JPS6295526A - 感光性樹脂組成物およびそれを用いたパタ−ンの作製法 - Google Patents

感光性樹脂組成物およびそれを用いたパタ−ンの作製法

Info

Publication number
JPS6295526A
JPS6295526A JP23712785A JP23712785A JPS6295526A JP S6295526 A JPS6295526 A JP S6295526A JP 23712785 A JP23712785 A JP 23712785A JP 23712785 A JP23712785 A JP 23712785A JP S6295526 A JPS6295526 A JP S6295526A
Authority
JP
Japan
Prior art keywords
polymer
photosensitive resin
copolymer
tables
hydrogen atom
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP23712785A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0584894B2 (enrdf_load_stackoverflow
Inventor
Yoshihiro Kawatsuki
喜弘 川月
Masao Uetsuki
植月　正雄
Shigeru Sasaki
繁 佐々木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kuraray Co Ltd
Original Assignee
Kuraray Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kuraray Co Ltd filed Critical Kuraray Co Ltd
Priority to JP23712785A priority Critical patent/JPS6295526A/ja
Publication of JPS6295526A publication Critical patent/JPS6295526A/ja
Publication of JPH0584894B2 publication Critical patent/JPH0584894B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Optical Integrated Circuits (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP23712785A 1985-10-22 1985-10-22 感光性樹脂組成物およびそれを用いたパタ−ンの作製法 Granted JPS6295526A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23712785A JPS6295526A (ja) 1985-10-22 1985-10-22 感光性樹脂組成物およびそれを用いたパタ−ンの作製法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23712785A JPS6295526A (ja) 1985-10-22 1985-10-22 感光性樹脂組成物およびそれを用いたパタ−ンの作製法

Publications (2)

Publication Number Publication Date
JPS6295526A true JPS6295526A (ja) 1987-05-02
JPH0584894B2 JPH0584894B2 (enrdf_load_stackoverflow) 1993-12-03

Family

ID=17010807

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23712785A Granted JPS6295526A (ja) 1985-10-22 1985-10-22 感光性樹脂組成物およびそれを用いたパタ−ンの作製法

Country Status (1)

Country Link
JP (1) JPS6295526A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS649447A (en) * 1987-06-30 1989-01-12 Kuraray Co Pattern forming process
JPS649448A (en) * 1987-06-30 1989-01-12 Kuraray Co Pattern forming process
JPH0284651A (ja) * 1988-09-21 1990-03-26 Fuji Photo Film Co Ltd 感光性組成物

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60166946A (ja) * 1983-10-14 1985-08-30 Kyowa Gas Chem Ind Co Ltd 感光性樹脂組成物およびそれを用いる屈折率差を有するパタ−ンの作成方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60166946A (ja) * 1983-10-14 1985-08-30 Kyowa Gas Chem Ind Co Ltd 感光性樹脂組成物およびそれを用いる屈折率差を有するパタ−ンの作成方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS649447A (en) * 1987-06-30 1989-01-12 Kuraray Co Pattern forming process
JPS649448A (en) * 1987-06-30 1989-01-12 Kuraray Co Pattern forming process
JPH0284651A (ja) * 1988-09-21 1990-03-26 Fuji Photo Film Co Ltd 感光性組成物

Also Published As

Publication number Publication date
JPH0584894B2 (enrdf_load_stackoverflow) 1993-12-03

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term