JPS62296492A - Manufacture of printed wiring board - Google Patents
Manufacture of printed wiring boardInfo
- Publication number
- JPS62296492A JPS62296492A JP14063086A JP14063086A JPS62296492A JP S62296492 A JPS62296492 A JP S62296492A JP 14063086 A JP14063086 A JP 14063086A JP 14063086 A JP14063086 A JP 14063086A JP S62296492 A JPS62296492 A JP S62296492A
- Authority
- JP
- Japan
- Prior art keywords
- plating
- wiring board
- printed wiring
- hole
- treatment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 10
- 238000007747 plating Methods 0.000 claims description 29
- 239000003054 catalyst Substances 0.000 claims description 15
- 238000007788 roughening Methods 0.000 claims description 12
- 239000003929 acidic solution Substances 0.000 claims description 11
- 239000000758 substrate Substances 0.000 claims description 11
- 239000012790 adhesive layer Substances 0.000 claims description 8
- 238000007772 electroless plating Methods 0.000 claims description 6
- 239000000243 solution Substances 0.000 claims description 6
- 239000002253 acid Substances 0.000 claims description 5
- 238000000034 method Methods 0.000 claims description 5
- 239000000853 adhesive Substances 0.000 claims description 4
- 230000001070 adhesive effect Effects 0.000 claims description 4
- 239000010410 layer Substances 0.000 claims description 2
- 229910000679 solder Inorganic materials 0.000 description 9
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 8
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- 238000007598 dipping method Methods 0.000 description 4
- 238000001556 precipitation Methods 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 3
- 241000218645 Cedrus Species 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 238000010899 nucleation Methods 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- -1 first Substances 0.000 description 1
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 description 1
- 238000005453 pelletization Methods 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 1
Landscapes
- Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
3、発明の詳細な説明
(産業上の利用分野)
本光明は無電解めっき法によるプリント配線板の製造方
法に関するものである。[Detailed Description of the Invention] 3. Detailed Description of the Invention (Field of Industrial Application) The present invention relates to a method of manufacturing a printed wiring board by electroless plating.
(従来の技術)
プリント配線板に電子部品を接続するには、部品のリー
ド線を孔に挿通後、半田ディツプ等することにより行な
っている。従って、孔中を半田が揚る状態の良し悪しが
、部品の接続状態を決定する原因の一つとなる。(Prior Art) Connecting electronic components to a printed wiring board is accomplished by inserting lead wires of the components into holes and then dipping them with solder. Therefore, the quality of the solder flowing through the hole is one of the factors that determines the connection state of the parts.
ところで、無電解めっき法により製造されるフルアディ
ティブ配線板は、例えば、基材が紙ベースであり、吸湿
し易く、長時間の加熱乾燥を行っても、孔内を半田が揚
り難い欠点がある。そのため、通常、孔内にシーダーを
付着し、孔内のめっきを緻密にしている。By the way, fully additive wiring boards manufactured by electroless plating, for example, have a paper-based base material that easily absorbs moisture and has the disadvantage that it is difficult for solder to build up inside the holes even when heated and dried for a long time. be. Therefore, cedar is usually attached to the inside of the hole to make the plating inside the hole dense.
(発明が解決しようとする問題点)
しかし、従来の製造方法では、孔内にシーダーを付着し
た後に、シーダーを活性化するために硫酸中等にディッ
プし、その後に接着剤層を粗化処理等している。そのた
めに、硫酸等により活訃化されたシーダーは粗化処理に
より不活性化され易く、めっき触媒としての効果が減じ
られる欠点があった。(Problem to be solved by the invention) However, in the conventional manufacturing method, after adhering the seeder to the hole, the seeder is dipped in sulfuric acid or the like to activate it, and then the adhesive layer is subjected to roughening treatment, etc. are doing. For this reason, cedar activated with sulfuric acid or the like is likely to be inactivated by roughening treatment, resulting in a disadvantage that its effectiveness as a plating catalyst is reduced.
本発明の目的は、以上の欠点を改良し、めっき触媒の作
用を効率化して孔内のめっき形成性を改良しうるプリン
ト配線板の製造方法を提供するものである。An object of the present invention is to provide a method for manufacturing a printed wiring board that can improve the above-mentioned drawbacks, improve the efficiency of the action of the plating catalyst, and improve the formation of plating inside the holes.
(問題点を解決するための手段)
本発明は、上記の目的を達成するために、めっき触媒を
含む接着剤を表面に塗布した絶縁基板にスルーホール用
の孔を設け、該孔内にめっき触媒を付着し、次いで、め
っきレジスト層の形成、接着剤層の粗化処理をし、無電
解めっき処理により回路を形成するプリント配線板の製
造方法において、粗化処理後に酸性溶液中に絶縁基板を
浸漬する処理を行なうことを特徴とするプリント配線板
のH2方法を提供するものである。(Means for Solving the Problems) In order to achieve the above object, the present invention provides holes for through holes in an insulating substrate whose surface is coated with an adhesive containing a plating catalyst, and performs plating in the holes. In a printed wiring board manufacturing method in which a catalyst is attached, a plating resist layer is then formed, an adhesive layer is roughened, and a circuit is formed by electroless plating, an insulating substrate is placed in an acidic solution after the roughening treatment. The present invention provides an H2 method for a printed wiring board, which is characterized by performing a treatment of dipping the printed wiring board.
(作用)
本発明によれば、接着剤層を粗化した後、fi酸やリン
酸、塩酸、1m弗化水素酸等の酸性溶液中にディップし
て、シーダーを活性化しているために、その後に無電解
めっき処理を行なった場合に、孔内のめっき析出性が向
上する。(Function) According to the present invention, after roughening the adhesive layer, the seeder is activated by dipping it in an acidic solution such as fi acid, phosphoric acid, hydrochloric acid, or 1M hydrofluoric acid. When electroless plating is performed after that, the plating precipitation inside the holes is improved.
なお、駁性溶液としては、四弗化水素酸水溶液が好まし
く、その濃度は1〜5wt%、そして処理温度は20〜
50℃、処理時間は5秒〜10分間程度がよい。In addition, as the refractory solution, a hydrotetrafluoric acid aqueous solution is preferable, the concentration thereof is 1 to 5 wt%, and the treatment temperature is 20 to 5 wt%.
The treatment time is preferably about 5 seconds to 10 minutes at 50°C.
(実施例) 以下、本発明を実施例に基づいて説明する。(Example) Hereinafter, the present invention will be explained based on examples.
絶縁基板としては、めっき触媒入りの接着剤が表面に塗
布されためっき触媒入り紙基材フェノール樹脂′@層板
や紙基材エポキシ樹脂積層板を用いる。As the insulating substrate, a plating catalyst-containing paper-based phenol resin laminate or a paper-based epoxy resin laminate whose surface is coated with an adhesive containing a plating catalyst is used.
この絶縁基板を用いて印刷配線板を製造するには、先ず
、スルーホール用の孔をバンチやドリルにより設け、シ
ーダー処理をして接着剤層表面及び孔の内面にめっき触
媒を付着する。めっき触媒としては、例えば塩化パラジ
ウムと塩化スズとの混合物を用いる。To manufacture a printed wiring board using this insulating substrate, first, holes for through holes are formed using a bunch or a drill, and a plating catalyst is applied to the surface of the adhesive layer and the inner surface of the hole by seeding. As the plating catalyst, for example, a mixture of palladium chloride and tin chloride is used.
次に、絶縁基板の表面にスクリーン印刷によりめっきレ
ジストインクを印制し、送パターンを形成し、硬化する
。Next, plating resist ink is printed on the surface of the insulating substrate by screen printing to form a feeding pattern, and then hardened.
めっきレジストインクを硬化後、無水クロム酸、1iI
i酸系の粗化液中に、絶縁基板を浸漬して接着剤層表面
を泪化する。After curing the plating resist ink, chromic anhydride, 1iI
The insulating substrate is immersed in an acid-based roughening solution to soften the surface of the adhesive layer.
接着剤層を粗化後、絶縁基板を硫酸ヤ硼弗化水素酸水溶
液等の酸性溶液中にディップし、金属パラジウムを形成
するとともにスズを除ムすることによりめっき触媒を活
性化する。After roughening the adhesive layer, the insulating substrate is dipped in an acidic solution such as an aqueous solution of sulfuric acid, borohydrofluoric acid, etc., to form metallic palladium and remove tin, thereby activating the plating catalyst.
酸性溶液中にディップ後に、めっき液中に絶縁基板を浸
漬して無電解めっき処理し、所定の回路を形成する。After dipping in an acidic solution, the insulating substrate is immersed in a plating solution and subjected to electroless plating to form a predetermined circuit.
次に、本発明実施例について孔内のめつき析出性やブロ
ーホール発生率、はんだ飛散について測定したところ表
の通りの結果が得られた。なお、各実施例の製造条件は
次の通りとなる。Next, regarding the examples of the present invention, the plating precipitation inside the holes, the blowhole occurrence rate, and the solder scattering were measured, and the results shown in the table were obtained. The manufacturing conditions for each example are as follows.
実施例1)
絶縁基板 :めっぎ触媒入り接着剤を塗布したエポキシ
樹脂積層板(日
立化成工業株式会社製ACL
−E−144>
めっき触媒:日立化成工業株式会社1j HS−101
Bのめっき触媒
粗化処理 :温度40℃の無水クロム酸硫酸系粗化液中
に10分間浸漬
して接着剤層表面を:粗化する。Example 1) Insulating substrate: Epoxy resin laminate coated with adhesive containing plating catalyst (ACL-E-144 manufactured by Hitachi Chemical Co., Ltd.) Plating catalyst: Hitachi Chemical Co., Ltd. 1j HS-101
B: Plating catalyst roughening treatment: Roughen the surface of the adhesive layer by immersing it in an anhydrous chromic acid/sulfuric acid roughening solution at a temperature of 40° C. for 10 minutes.
酸性溶液処理:温度30℃の皿弗化水素酸2wt%の水
溶液中に10分間
浸漬する。Acidic solution treatment: A plate is immersed for 10 minutes in a 2 wt % aqueous solution of hydrofluoric acid at a temperature of 30°C.
無電解銅めっき処理:厚さ30μmの無電解鋼めっきを
析出させる。Electroless copper plating treatment: Electroless steel plating with a thickness of 30 μm is deposited.
実施例2)
実施例1)において酸性溶液処理を2分間とする、
実施例3)
実施例1)において■弗化水素酸濃度を4%とする、
実施例4)
実施例1)において囲弗化水木酸溶液の温度を40℃と
する。Example 2) In Example 1), the acidic solution treatment is for 2 minutes. Example 3) In Example 1), the hydrofluoric acid concentration is 4%. Example 4) In Example 1), the The temperature of the hydrochloric acid solution is set to 40°C.
また、従来例は実施例1)の酸性溶液処理をシーダー処
理と粗化処理の間に行なったものとする。Further, in the conventional example, the acidic solution treatment of Example 1) was performed between the seeding treatment and the roughening treatment.
なお、孔内のめつき析出性は孔内周面がめつき銅色にな
る迄の時間、ブローホール発生率は絶縁atを250℃
の半田中に4秒間ディップした場合のブローホール発生
率、はんだ飛散はブローホールと同じ処理をした場合の
はんだ飛散を測定した。In addition, the plating precipitation inside the hole is the time until the inner peripheral surface of the hole becomes copper-colored due to plating, and the blowhole occurrence rate is the time required for the inner peripheral surface of the hole to become copper-colored.
The blowhole occurrence rate and solder scattering were measured when the sample was dipped in solder for 4 seconds, and the solder scattering was measured when the same treatment as blowholes was applied.
表から明らかな通り、本発明により孔内のめつぎ析出時
間は従来例の1/4に短縮され、ブローホール発生率は
約1/8に減少し、はんだ飛散はほとんど認められなか
った。As is clear from the table, according to the present invention, the time for depositing in-holes was shortened to 1/4 of that of the conventional example, the blowhole occurrence rate was reduced to about 1/8, and almost no solder scattering was observed.
なお、上記実施例において、酸性溶液処理を粗化処理後
のみに行なったが、さらに、シーダー処理と粗化処理と
の間に行なってもよい。In the above examples, the acidic solution treatment was performed only after the roughening treatment, but it may be further performed between the seeder treatment and the roughening treatment.
(発明の効果)
以上の通り、本発明によれば、租化後に酸性溶液処理し
ているために、めっき触媒を活性化して孔内のめっき処
理の析出性を向上できるとともにブローホール発生率を
改善でき、はんだ飛散が少なく信頼性の高いプリント配
線板の製造方法がにlられる。(Effects of the Invention) As described above, according to the present invention, since the acidic solution treatment is performed after the pelletization, the plating catalyst can be activated to improve the precipitation properties of the plating inside the pores, and the blowhole generation rate can be reduced. A method of manufacturing a printed wiring board that can be improved, has less solder scattering, and is highly reliable is provided.
Claims (2)
板にスルーホール用の孔を設け、該孔内にめっき触媒を
付着し、次いで、めっきレジスト層の形成、接着剤層の
粗化処理をし、無電解めっき処理により回路を形成する
プリント配線板の製造方法において、粗化処理後に酸性
溶液中に絶縁基板を浸漬する処理を行なうことを特徴と
するプリント配線板の製造方法。(1) A hole for a through hole is provided in an insulating substrate whose surface is coated with an adhesive containing a plating catalyst, a plating catalyst is adhered to the inside of the hole, and then a plating resist layer is formed and the adhesive layer is roughened. A method for manufacturing a printed wiring board in which a circuit is formed by electroless plating, the method comprising: immersing the insulating substrate in an acidic solution after roughening treatment.
範囲第1項記載のプリント配線板の製造方法。(2) The method for manufacturing a printed wiring board according to claim 1, wherein the acidic solution is an aqueous borofluoric acid solution.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14063086A JPS62296492A (en) | 1986-06-17 | 1986-06-17 | Manufacture of printed wiring board |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14063086A JPS62296492A (en) | 1986-06-17 | 1986-06-17 | Manufacture of printed wiring board |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS62296492A true JPS62296492A (en) | 1987-12-23 |
Family
ID=15273160
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14063086A Pending JPS62296492A (en) | 1986-06-17 | 1986-06-17 | Manufacture of printed wiring board |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62296492A (en) |
-
1986
- 1986-06-17 JP JP14063086A patent/JPS62296492A/en active Pending
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