JPS6226756A - Device for producing semiconductors - Google Patents

Device for producing semiconductors

Info

Publication number
JPS6226756A
JPS6226756A JP60166508A JP16650885A JPS6226756A JP S6226756 A JPS6226756 A JP S6226756A JP 60166508 A JP60166508 A JP 60166508A JP 16650885 A JP16650885 A JP 16650885A JP S6226756 A JPS6226756 A JP S6226756A
Authority
JP
Japan
Prior art keywords
wafer
vacuum container
container
dust
atmospheric air
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP60166508A
Other languages
Japanese (ja)
Other versions
JPS6226756K1 (en
Inventor
Setsuo Wake
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP60166508A priority Critical patent/JPS6226756A/en
Publication of JPS6226756A publication Critical patent/JPS6226756A/en
Publication of JPS6226756K1 publication Critical patent/JPS6226756K1/ja
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To prevent any dust from adhering to a semiconductor wafer by equipping the vacuum container of a semiconductor-producing device with an ionized-gas introducer and neutralizing the charge of the wafer immediately before introducing atmospheric air into the vacuum container after the production of the wafer.
CONSTITUTION: A semiconductor wafer 1 is produced in a vacuum container 3 which has been evacuated by an evacuator 4 and in which an ion implantation device 2 is installed. The vacuum container 3 is equipped with an ionized-gas introducer 9. Before introducing atmospheric air into the container 3 by means of a valve 6 in order to remove the semiconductor wafer 1 through a hole 5 after production of the wafer 1, a gas containing ions charged reversely to the wafer 1 is introduced into the container 3 at such a flow rate as to fling up no dust. As a result, dust flung up during the introduction of atmospheric air is prevented from adhering to the wafer 1 by neutralizing the charge of the wafer 1, thereby improving the quality of the wafer 1.
COPYRIGHT: (C)1987,JPO&Japio
JP60166508A 1985-07-26 1985-07-26 Device for producing semiconductors Pending JPS6226756A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60166508A JPS6226756A (en) 1985-07-26 1985-07-26 Device for producing semiconductors

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60166508A JPS6226756A (en) 1985-07-26 1985-07-26 Device for producing semiconductors

Publications (2)

Publication Number Publication Date
JPS6226756A true JPS6226756A (en) 1987-02-04
JPS6226756K1 JPS6226756K1 (en) 1987-02-04

Family

ID=15832644

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60166508A Pending JPS6226756A (en) 1985-07-26 1985-07-26 Device for producing semiconductors

Country Status (1)

Country Link
JP (1) JPS6226756A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03193131A (en) * 1989-12-25 1991-08-22 Nippon Telegr & Teleph Corp <Ntt> Vacuum treatment apparatus having ionizing mechanism
EP0597103A1 (en) * 1991-07-25 1994-05-18 Takasago Netsugaku Kogyo Kabushiki Kaisha Apparatus for neutralizing charged body
US5492862A (en) * 1993-01-12 1996-02-20 Tokyo Electron Limited Vacuum change neutralization method
US6207006B1 (en) 1997-09-18 2001-03-27 Tokyo Electron Limited Vacuum processing apparatus

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03193131A (en) * 1989-12-25 1991-08-22 Nippon Telegr & Teleph Corp <Ntt> Vacuum treatment apparatus having ionizing mechanism
EP0597103A1 (en) * 1991-07-25 1994-05-18 Takasago Netsugaku Kogyo Kabushiki Kaisha Apparatus for neutralizing charged body
EP0597103A4 (en) * 1991-07-25 1994-08-17 Takasago Thermal Engineering Apparatus for neutralizing charged body.
US5492862A (en) * 1993-01-12 1996-02-20 Tokyo Electron Limited Vacuum change neutralization method
US6207006B1 (en) 1997-09-18 2001-03-27 Tokyo Electron Limited Vacuum processing apparatus

Also Published As

Publication number Publication date
JPS6226756K1 (en) 1987-02-04

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