JPS6239064A - 半導体装置の製造方法 - Google Patents
半導体装置の製造方法Info
- Publication number
- JPS6239064A JPS6239064A JP60179732A JP17973285A JPS6239064A JP S6239064 A JPS6239064 A JP S6239064A JP 60179732 A JP60179732 A JP 60179732A JP 17973285 A JP17973285 A JP 17973285A JP S6239064 A JPS6239064 A JP S6239064A
- Authority
- JP
- Japan
- Prior art keywords
- film
- region
- base
- emitter
- oxide film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Bipolar Transistors (AREA)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60179732A JPS6239064A (ja) | 1985-08-14 | 1985-08-14 | 半導体装置の製造方法 |
| GB8616735A GB2179201B (en) | 1985-08-14 | 1986-07-09 | Method for fabricating a semiconductor device |
| US06/893,934 US4691436A (en) | 1985-08-14 | 1986-08-06 | Method for fabricating a bipolar semiconductor device by undercutting and local oxidation |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60179732A JPS6239064A (ja) | 1985-08-14 | 1985-08-14 | 半導体装置の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6239064A true JPS6239064A (ja) | 1987-02-20 |
| JPH0418462B2 JPH0418462B2 (en:Method) | 1992-03-27 |
Family
ID=16070898
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60179732A Granted JPS6239064A (ja) | 1985-08-14 | 1985-08-14 | 半導体装置の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6239064A (en:Method) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8894197B2 (en) | 2007-03-01 | 2014-11-25 | Seiko Epson Corporation | Ink set, ink-jet recording method, and recorded material |
| JP5835866B2 (ja) | 2009-09-11 | 2015-12-24 | セイコーエプソン株式会社 | 記録方法 |
-
1985
- 1985-08-14 JP JP60179732A patent/JPS6239064A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0418462B2 (en:Method) | 1992-03-27 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4839305A (en) | Method of making single polysilicon self-aligned transistor | |
| US5019523A (en) | Process for making polysilicon contacts to IC mesas | |
| JPH0418463B2 (en:Method) | ||
| JPH0654795B2 (ja) | 半導体集積回路装置及びその製造方法 | |
| JPH0611053B2 (ja) | 半導体装置の製造方法 | |
| JPH0241170B2 (en:Method) | ||
| US4691436A (en) | Method for fabricating a bipolar semiconductor device by undercutting and local oxidation | |
| US4728618A (en) | Method of making a self-aligned bipolar using differential oxidation and diffusion | |
| JPS60202965A (ja) | 改良した酸化物画定型トランジスタの製造方法及びその結果得られる構成体 | |
| JPS6239064A (ja) | 半導体装置の製造方法 | |
| JPH0135505B2 (en:Method) | ||
| JPH0136710B2 (en:Method) | ||
| JPH03190139A (ja) | 半導体集積回路装置 | |
| US5925923A (en) | Merged single polysilicon bipolar NPN transistor | |
| JPH0254662B2 (en:Method) | ||
| JPS61234564A (ja) | 半導体装置の製造方法 | |
| JPH0318738B2 (en:Method) | ||
| JPH0437581B2 (en:Method) | ||
| JPS6286753A (ja) | 半導体装置の製造方法 | |
| JPS5984469A (ja) | 半導体装置の製造方法 | |
| JPS622657A (ja) | 半導体装置の製造方法 | |
| JPS6246072B2 (en:Method) | ||
| JPS6286758A (ja) | 半導体装置の製造方法 | |
| JPS61108169A (ja) | 半導体装置 | |
| JPH0157506B2 (en:Method) |