JPS6276622A - Method and device for reduced projection-type alignment - Google Patents

Method and device for reduced projection-type alignment

Info

Publication number
JPS6276622A
JPS6276622A JP60215002A JP21500285A JPS6276622A JP S6276622 A JPS6276622 A JP S6276622A JP 60215002 A JP60215002 A JP 60215002A JP 21500285 A JP21500285 A JP 21500285A JP S6276622 A JPS6276622 A JP S6276622A
Authority
JP
Japan
Prior art keywords
alignment
alignment pattern
error
illumination light
detected
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60215002A
Other languages
Japanese (ja)
Other versions
JPH0467772B2 (en
Inventor
Toshihiko Nakada
Yoshisada Oshida
Masataka Shiba
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP60215002A priority Critical patent/JPH0467772B2/ja
Publication of JPS6276622A publication Critical patent/JPS6276622A/en
Publication of JPH0467772B2 publication Critical patent/JPH0467772B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Abstract

PURPOSE: To remove the decrease in alignment accuracy due to the resist coat ing irregularity by a method wherein the position of an alignment pattern is detected with the single color illumination light with the same wavelength as the wavelength of white illumination light and alignment illumination light, and the difference in the both position detecting signals is obtained so as to compensate the amount of the alignment.
CONSTITUTION: An alignment pattern detection error between the white and single color is detected on a few chips on a wafer with a subpattern detection system. Then, a vertual origin (xs, ys) where the error is minimum is obtained on the basis of the error data. An alignment pattern detection error ex* (x. y) ey* (x, y) is analogized on an arbitrary position, that is to say, on all the chip, and the data is stored in a memory. The center position xa of the wafer alignment pattern, ideally, under the white illumination light with higher accuracy by using the amount of the detected error ex* (x, y) that has been obtained and stored and providing compensation to it. An amount of the alignment is obtained from the center position xa of the compensated wafer alignment pattern and the center position xr of the reticle alignment pattern so as to move the stage in the direction of x a few.
COPYRIGHT: (C)1987,JPO&Japio
JP60215002A 1985-09-30 1985-09-30 Expired - Lifetime JPH0467772B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60215002A JPH0467772B2 (en) 1985-09-30 1985-09-30

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60215002A JPH0467772B2 (en) 1985-09-30 1985-09-30

Publications (2)

Publication Number Publication Date
JPS6276622A true JPS6276622A (en) 1987-04-08
JPH0467772B2 JPH0467772B2 (en) 1992-10-29

Family

ID=16665076

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60215002A Expired - Lifetime JPH0467772B2 (en) 1985-09-30 1985-09-30

Country Status (1)

Country Link
JP (1) JPH0467772B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02170515A (en) * 1988-12-23 1990-07-02 Canon Inc Exposure system
WO2005083756A1 (en) * 2004-03-01 2005-09-09 Nikon Corporation Pre-measurement processing method, exposure system and substrate processing equipment
US7728953B2 (en) 2004-03-01 2010-06-01 Nikon Corporation Exposure method, exposure system, and substrate processing apparatus

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02170515A (en) * 1988-12-23 1990-07-02 Canon Inc Exposure system
WO2005083756A1 (en) * 2004-03-01 2005-09-09 Nikon Corporation Pre-measurement processing method, exposure system and substrate processing equipment
JPWO2005083756A1 (en) * 2004-03-01 2007-11-29 株式会社ニコン Pre-measurement processing method, exposure system, and substrate processing apparatus
US7728953B2 (en) 2004-03-01 2010-06-01 Nikon Corporation Exposure method, exposure system, and substrate processing apparatus
JP4760705B2 (en) * 2004-03-01 2011-08-31 株式会社ニコン Pre-measurement processing method, exposure system, and substrate processing apparatus
TWI395075B (en) * 2004-03-01 2013-05-01 尼康股份有限公司 Prior measurement processing method, exposure system and substrate processing device

Also Published As

Publication number Publication date
JPH0467772B2 (en) 1992-10-29

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term