JPS6252844B2 - - Google Patents

Info

Publication number
JPS6252844B2
JPS6252844B2 JP19820883A JP19820883A JPS6252844B2 JP S6252844 B2 JPS6252844 B2 JP S6252844B2 JP 19820883 A JP19820883 A JP 19820883A JP 19820883 A JP19820883 A JP 19820883A JP S6252844 B2 JPS6252844 B2 JP S6252844B2
Authority
JP
Japan
Prior art keywords
film
diagram
component
mounting
wiring diagram
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP19820883A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60104948A (ja
Inventor
Sumio Fukawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP58198208A priority Critical patent/JPS60104948A/ja
Publication of JPS60104948A publication Critical patent/JPS60104948A/ja
Publication of JPS6252844B2 publication Critical patent/JPS6252844B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/90—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof prepared by montage processes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP58198208A 1983-10-25 1983-10-25 実装布線図の作成方法 Granted JPS60104948A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58198208A JPS60104948A (ja) 1983-10-25 1983-10-25 実装布線図の作成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58198208A JPS60104948A (ja) 1983-10-25 1983-10-25 実装布線図の作成方法

Publications (2)

Publication Number Publication Date
JPS60104948A JPS60104948A (ja) 1985-06-10
JPS6252844B2 true JPS6252844B2 (cs) 1987-11-07

Family

ID=16387277

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58198208A Granted JPS60104948A (ja) 1983-10-25 1983-10-25 実装布線図の作成方法

Country Status (1)

Country Link
JP (1) JPS60104948A (cs)

Also Published As

Publication number Publication date
JPS60104948A (ja) 1985-06-10

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