JPS6235321A - Electric machine light modulating element - Google Patents
Electric machine light modulating elementInfo
- Publication number
- JPS6235321A JPS6235321A JP17423485A JP17423485A JPS6235321A JP S6235321 A JPS6235321 A JP S6235321A JP 17423485 A JP17423485 A JP 17423485A JP 17423485 A JP17423485 A JP 17423485A JP S6235321 A JPS6235321 A JP S6235321A
- Authority
- JP
- Japan
- Prior art keywords
- mirror
- voltage
- swinging
- liquid
- bending force
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
Description
【発明の詳細な説明】
〔技術分野〕
本発明は電気機械光変調素子に関し、特に微細なミラー
が揺動する電気機械光変調素子に関する・〔従来技術〕
上記のような電気機械的光変調素子としては例えばDM
D (Deformabla Mirror Devi
ce)が知らている。[Detailed Description of the Invention] [Technical Field] The present invention relates to an electromechanical light modulation device, and particularly relates to an electromechanical light modulation device in which a minute mirror swings. [Prior Art] An electromechanical light modulation device as described above For example, DM
D (Deformabla Mirror Devi
ce) is known.
DEDに関しては、IEEE Transaction
onElectron Device Vol、ED
−30A5544 (1983)に記述がされ、又光学
系についても特開昭59−17525に開示されている
。Regarding DED, IEEE Transaction
onElectron Device Vol, ED
-30A5544 (1983), and the optical system is also disclosed in JP-A-59-17525.
以下DMDの一般的機構について図面に基づき説明する
。The general mechanism of the DMD will be explained below based on the drawings.
第2図(&)にDMDの拡大断面図を示す。1はミラー
構造でAt、 Ag等の物質で製造され入射光を反射さ
せる役割を示す。2はlのミラー構造を支持する基板で
Auなどで構成される。3,4は1,2の支持部材で、
3はミラーコンタクトと呼ばれ、特に電気機械動作をす
るひんし部を受けるものであり、4はポリオキサイドS
tの絶縁物質である。FIG. 2 (&) shows an enlarged sectional view of the DMD. Reference numeral 1 indicates a mirror structure, which is made of a material such as At or Ag, and serves to reflect incident light. Reference numeral 2 denotes a substrate that supports the mirror structure of 1 and is made of Au or the like. 3 and 4 are supporting members of 1 and 2,
Reference numeral 3 is called a mirror contact, and in particular it receives a tip part that performs electromechanical operation, and 4 is made of polyoxide S.
It is an insulating material of t.
5はポリシリコンゲートでMO8型FETトランジスタ
ーノダートの役割を示す。6はエアーギャップで、0.
6μ〜数μの空洞である。7はフローティング、フィー
ルドグレートで、8のN+フローティングソースからト
ランジスターのON 、 OFF情報により7のフロー
ティング、フィールドプレートに電圧がかかる。9はN
+ドレインを示す。これもMO8型FETトランジスタ
ーの構成の役割をする。5 is a polysilicon gate which plays the role of an MO8 type FET transistor node. 6 is the air gap, 0.
It is a cavity of 6μ to several μ. 7 is a floating field plate, and a voltage is applied from the N+ floating source of 8 to the floating field plate of 7 based on the ON/OFF information of the transistor. 9 is N
+ indicates drain. This also serves as the structure of the MO8 type FET transistor.
10はダートオキサイド、11はP型シリコン基板であ
る。10 is dirt oxide, and 11 is a P-type silicon substrate.
第2図(b)は第2図(a)の入方向からの拡大正面図
で、12はエアー空隙で13は電気機械的に揺動するミ
ラー揺動部、14はひんし部分を示す。FIG. 2(b) is an enlarged front view of FIG. 2(a) from the entrance direction, where 12 is an air gap, 13 is an electromechanically oscillating mirror swinging portion, and 14 is a base portion.
15はD〜の表面のミラー揺動部13以外のミラー表面
を示す。DMDはIC又はLSIのゾロセスと似た工程
で製作される・
第2図(c)はDVDのミス的等価図を示す。16は1
.2のミラー及び支持部材にかかる′d圧vMを示す。Reference numeral 15 indicates the mirror surface other than the mirror swinging portion 13 on the surface of D~. A DMD is manufactured in a process similar to that of an IC or LSI. Figure 2 (c) shows a mistaken equivalent diagram of a DVD. 16 is 1
.. 2 shows the 'd pressure vM applied to the mirror and support member of No. 2.
17は8にかかる電圧V、を示す。18はトランジスタ
ー構成を示しており、9のD(ドレイン)信号、5ノ0
(f−ト)信号ノON 、 OFF FCヨリV2の
電圧が8にON 、 OFFされる。この時1゜2に電
圧■つがかかっており、1,2と8間に電位差がON
、 OFF信号だよシ増減されることになる。17 indicates the voltage V applied to 8. 18 shows the transistor configuration, D (drain) signal of 9, 0 of 5
(f-g) Signal ON, OFF The voltage of FC side V2 is turned ON and OFF at 8. At this time, a voltage is applied to 1°2, and a potential difference is ON between 1, 2 and 8.
, the OFF signal will be increased or decreased.
この時、電位差に応じて6,7間につぎの式に応じた力
Fが生じ、
F’c/3KVQ(K:定数 v:を位差α:定数 F
:曲げ力)
ミラー1.2はひんし部14で揺動される。第2図(a
)の左図は1,2と8の間圧電圧差が大きく有る場合で
、ミラー揺動部13はひんじ部14から折れ曲がり、こ
の作用のため入射光はミラーのふれ角の2倍角度をかえ
て反射される。At this time, a force F according to the following formula is generated between 6 and 7 depending on the potential difference, and F'c/3KVQ (K: constant v: position difference α: constant F
: bending force) The mirror 1.2 is swung by the arch 14. Figure 2 (a
) shows the case where there is a large voltage difference between 1, 2 and 8, the mirror swinging part 13 bends from the hinge part 14, and due to this action the incident light bends at an angle twice the deflection angle of the mirror. Instead, it is reflected.
一方電圧差が少ない場合は第2図(a)の右図に示すよ
うに、1.2のミラー揺動部13#″lニアによシひり
ばられる力が少なく彎曲されない、従って入射光はミラ
ーのふれない状態で反射されることとなる。DMDとは
電気的ON 、 OFFをミラー揺動部13の揺動のO
N 、 OFFに変換し、さらに光のふれ角に変換する
ものである。On the other hand, when the voltage difference is small, as shown in the right diagram of Fig. 2(a), the force exerted by the mirror swinging portion 13#''l of 1.2 is small and the incident light is not bent. It will be reflected when the mirror does not touch.DMD means electrical ON/OFF is controlled by the oscillation of the mirror oscillating unit 13.
It converts into N and OFF, and further into the deflection angle of light.
しかしながら上記のようなりMDにおいてはエアーギャ
ップ、印加電圧(約3 Q volt )等の設定から
光のふれの角は最大で4°程度である。DMDを用いる
光学系は必然的に反射光学系になシ、それだけで高精度
が要求されるが、さらにわずか4°の角度変化に対拠で
きる光学系を組まなければならないとすると、光学系の
精度は非常に高度にする必要があり、また位置調整も大
変難しくなる問題点がありた。However, in the above-mentioned MD, the angle of light deflection is about 4 degrees at maximum due to the settings of the air gap, applied voltage (approximately 3 Q volts), etc. An optical system using a DMD is necessarily a reflective optical system, which alone requires high precision, but if we also have to build an optical system that can withstand angle changes of only 4 degrees, the optical system There was a problem in that the accuracy needed to be extremely high, and position adjustment was also extremely difficult.
以上のような従来技術の問題点に鑑み、本発明において
はミラー揺動部13のふれ角を大きくするために、基板
と該基板上に近接して配設されたミラー揺動部が、静電
気力によって揺動することによって反射光をすくなくと
も2方向に偏向できるDMDのような電気機械光変調素
子において、基板とミラー揺動部の間に絶縁性低粘度液
体を設ける手段がとられる。In view of the problems of the prior art as described above, in the present invention, in order to increase the deflection angle of the mirror swinging section 13, the substrate and the mirror swinging section disposed close to the substrate are provided with static electricity. In an electromechanical light modulation element such as a DMD that can deflect reflected light in at least two directions by being oscillated by force, a method is taken to provide an insulating low-viscosity liquid between the substrate and the mirror oscillating portion.
以下、図面に基づき本発明の実施例について説明する。 Embodiments of the present invention will be described below based on the drawings.
第1図は本発明の電気機械光変調素子の拡大断面図を示
したものである。なお、同図において第2図と同じ部材
には同じ番号が付しである。本発明は第2図に示したエ
アギャッf6中に絶縁性低粘度液体19を注入したもの
である。FIG. 1 shows an enlarged cross-sectional view of the electromechanical light modulator of the present invention. In this figure, the same members as in FIG. 2 are given the same numbers. In the present invention, an insulating low viscosity liquid 19 is injected into the air gap f6 shown in FIG.
一般に液体19の比誘電率εは2以上と高く、又絶縁性
の高い液体を用いることで絶縁破壊電圧を高くすること
ができ、ギャップ間距離dを小さくすることができる。In general, the liquid 19 has a high dielectric constant ε of 2 or more, and by using a highly insulating liquid, the dielectric breakdown voltage can be increased and the gap distance d can be reduced.
すなわち、ミラーの曲げカFはミラーの面積Sに比例し
、ギヤツブ間距離dK反比例するので液体19の比誘電
率をeとすると、この場合、
Focc&or (ε。は真空の誘を率)となり、エ
アーギャップの時に比べて大きな曲げ力Fが働くことに
なる。つまシ、DMD等に印加する電圧が従来と同じで
もふれ角が大きくとれ、あるいは同じふれ角を得る印加
電圧を下′けることができる。That is, the bending force F of the mirror is proportional to the area S of the mirror and inversely proportional to the distance dK between the gears, so if the relative dielectric constant of the liquid 19 is e, in this case Focc&or (ε. is the dielectric constant of vacuum), A larger bending force F acts than when there is an air gap. Even if the voltage applied to the pick, DMD, etc. is the same as in the past, a larger deflection angle can be obtained, or the applied voltage can be lowered to obtain the same deflection angle.
前記絶縁性低粘度液体19としてシリコン油、スルホン
系油、フッ素油、塩素置換芳香族炭化水素等などがある
。Examples of the insulating low-viscosity liquid 19 include silicone oil, sulfonic oil, fluorine oil, chlorine-substituted aromatic hydrocarbon, and the like.
また、本発明の電気機械光変調素子の製造に際しては、
揺動ミラー13の表面を表面自由エネルギーの低い材料
で構成し、注入した液体19が素子内に毛細現象で保持
きれるようにすることが望ましい。さらに、注入した液
体19の粘性はレスポンス上低い方が好ましく、液体1
9の蒸気圧も低い方が良い。Furthermore, when manufacturing the electromechanical light modulation element of the present invention,
It is desirable that the surface of the swinging mirror 13 be made of a material with low surface free energy so that the injected liquid 19 can be retained within the element by capillarity. Furthermore, the viscosity of the injected liquid 19 is preferably low in terms of response;
The lower the vapor pressure of 9, the better.
以上、説明したように本発明によれば、簡単な方法でミ
ラー揺動部のふれ角を大きくすることが可能となり、ま
た高絶縁性液体を用いることによシ絶縁破壊電圧を高め
ることも可能になった。As explained above, according to the present invention, it is possible to increase the deflection angle of the mirror swinging part by a simple method, and it is also possible to increase the dielectric breakdown voltage by using a highly insulating liquid. Became.
第1図は本発明の電気機械光変調素子の拡大断面図であ
る。
第2図は従来の電気機械光変調素子の説明図である。
11:P型シリコン基板、13:ミラー揺動部、19:
jQ縁性低粘度液体。
代理人 弁理士 山 下 積 平
第1図FIG. 1 is an enlarged sectional view of the electromechanical light modulation element of the present invention. FIG. 2 is an explanatory diagram of a conventional electromechanical light modulation element. 11: P-type silicon substrate, 13: Mirror swinging section, 19:
jQ marginal low viscosity liquid. Agent Patent Attorney Sekihei Yamashita Figure 1
Claims (1)
動部とを有し、該ミラー揺動部を電気的に揺動させるこ
とにより反射光をすくなくとも2方向に偏向できる電気
機械光変調素子において、基板とミラー揺動部の間に絶
縁性低粘度液体を設けたことを特徴とする電気機械光変
調素子。(1) An electrical device that has a substrate and a mirror swinging section disposed close to the substrate, and can deflect reflected light in at least two directions by electrically swinging the mirror swinging section. An electromechanical light modulation element, characterized in that an insulating low viscosity liquid is provided between a substrate and a mirror swinging part.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17423485A JPS6235321A (en) | 1985-08-09 | 1985-08-09 | Electric machine light modulating element |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17423485A JPS6235321A (en) | 1985-08-09 | 1985-08-09 | Electric machine light modulating element |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6235321A true JPS6235321A (en) | 1987-02-16 |
Family
ID=15975063
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP17423485A Pending JPS6235321A (en) | 1985-08-09 | 1985-08-09 | Electric machine light modulating element |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6235321A (en) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5061049A (en) * | 1984-08-31 | 1991-10-29 | Texas Instruments Incorporated | Spatial light modulator and method |
US5469302A (en) * | 1993-05-21 | 1995-11-21 | Daewoo Electronics Co., Ltd. | Electrostrictive mirror actuator for use in optical projection system |
EP0786679A3 (en) * | 1995-12-29 | 1998-09-16 | Hewlett-Packard Company | Electrostatically-driven light modulator and display |
KR100368366B1 (en) * | 1994-03-07 | 2003-03-28 | 텍사스 인스트루먼츠 인코포레이티드 | Control Method of Digital Micromirror Device |
JP2003322807A (en) * | 2002-04-30 | 2003-11-14 | Hewlett Packard Co <Hp> | Microminiature mirror device and method for forming the same |
JP2007086143A (en) * | 2005-09-20 | 2007-04-05 | Sony Corp | Variable focus lens and variable focus mirror |
JP2007335859A (en) * | 2006-06-07 | 2007-12-27 | Asml Netherlands Bv | Miller array for lithographies |
US11199724B2 (en) | 2016-09-12 | 2021-12-14 | LooLoops, LLC | Slip-resistant eyewear system |
-
1985
- 1985-08-09 JP JP17423485A patent/JPS6235321A/en active Pending
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5061049A (en) * | 1984-08-31 | 1991-10-29 | Texas Instruments Incorporated | Spatial light modulator and method |
US5469302A (en) * | 1993-05-21 | 1995-11-21 | Daewoo Electronics Co., Ltd. | Electrostrictive mirror actuator for use in optical projection system |
KR100368366B1 (en) * | 1994-03-07 | 2003-03-28 | 텍사스 인스트루먼츠 인코포레이티드 | Control Method of Digital Micromirror Device |
EP0786679A3 (en) * | 1995-12-29 | 1998-09-16 | Hewlett-Packard Company | Electrostatically-driven light modulator and display |
JP2003322807A (en) * | 2002-04-30 | 2003-11-14 | Hewlett Packard Co <Hp> | Microminiature mirror device and method for forming the same |
JP2007086143A (en) * | 2005-09-20 | 2007-04-05 | Sony Corp | Variable focus lens and variable focus mirror |
JP2007335859A (en) * | 2006-06-07 | 2007-12-27 | Asml Netherlands Bv | Miller array for lithographies |
US11199724B2 (en) | 2016-09-12 | 2021-12-14 | LooLoops, LLC | Slip-resistant eyewear system |
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