Mg alloy Inorganic materials 0.000 description 2
- 229910000990 Ni alloy Inorganic materials 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 229920002545 silicone oil Polymers 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 1
- 229910018104 Ni-P Inorganic materials 0.000 description 1
- 229910018536 Ni—P Inorganic materials 0.000 description 1
- 229910008051 Si-OH Inorganic materials 0.000 description 1
- 229910006358 Si—OH Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 150000001721 carbon Chemical class 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000010687 lubricating oil Substances 0.000 description 1
- 238000005461 lubrication Methods 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 230000007257 malfunction Effects 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 102200033028 rs587777512 Human genes 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 230000002747 voluntary effect Effects 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は磁気記憶装置に用いられる磁気記録体に関する
。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a magnetic recording medium used in a magnetic storage device.
磁気記憶装置は、磁気記録体と記録再生磁気ヘッド（以
下ヘッドと呼ぶ）を主要構成部としている。その記録再
生方法は、操作開始前にはヘッドと磁気記録体面が接触
状態であるが、磁気記録体が所定の回転数で回転するこ
とにより、ヘッドと磁気記録体面の間に所定の空間を作
り、この状態で記録再生する方法が現在では主流となっ
ている（コンタクト・スタート・ストップ方式１．以下
Ｃ８Ｓ方式と称す）、この方法では、操作終了時に磁気
記録体の回転が止まる際には、ヘッドと磁気記録体は、
再び、接触状態になる。この方式では操作開始時、及び
、終了時にヘッドと磁気記録体面は接触摩擦状態となり
、この時のヘッドと磁気記録体面の摩擦力を低減させる
ために、磁気記録体の表面に保護層を形成させることが
一般的に行なわれている。保護層の役割は、ヘッドと磁
気記録体面の摩擦力を低減させるだけではなく、ヘッド
が磁気記録体面から浮上している際に、わずかなバラン
スの変化により、ヘッドが磁気記録体面に衝突した際に
も、磁性層に傷がつくのを保護する役目もある。さらに
、磁性層の材質によっては、空気中の湿度等による腐食
の心配があり、保護層はそれを防止する役割もある。A magnetic storage device has a magnetic recording body and a recording/reproducing magnetic head (hereinafter referred to as a head) as main components. In this recording/reproduction method, the head and the magnetic recording surface are in contact before the start of operation, but by rotating the magnetic recording material at a predetermined number of rotations, a predetermined space is created between the head and the magnetic recording surface. The method of recording and reproducing in this state is currently mainstream (contact start-stop method 1, hereinafter referred to as C8S method). In this method, when the rotation of the magnetic recording medium stops at the end of the operation, The head and magnetic recording medium are
They are in contact again. In this method, the head and the magnetic recording surface are in a frictional state at the start and end of the operation, and in order to reduce the frictional force between the head and the magnetic recording surface at this time, a protective layer is formed on the surface of the magnetic recording material. This is commonly done. The role of the protective layer is not only to reduce the frictional force between the head and the magnetic recording surface, but also to prevent the head from colliding with the magnetic recording surface due to slight changes in balance while the head is flying above the magnetic recording surface. It also serves to protect the magnetic layer from scratches. Furthermore, depending on the material of the magnetic layer, there is a risk of corrosion due to humidity in the air, and the protective layer also serves to prevent this.
磁気記録体にとって重要な構成部である保護層は、従来
から種々の材料が知られている０例えば、金属メッキ膜
（例えばＣｒ 、 Ｒｈ 、 Ｎ ｉ −Ｐ等）を保護
層として被覆する方法があるが、いずれも上記の接触摩
擦現象に対して有力な手段とはならない、より信頼性の
高い保護層として、５ｉｆｔ層と潤滑層を形成させる方
法や、カーボン膜を形成させる方法も試みられている（
ＮＩＫＫＥＩ ＮＥＷ ＭＡＴＥＲＩ−ＡＬＳ ＰＰ２
４−３３１９８５年１２月号）、このうちカーボン保護
層は、他の保護層に比べて優れた特性を示すが、耐摺動
性の面では不十分で長時間にわたるヘッドとの接触摩擦
によって徐々にけずられてカーボン粉が析出してしまう
。The protective layer, which is an important component of a magnetic recording medium, can be made of various materials. However, none of these methods are effective against the above-mentioned contact friction phenomenon.As more reliable protective layers, methods of forming a 5ift layer and a lubricating layer, and methods of forming a carbon film have also been attempted. There is (
NIKKEI NEW MATERI-ALS PP2
4-33, December 1985 issue), the carbon protective layer exhibits superior properties compared to other protective layers, but it is insufficient in terms of sliding resistance and gradually deteriorates due to long-term contact friction with the head. carbon powder will precipitate.
このように、磁気記録体の保護層としては種々の材料が
知られているが、常に、高信頼度化が望まれている。As described above, various materials are known as protective layers for magnetic recording bodies, but higher reliability is always desired.
上記従来技術はヘッドと磁気記録体面の接触摩擦現象に
対して、磁気記録体を保護するための信頼性、とりわけ
耐摺動潤滑性が不十分である。The above-mentioned conventional technology is insufficient in reliability for protecting the magnetic recording medium against the contact friction phenomenon between the head and the surface of the magnetic recording medium, particularly in the sliding lubrication resistance.
本発明の目的は、接触摩擦現象に対してより高信頼度の
磁気記録体を提供することにある。An object of the present invention is to provide a magnetic recording medium with higher reliability against contact friction phenomena.
上記目的は、磁気記録体を構成するカーボン保護層を表
面処理して官能基を形成し、この官能基に対して潤滑性
をもつ高分子化合物を化学修飾することにより達成され
る。The above object is achieved by surface-treating the carbon protective layer constituting the magnetic recording medium to form a functional group, and chemically modifying the functional group with a polymer compound having lubricating properties.
磁気記録体を構成するカーボン保護層は、酸化性プラズ
マ処理、あるいは、化学的酸化処理によって表面に一〇
Ｈ基あるいは一〇〇〇Ｈ基を形成しうる。このカーボン
保護層表面に形成した官能基と化学的に反応しつる官能
基（例えばシラノール基、 Ｓ ｉ （ＯＨ）ｇ）を末
端にもつ高分子潤滑剤を化学修飾させることにより、カ
ーボン保護層上に強固な潤滑層を形成することができる
。The carbon protective layer constituting the magnetic recording medium can have 10H groups or 1000H groups formed on its surface by oxidizing plasma treatment or chemical oxidation treatment. By chemically modifying a polymer lubricant that has a functional group (for example, a silanol group, Si (OH) g) at its end that chemically reacts with the functional group formed on the surface of the carbon protective layer, can form a strong lubricating layer.
以下１本発明の詳細な説明する。 Hereinafter, one aspect of the present invention will be explained in detail.
図は本発明の磁気記録体の一実施例を示す断面図である
０本発明の磁気記録体は、合金円盤１とその上に被覆さ
れた非磁性合金Ｍ２と、この非磁性合金層２の研摩面上
に被覆された磁性薄膜Ｍ３と、この磁性薄膜層３上に被
覆されたカーボン保護層４と、このカーボン保護層４上
に化学修飾された潤滑層５から構成される。The figure is a sectional view showing an embodiment of the magnetic recording body of the present invention. The magnetic recording body of the present invention includes an alloy disk 1, a non-magnetic alloy M2 coated thereon, and a non-magnetic alloy layer 2. It consists of a magnetic thin film M3 coated on the polishing surface, a carbon protective layer 4 coated on the magnetic thin film layer 3, and a lubricating layer 5 chemically modified on the carbon protective layer 4.
合金円盤１の材料は１通常、ＡＱ−Ｍ、合金が用いられ
、十分水さなうねりを持った面に仕上げられていなけれ
ばならない、この合金円盤１の上には機械的表面精度と
、ヘッドとの接触時に変形損傷を生じない強度をもつ非
磁性合金層２が形成される。この非磁性合金層２には、
磁性薄膜層３の材料がＣｏ−Ｎｉ系の場合、メッキ法に
よりＮ１−Ｐ膜が形成されることが多い、磁性薄膜層３
がγ−Ｆｅａｒｓの場合には、この磁性層の形成時に３
００℃前後の熱処理を要するため、Ｎ１−Ｐ膜では耐熱
性が不十分であり、アルマイト層、あるいは、耐熱性に
優れた他の材料が用いられる。The material of the alloy disk 1 is usually AQ-M alloy, and it must be finished with a surface with sufficient smooth undulations. A non-magnetic alloy layer 2 is formed which has a strength that does not cause deformation damage when in contact with the magnetic material. This non-magnetic alloy layer 2 has
When the material of the magnetic thin film layer 3 is Co-Ni, an N1-P film is often formed by plating.
is γ-Fears, when forming this magnetic layer, 3
Since heat treatment at around 00° C. is required, the N1-P film has insufficient heat resistance, and an alumite layer or other material with excellent heat resistance is used.
非磁性合金層２は機械的研摩により表面粗さ０．０４μ
ｍ以下に鏡面仕上げされたあと、磁性薄膜層３が形成さ
れる。この磁性薄膜層３には、スパッタ法によるＣ ｏ
−Ｎ ｉ膜やγ−Ｆｅａｒｓ膜。Non-magnetic alloy layer 2 has a surface roughness of 0.04μ by mechanical polishing.
After mirror finishing to a thickness of m or less, a magnetic thin film layer 3 is formed. This magnetic thin film layer 3 is coated with Co by sputtering.
-Ni film or γ-Fears film.
あるいは、メッキ法によるＧｏ−Ｎｉ−Ｐ膜などが用い
られる。Alternatively, a Go-Ni-P film or the like formed by plating may be used.
磁性薄膜層３は、そのままでは耐食性およびヘッドとの
接触摩擦に対する耐久性が十分でないため、磁性薄膜層
３上にカーボン保護層４が形成される。このカーボン保
護層４は、潤滑性をもっているが、長時間にわたるヘッ
ドとの接触摩擦によって徐々にけずられてカーボン粉が
析出する。ここで析出するカーボン粉は磁気記録体面上
に付着してヘッドの走行を妨げるのみでなく、記録再生
を誤動作させる原因となる。そこで、カーボン保護層４
の表面の潤滑性を高めるために、潤滑層Ｓが形成される
。この潤滑Ｍ５は、ヘッドとの摩擦係数が十分水さいこ
とが必要で、また、ヘッドとの接触により簡単に損耗し
ないように、単に保護層に物理的に結合しているだけで
は不十分で、保護層と化学的に結合していることが重要
である。Since the magnetic thin film layer 3 does not have sufficient corrosion resistance and durability against contact friction with the head as it is, a carbon protective layer 4 is formed on the magnetic thin film layer 3. Although this carbon protective layer 4 has lubricating properties, it is gradually scratched due to contact friction with the head over a long period of time, and carbon powder is deposited. The carbon powder deposited here not only adheres to the surface of the magnetic recording medium and obstructs the running of the head, but also causes malfunctions in recording and reproduction. Therefore, carbon protective layer 4
A lubricating layer S is formed to increase the lubricity of the surface. This lubricant M5 needs to have a sufficiently low coefficient of friction with the head, and it is not enough that it is simply physically bonded to the protective layer so that it does not wear out easily due to contact with the head. It is important that it is chemically bonded to the protective layer.
カーボン保護層４の表面には、そのままでは潤滑剤と化
学的に結合しつる官能基は存在しない。On the surface of the carbon protective layer 4, there is no functional group that can chemically bond to the lubricant as it is.
しかし、カーボン保護層４を表面処理（例えば、酸化的
プラズマ処理や化学的酸化処理）するごとにより、表面
に水酸基（−ＯＨ基）やカルボキシル基（−ＣＯＯＨ）
を容易に形成することができる。これに着目することに
より、これと反応しうる官能基をもつ潤滑性高分子化合
物を化学的にカーボン保護層４上に結合させることがで
きる。ここで用いることができる潤滑性高分子化合物は
配向したシリコーンオイル、ふっ素泊、および、フロロ
シリコーンなどのオイル類のオクタデシルトリクロロシ
ラン、ヘキサメチルジシラザンなどのシラン、または、
シラザン類など、カーボン保護層４の表面に存在する水
酸基やカルボキシル基と化学的な結合を形成しうる。そ
の他、カーボン保護［４の表面の水酸基やカルボキシル
基と化学的な結合を形成しつる官能基をもち、潤滑性を
もつものであればどのようなものでもよい。However, each time the carbon protective layer 4 is subjected to surface treatment (for example, oxidative plasma treatment or chemical oxidation treatment), hydroxyl groups (-OH groups) and carboxyl groups (-COOH groups) are formed on the surface.
can be easily formed. By paying attention to this, it is possible to chemically bond a lubricating polymer compound having a functional group capable of reacting with the carbon protective layer 4. Lubricating polymer compounds that can be used here include oriented silicone oils, fluorinated silicone oils, and oils such as fluorosilicone, silanes such as octadecyltrichlorosilane and hexamethyldisilazane, or
Chemical bonds can be formed with hydroxyl groups and carboxyl groups present on the surface of the carbon protective layer 4, such as silazane compounds. In addition, any material may be used as long as it has a functional group that forms a chemical bond with the hydroxyl group or carboxyl group on the surface of the carbon protection [4] and has lubricating properties.
例えば、Ｒ５１Ｃ！δ（Ｒは直鎖炭化水素）の構造を持
つものは、水によって加水分解されて反応性に富むシラ
ノール基（Ｓｉ−ＯＨ）を含む化合物となる。このシラ
ノール基を含む部分は、カーボン保護層４表面に存在す
る水酸基やカルボキル基と脱水縮合反応を起こし、強固
に化学結合する。For example, R51C! Those having a structure of δ (R is a linear hydrocarbon) are hydrolyzed by water to become a compound containing a highly reactive silanol group (Si-OH). This portion containing a silanol group causes a dehydration condensation reaction with the hydroxyl group or carboxyl group present on the surface of the carbon protective layer 4 to form a strong chemical bond.
次に、本発明を実施例によりさらに詳細に説明する。Next, the present invention will be explained in more detail with reference to Examples.
〈実施例 １〉
磁気記録体の合金円盤１の材料としてＡｌ２−Ｍｇ合金
を用い、加工によって十分小さなうねり（真直度１４μ
ｍ以下）をもった面に仕上げられた上に非磁性合金層２
として無電解メッキによりＮ１−Ｐ層を３０μｍ形成さ
せこのＮ１−Ｐ層を、機械的研摩により、表面粗さとし
てＲｍａｘｏ、０４μｍ以下、厚さ２０μｍまで鏡面研
摩仕上げした。<Example 1> An Al2-Mg alloy is used as the material for the alloy disk 1 of the magnetic recording medium, and a sufficiently small waviness (straightness of 14μ) is created by processing.
m or less) and a non-magnetic alloy layer 2 on top of the finished surface with a
An N1-P layer of 30 μm was formed by electroless plating, and this N1-P layer was mirror polished to a surface roughness of Rmaxo of 04 μm or less and a thickness of 20 μm by mechanical polishing.
この面上に磁性薄膜層３としてスパッタ法により、Ｇ
ｏ −Ｎ ｉ合金磁性層を厚さ５００人形成した。A magnetic thin film layer 3 is formed on this surface by sputtering.
An o-Ni alloy magnetic layer was formed to a thickness of 500 mm.
この面上にスパッタ法によりカーボン保護膜４を厚さ３
００人に形成させた。このようにして得られたディスク
状円盤を、酸素と水蒸気を雰囲気ガスとした高周波プラ
ズマ中で二分間処理した後、この面上にオクタデシルト
リクロロシランの０．１ ｗｔ％ｎ−ブタノール溶液
をスピンコード法により塗布し、全体を２００℃で二時
間焼成して潤滑層５を形成し、磁気記録体を作製した・
〈実施例 ２〉
実施例１と同様に１合金円盤１の材料として。A carbon protective film 4 is formed on this surface by sputtering to a thickness of 3
00 people formed it. The disc-shaped disc thus obtained was treated for two minutes in a high-frequency plasma with oxygen and water vapor as the atmosphere gas, and then a 0.1 wt% n-butanol solution of octadecyltrichlorosilane was applied to the surface using a spin code. The lubricating layer 5 was formed by coating the entire body at 200° C. for two hours to produce a magnetic recording body.
<Example 2> Same as Example 1, as a material for 1 alloy disk 1.
ＡＱ−Ｍｇ合金を用い、非磁性合金属２としてＮ１−Ｐ
層を形成した後、磁性薄膜層３としてＧｏ−Ｎｉ合金層
を厚さ５００人で形成し、この面上にカーボン保護層４
を厚さ３００人に形成させた。このようにして得られた
ディスク状円盤を、過酸化水素１０％溶液で４０℃、二
時間処理した後、この面上にオクタデシルトリクロロシ
ランの０．１ ｗｔ％ｎ−ブタノール溶液をスピンコ
ード法により塗布し、全体を２００℃で二時間焼成して
潤滑Ｍ５を形成し、磁気記録体を作製した。Using AQ-Mg alloy, N1-P as non-magnetic alloy metal 2
After forming the layer, a Go-Ni alloy layer with a thickness of 500 mm is formed as the magnetic thin film layer 3, and a carbon protective layer 4 is formed on this surface.
was formed to a thickness of 300 people. The disc-shaped disc thus obtained was treated with a 10% hydrogen peroxide solution at 40°C for two hours, and then a 0.1 wt% n-butanol solution of octadecyltrichlorosilane was applied on this surface using a spin code method. The coating was applied, and the whole was baked at 200° C. for two hours to form a lubricant M5, thereby producing a magnetic recording body.
く比較例 １〉
実施例１と同様に、合金円盤１の材料としてＡＱ−Ｍｇ
合金を用い、非磁性合金属２としてＮ１−Ｐ層を形成し
、磁性薄膜層３としてＣｏ−Ｎｉ合金を厚さ５００人で
形成した後、この面上にカーボン保護層４を厚さ３００
人に形成し、潤滑層５として弗素系の潤滑油を塗布して
磁気記録体を作製した。Comparative Example 1> As in Example 1, AQ-Mg was used as the material for the alloy disk 1.
After forming an N1-P layer as the non-magnetic alloy metal 2 and forming a Co-Ni alloy as the magnetic thin film layer 3 with a thickness of 500 mm, a carbon protective layer 4 is formed on this surface with a thickness of 300 mm.
A magnetic recording body was prepared by forming a magnetic recording medium on a human body and applying a fluorine-based lubricating oil as a lubricating layer 5.
〈比較例 ２〉
実施例１と同様に、合金円盤１の材料としてＡΩ−Ｍｇ
合金を用い、非磁性合金属２としてＮ１−Ｐ層を形成し
、磁性薄膜層３としてＣｏ−Ｎｉ合金を厚さ５００人に
形成した後、この面上にカーボン保護層４を厚さ３００
人に形成して磁気記録体を作製した。<Comparative Example 2> As in Example 1, AΩ-Mg was used as the material for the alloy disk 1.
After forming an N1-P layer as the non-magnetic alloy metal 2 and forming a Co-Ni alloy to a thickness of 500 mm as the magnetic thin film layer 3, a carbon protective layer 4 is formed on this surface to a thickness of 300 mm.
A magnetic recording medium was created by forming it on a person.
実施例１，２および比較例１，２に示した磁気記録体と
、Ｍｎ−Ｚｎフェライトヘッドを用いてヘッド浮上量０
．２μｍでＣ８Ｓ方式による記録再生試験を実施した。Using the magnetic recording bodies shown in Examples 1 and 2 and Comparative Examples 1 and 2 and the Mn-Zn ferrite head, the head flying height was 0.
．． A recording/reproducing test was conducted using the C8S method at 2 μm.
比較例２の場合には、三万回の繰返し後に、目視観察で
きるきずが発生した。In the case of Comparative Example 2, visually observable flaws occurred after 30,000 repetitions.
比較例１の場合には、四方口の繰返し後に目視観察でき
るきすが発生し、また、ヘッドと磁気記録体が密着して
始動時にヘッドが浮上しにくいという欠点があった。こ
れに対し、実施例１，２の場合には、ヘッドと磁気記録
体の密着は見られず、五万回の繰返し後にもきすは皆無
であった。In the case of Comparative Example 1, visually observable scratches were generated after repeating the four-way opening, and the head and the magnetic recording body were in close contact with each other, making it difficult for the head to fly during startup. On the other hand, in the case of Examples 1 and 2, no close contact between the head and the magnetic recording body was observed, and no scratches were observed even after 50,000 repetitions.
潤滑剤をカーボン保護層表面に化学結合させて潤滑層を
形成したため、磁気記録体の潤滑性が向上し、また、潤
滑剤を単に塗布した場合に比べて、ヘッドとの接触で潤
滑剤が機械的にこすりとられることが少なくなった。こ
れにより、より高信頼性の磁気記録体を提供することが
できる。Because the lubricant is chemically bonded to the surface of the carbon protective layer to form a lubricant layer, the lubricity of the magnetic recording medium is improved, and compared to the case where the lubricant is simply applied, the lubricant is absorbed into the machine by contact with the head. It is less likely that the target will be rubbed off. This makes it possible to provide a more reliable magnetic recording medium.
本発明によれば、潤滑層の耐久性を増し、磁気記録体が
摩耗により損傷するのを防ぐことができる。According to the present invention, the durability of the lubricating layer can be increased and damage to the magnetic recording body due to wear can be prevented.
図は本発明の磁気記録体の一実施例を示す断面図である
。
１・・・合金円盤、２・・・非磁性合金層、３・・・磁
性薄膜ハ・・奮・倹円盤
２・・・非虞・服な全１
３・・・鷹・庄簿靜１
年・・・カー■ζン硝４ｔ４
５・・、シ剣ｌ
手続補正帯（自発）
昭和 年 月 日The figure is a sectional view showing an embodiment of the magnetic recording body of the present invention. 1...Alloy disk, 2...Non-magnetic alloy layer, 3...Magnetic thin film, hard disk, 2...non-property, all 1 3...taka, shouboku 1 Year... Car ■ζn 4t4 5..., Shiken l Procedure correction band (voluntary) Showa Year Month Day
Claims (1)
性薄膜上にカーボン保護層が被覆された磁気記録体にお
いて、 前記カーボン保護層を表面処理することにより表面に官
能基を形成し、前記官能基を介して潤滑層が前記カーボ
ン保護層の上に化学修飾されていることを特徴とする磁
気記録体。[Claims] 1. In a magnetic recording body in which a magnetic thin film is coated on a non-magnetic disk-shaped substrate, and a carbon protective layer is coated on the magnetic thin film, the carbon protective layer is surface-treated. 1. A magnetic recording material, wherein a functional group is formed, and a lubricating layer is chemically modified on the carbon protective layer via the functional group.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61281790A JPH07105034B2 (en) | 1986-11-28 | 1986-11-28 | Magnetic recording body |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61281790A JPH07105034B2 (en) | 1986-11-28 | 1986-11-28 | Magnetic recording body |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63136316A true JPS63136316A (en) | 1988-06-08 |
| JPH07105034B2 JPH07105034B2 (en) | 1995-11-13 |
Family
ID=17644011
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61281790A Expired - Lifetime JPH07105034B2 (en) | 1986-11-28 | 1986-11-28 | Magnetic recording body |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH07105034B2 (en) |
Cited By (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0287322A (en) * | 1988-09-22 | 1990-03-28 | Nippon Sheet Glass Co Ltd | Magnetic recording medium |
| JPH02154321A (en) * | 1988-07-11 | 1990-06-13 | Hitachi Ltd | Magnetic disk and its production and storage device made by using the same |
| US6040052A (en) * | 1997-04-11 | 2000-03-21 | Tdk Corporation | Magnetic recording medium |
| WO2000048749A1 (en) * | 1999-02-18 | 2000-08-24 | Battelle Memorial Institute | Method for adhering laminate structures |
| US6207239B1 (en) | 1998-12-16 | 2001-03-27 | Battelle Memorial Institute | Plasma enhanced chemical deposition of conjugated polymer |
| US6207238B1 (en) | 1998-12-16 | 2001-03-27 | Battelle Memorial Institute | Plasma enhanced chemical deposition for high and/or low index of refraction polymers |
| US6217947B1 (en) | 1998-12-16 | 2001-04-17 | Battelle Memorial Institute | Plasma enhanced polymer deposition onto fixtures |
| US6224948B1 (en) | 1997-09-29 | 2001-05-01 | Battelle Memorial Institute | Plasma enhanced chemical deposition with low vapor pressure compounds |
| US6228436B1 (en) | 1998-12-16 | 2001-05-08 | Battelle Memorial Institute | Method of making light emitting polymer composite material |
| US6228434B1 (en) | 1998-12-16 | 2001-05-08 | Battelle Memorial Institute | Method of making a conformal coating of a microtextured surface |
| US6268695B1 (en) | 1998-12-16 | 2001-07-31 | Battelle Memorial Institute | Environmental barrier material for organic light emitting device and method of making |
| US6274204B1 (en) | 1998-12-16 | 2001-08-14 | Battelle Memorial Institute | Method of making non-linear optical polymer |
| US6358570B1 (en) | 1999-03-31 | 2002-03-19 | Battelle Memorial Institute | Vacuum deposition and curing of oligomers and resins |
| US6413645B1 (en) | 2000-04-20 | 2002-07-02 | Battelle Memorial Institute | Ultrabarrier substrates |
| US6492026B1 (en) | 2000-04-20 | 2002-12-10 | Battelle Memorial Institute | Smoothing and barrier layers on high Tg substrates |
| US6506461B2 (en) | 1999-03-31 | 2003-01-14 | Battelle Memorial Institute | Methods for making polyurethanes as thin films |
| US6548912B1 (en) | 1999-10-25 | 2003-04-15 | Battelle Memorial Institute | Semicoductor passivation using barrier coatings |
| US6570325B2 (en) | 1998-12-16 | 2003-05-27 | Battelle Memorial Institute | Environmental barrier material for organic light emitting device and method of making |
| US6573652B1 (en) | 1999-10-25 | 2003-06-03 | Battelle Memorial Institute | Encapsulated display devices |
| US6623861B2 (en) | 2001-04-16 | 2003-09-23 | Battelle Memorial Institute | Multilayer plastic substrates |
| US9822454B2 (en) | 2006-12-28 | 2017-11-21 | 3M Innovative Properties Company | Nucleation layer for thin film metal layer formation |
| US9839940B2 (en) | 2002-04-15 | 2017-12-12 | Samsung Display Co., Ltd. | Apparatus for depositing a multilayer coating on discrete sheets |
| US10950821B2 (en) | 2007-01-26 | 2021-03-16 | Samsung Display Co., Ltd. | Method of encapsulating an environmentally sensitive device |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62146430A (en) * | 1985-12-21 | 1987-06-30 | Tdk Corp | Magnetic recording medium |
-
1986
- 1986-11-28 JP JP61281790A patent/JPH07105034B2/en not_active Expired - Lifetime
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62146430A (en) * | 1985-12-21 | 1987-06-30 | Tdk Corp | Magnetic recording medium |
Cited By (34)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02154321A (en) * | 1988-07-11 | 1990-06-13 | Hitachi Ltd | Magnetic disk and its production and storage device made by using the same |
| JPH0287322A (en) * | 1988-09-22 | 1990-03-28 | Nippon Sheet Glass Co Ltd | Magnetic recording medium |
| US6040052A (en) * | 1997-04-11 | 2000-03-21 | Tdk Corporation | Magnetic recording medium |
| US6224948B1 (en) | 1997-09-29 | 2001-05-01 | Battelle Memorial Institute | Plasma enhanced chemical deposition with low vapor pressure compounds |
| US6656537B2 (en) | 1997-09-29 | 2003-12-02 | Battelle Memorial Institute | Plasma enhanced chemical deposition with low vapor pressure compounds |
| US6627267B2 (en) | 1997-09-29 | 2003-09-30 | Battelle Memorial Institute | Plasma enhanced chemical deposition with low vapor pressure compounds |
| US6497598B2 (en) | 1998-12-16 | 2002-12-24 | Battelle Memorial Institute | Environmental barrier material for organic light emitting device and method of making |
| US6207239B1 (en) | 1998-12-16 | 2001-03-27 | Battelle Memorial Institute | Plasma enhanced chemical deposition of conjugated polymer |
| US6228436B1 (en) | 1998-12-16 | 2001-05-08 | Battelle Memorial Institute | Method of making light emitting polymer composite material |
| US6228434B1 (en) | 1998-12-16 | 2001-05-08 | Battelle Memorial Institute | Method of making a conformal coating of a microtextured surface |
| US6268695B1 (en) | 1998-12-16 | 2001-07-31 | Battelle Memorial Institute | Environmental barrier material for organic light emitting device and method of making |
| US6274204B1 (en) | 1998-12-16 | 2001-08-14 | Battelle Memorial Institute | Method of making non-linear optical polymer |
| US6909230B2 (en) | 1998-12-16 | 2005-06-21 | Battelle Memorial Institute | Method of making molecularly doped composite polymer material |
| US6858259B2 (en) | 1998-12-16 | 2005-02-22 | Battelle Memorial Institute | Plasma enhanced chemical deposition for high and/or low index of refraction polymers |
| US6217947B1 (en) | 1998-12-16 | 2001-04-17 | Battelle Memorial Institute | Plasma enhanced polymer deposition onto fixtures |
| US6497924B2 (en) | 1998-12-16 | 2002-12-24 | Battelle Memorial Institute | Method of making non-linear optical polymer |
| US6207238B1 (en) | 1998-12-16 | 2001-03-27 | Battelle Memorial Institute | Plasma enhanced chemical deposition for high and/or low index of refraction polymers |
| US6613395B2 (en) | 1998-12-16 | 2003-09-02 | Battelle Memorial Institute | Method of making molecularly doped composite polymer material |
| US6509065B2 (en) | 1998-12-16 | 2003-01-21 | Battelle Memorial Institute | Plasma enhanced chemical deposition of conjugated polymer |
| US6522067B1 (en) | 1998-12-16 | 2003-02-18 | Battelle Memorial Institute | Environmental barrier material for organic light emitting device and method of making |
| US6570325B2 (en) | 1998-12-16 | 2003-05-27 | Battelle Memorial Institute | Environmental barrier material for organic light emitting device and method of making |
| WO2000048749A1 (en) * | 1999-02-18 | 2000-08-24 | Battelle Memorial Institute | Method for adhering laminate structures |
| US6358570B1 (en) | 1999-03-31 | 2002-03-19 | Battelle Memorial Institute | Vacuum deposition and curing of oligomers and resins |
| US6506461B2 (en) | 1999-03-31 | 2003-01-14 | Battelle Memorial Institute | Methods for making polyurethanes as thin films |
| US6573652B1 (en) | 1999-10-25 | 2003-06-03 | Battelle Memorial Institute | Encapsulated display devices |
| USRE40531E1 (en) * | 1999-10-25 | 2008-10-07 | Battelle Memorial Institute | Ultrabarrier substrates |
| US6923702B2 (en) | 1999-10-25 | 2005-08-02 | Battelle Memorial Institute | Method of making encapsulated display devices |
| US6548912B1 (en) | 1999-10-25 | 2003-04-15 | Battelle Memorial Institute | Semicoductor passivation using barrier coatings |
| US6413645B1 (en) | 2000-04-20 | 2002-07-02 | Battelle Memorial Institute | Ultrabarrier substrates |
| US6492026B1 (en) | 2000-04-20 | 2002-12-10 | Battelle Memorial Institute | Smoothing and barrier layers on high Tg substrates |
| US6623861B2 (en) | 2001-04-16 | 2003-09-23 | Battelle Memorial Institute | Multilayer plastic substrates |
| US9839940B2 (en) | 2002-04-15 | 2017-12-12 | Samsung Display Co., Ltd. | Apparatus for depositing a multilayer coating on discrete sheets |
| US9822454B2 (en) | 2006-12-28 | 2017-11-21 | 3M Innovative Properties Company | Nucleation layer for thin film metal layer formation |
| US10950821B2 (en) | 2007-01-26 | 2021-03-16 | Samsung Display Co., Ltd. | Method of encapsulating an environmentally sensitive device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH07105034B2 (en) | 1995-11-13 |
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